Linear Formula:

Al-Nb-Ta

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Al-Nb-Ta Sputtering Target
AL-NBTA-02-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Al-Nb-Ta Sputtering Target
AL-NBTA-03-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Al-Nb-Ta Sputtering Target
AL-NBTA-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Al-Nb-Ta Sputtering Target
AL-NBTA-05-ST
Pricing > SDS > Data Sheet >

Aluminum Niobium Tantalum Sputtering Target Properties (Theoretical)

Appearance Target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A

Aluminum Niobium Tantalum Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
Transport Information NONH for all modes of transport

About Aluminum Niobium Tantalum Sputtering Target

High Purity (99.99%) Aluminum Niobium Tantalum Sputtering TargetAmerican Elements specializes in producing high purity Aluminum Niobium Tantalum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Please contact us for information on lead time and pricing above.

Aluminum Niobium Tantalum Sputtering Target Synonyms

N/A

Chemical Identifiers

Linear Formula Al-Nb-Ta
MDL Number N/A
EC No. N/A

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

Aluminum

See more Aluminum products. Aluminum (or Aluminium) (atomic symbol: Al, atomic number: 13) is a Block P, Group 13, Period 3 element with an atomic weight of 26.9815386. It is the third most abundant element in the earth's crust and the most abundant metallic element. Aluminum Bohr Model Aluminum's name is derived from alumina, the mineral from which Sir Humphrey Davy attempted to refine it from in 1812. Aluminum was first predicted by Antoine Lavoisier 1787 and first isolated by Hans Christian Øersted in 1825. Aluminum is a silvery gray metal that possesses many desirable characteristics. It is light, nonmagnetic and non-sparking. It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many industrial applications where a strong, light, easily constructed material is needed. Elemental AluminumAlthough it has only 60% of the electrical conductivity of copper, it is used in electrical transmission lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements, it imparts a variety of useful properties.

Niobium

See more Niobium products. Niobium (atomic symbol: Nb, atomic number: 41) is a Block D, Group 5, Period 5 element with an atomic weight of 92.90638. Niobium Bohr ModelThe number of electrons in each of niobium's shells is 2, 8, 18, 12, 1 and its electron configuration is [Kr] 4d4 5s1. The niobium atom has a radius of 146 pm and a Van der Waals radius of 207 pm. Niobium was discovered by Charles Hatchett in 1801 and first isolated by Christian Wilhelm Blomstrand in 1864. In its elemental form, niobium has a gray metallic appearance. Niobium has the largest magnetic penetration depth of any element and is one of three elemental type-II superconductors (Elemental Niobiumalong with vanadium and technetium). Niobium is found in the minerals pyrochlore, its main commercial source, and columbite. The word Niobium originates from Niobe, daughter of mythical Greek king Tantalus.

Tantalum

See more Tantalum products. Tantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. Tantalum Bohr ModelThe number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. The tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. High Purity (99.999%) Tantalum (Ta) MetalTantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology.

TODAY'S TOP DISCOVERY!

March 18, 2024
Los Angeles, CA
Each business day American Elements' scientists & engineers post their choice for the most exciting materials science news of the day
Enhancing CO Oxidation: The Impact of a Nanoscale Metal Oxide Layer on Gold and Platinum Nanoparticle Catalysts

Enhancing CO Oxidation: The Impact of a Nanoscale Metal Oxide Layer on Gold and Platinum Nanoparticle Catalysts