Product	Product Code	Order or Specifications
(2N) 99% Indium Oxide Rotatable Sputtering Target	IN-OX-02-STR
(2N5) 99.5% Indium Oxide Rotatable Sputtering Target	IN-OX-025-STR
(3N) 99.9% Indium Oxide Rotatable Sputtering Target	IN-OX-03-STR
(3N5) 99.95% Indium Oxide Rotatable Sputtering Target	IN-OX-035-STR
(4N) 99.99% Indium Oxide Rotatable Sputtering Target	IN-OX-04-STR
(5N) 99.999% Indium Oxide Rotatable Sputtering Target	IN-OX-05-STR

American Elements specializes in producing high purity Indium Oxide Rotatable Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Indium Oxide as pellets, pieces, tablets, and powder. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. See research below. Other shapes are available by request.

Indium is a Block P, Group 13, Period 5 element. The number of electrons in each of Indium's shells is 2, 8, 18, 18, 3 and its electronic configuration is [Kr] 4d¹⁰ 5s² 5p¹. In its elemental form indium's CAS number is 7440-74-6. The indium atom has a radius of 162.6.pm and it's Van der Waals radius is 193.pm. Indium is only slightly toxic. Indium has found application in semi-conductor materials and other electronic applications. It is used to make low-melting alloys, such as an alloy of 24% indium - 76% Indium is liquid at room temperature. It is used in making bearing alloys, germanium transistors, rectifiers, and photoconductors. It can be plated onto metal and evaporated onto glass, forming a mirror as good as that made with silver but with more resistance to atmospheric corrosion. Indium is available as metal and compounds with purities from 99% to 99.9999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder.  Indium is also used in various metal alloys (See AE Alloys). Indium was first discovered by Ferdinand Reich in 1863. See Indium research below.