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Nickel Silicide Sputtering Target

High Purity Ni2Si Sputtering Targets
CAS 12059-14-2


Product Product Code Request Quote
(2N) 99% Nickel Silicide Sputtering Target NI-SI-02-ST Request Quote
(2N5) 99.5% Nickel Silicide Sputtering Target NI-SI-025-ST Request Quote
(3N) 99.9% Nickel Silicide Sputtering Target NI-SI-03-ST Request Quote
(3N5) 99.95% Nickel Silicide Sputtering Target NI-SI-035-ST Request Quote
(4N) 99.99% Nickel Silicide Sputtering Target NI-SI-04-ST Request Quote
(5N) 99.999% Nickel Silicide Sputtering Target NI-SI-05-ST Request Quote

CHEMICAL
IDENTIFIER
Formula CAS No. PubChem SID PubChem CID MDL No. EC No IUPAC Name Beilstein
Re. No.
SMILES
Identifier
InChI
Identifier
InChI
Key
Ni2Si 12059-14-2 N/A N/A N/A 235-033-1 N/A N/A [Ni]=[Si]=[Ni] InChI=1S/2Ni.Si RUFLMLWJRZAWLJ-UHFFFAOYSA-N

PROPERTIES Compound Formula Mol. Wt. Appearance Density Exact Mass Monoisotopic Mass Charge MSDS
Ni2Si 145.47 N/A 7.40 g/cm3 N/A 143.848007202148 N/A Safety Data Sheet

See research below. American Elements specializes in producing high purity Nickel Silicide Sputtering Targets with the highest possible density High Purity (99.99%) Nickel Silicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.

Nickel (Ni) atomic and molecular weight, atomic number and elemental symbolNickel (atomic symbol: Ni, atomic number: 28) is a Block D, Group 4, Period 4 element with an atomic weight of 58.6934. Nickel Bohr ModelThe number of electrons in each of nickel's shells is [2, 8, 16, 2] and its electron configuration is [Ar]3d8 4s2. Nickel was first discovered by Alex Constedt in 1751. The nickel atom has a radius of 124 pm and a Van der Waals radius of 184 pm. In its elemental form, nickel has a lustrous metallic silver appearance. Elemental Nickel Nickel is a hard and ductile transition metal that is considered corrosion-resistant because of its slow rate of oxidation. It is one of four elements that are ferromagnetic and is used in the production of various type of magnets for commercial use. Nickel is sometimes found free in nature but is more commonly found in ores. The bulk of mined nickel comes from laterite and magmatic sulfide ores. The name originates from the German word kupfernickel, which means "false copper" from the illusory copper color of the ore. For more information on nickel, including properties, safety data, research, and American Elements' catalog of nickel products, visit the Nickel element page.

Silicon (Si) atomic and molecular weight, atomic number and elemental symbolSilicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental Silicon Silica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone. For more information on silicon, including properties, safety data, research, and American Elements' catalog of silicon products, visit the Silicon element page.

HEALTH, SAFETY & TRANSPORTATION INFORMATION
Material Safety Data Sheet MSDS
Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Precautions N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
Globally Harmonized System of
Classification and Labelling (GHS)
N/A        

NICKEL SILICDE (Ni2Si) SYNONYMS
Silanediylidenedinickel(II), dinickel silicide

CUSTOMERS FOR NICKEL SILICDE SPUTTERING TARGETS HAVE ALSO LOOKED AT
Nickel Copper Iron Alloy Nickel Foil Nickel Nanoparticles Nickel Molybdenum Alloy Nickel Pellets
Nickel Oxide Pellets Nickel Powder Nickel Oxide Nickel Sputtering Target Nickel Acetylacetonate
Nickel Sulfate Nickel Metal Nickel Chloride Nickel Acetate Nickel Rod
Show Me MORE Forms of Nickel

PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.


Have a Question? Ask a Chemical Engineer or Material Scientist
Request an MSDS or Certificate of Analysis

Recent Research & Development for Nickel

  • Association Model for Nickel and Vanadium with Asphaltene during Solvent Deasphalting. Chuanbo Yu, Linzhou Zhang, Xiuying Guo, Zhiming Xu, Xuewen Sun, Chunming Xu, and Suoqi Zhao. Energy Fuels: February 12, 2015
  • Coke Minimization during Conversion of Biogas to Syngas by Bimetallic Tungsten-Nickel Incorporated Mesoporous Alumina Synthesized by the One-Pot Route. Huseyin Arbag, Sena Yasyerli, Nail Yasyerli, Gulsen Dogu, Timur Dogu, Ilja Gasan Osojnik Crnivec, and Albin Pintar. Ind. Eng. Chem. Res.: February 12, 2015
  • Cleavage of lignin-derived 4-O-5 aryl ethers over nickel nanoparticles supported on niobic acid-activated carbon composites. Shaohua Jin, Zihui Xiao, Xiao Chen, Lei Wang, Jin Guo, Miao Zhang, and Changhai Liang. Ind. Eng. Chem. Res.: February 10, 2015
  • Visible Light Mediated Cyclization of Tertiary Anilines with Maleimides Using Nickel(II) Oxide Surface-Modified Titanium Dioxide Catalyst. Jian Tang, Günter Grampp, Yun Liu, Bing-Xiang Wang, Fei-Fei Tao, Li-Jun Wang, Xue-Zheng Liang, Hui-Quan Xiao, and Yong-Miao Shen. J. Org. Chem.: February 2, 2015
  • Enhancement of Nitrite and Nitrate Electrocatalytic Reduction through the Employment of Self-Assembled Layers of Nickel- and Copper-Substituted Crown-Type Heteropolyanions. Shahzad Imar, Chiara Maccato, Calum Dickinson, et. al. Langmuir: February 2, 2015
  • Selective N-Methylation of Aliphatic Amines with CO2 and Hydrosilanes Using Nickel-Phosphine Catalysts. Lucero González-Sebastián, Marcos Flores-Alamo, and Juventino J. García. Organometallics: January 30, 2015
  • Structural and Chemical Evolution of Amorphous Nickel Iron Complex Hydroxide upon Lithiation/Delithiation. Kai-Yang Niu, Feng Lin, Liang Fang, Dennis Nordlund, Runzhe Tao, Tsu-Chien Weng, Marca Doeff, and Haimei Zheng. Chem. Mater.: January 27, 2015
  • Ab Initio Molecular Dynamics Simulation of Ethylene Reaction on Nickel (111) Surface. Rizal Arifin, Yasushi Shibuta, Kohei Shimamura, Fuyuki Shimojo, and Shu Yamaguchi. J. Phys. Chem. C: January 23, 2015
  • Synthesis, Structure, and Solution Dynamic Behavior of Nickel Complexes Bearing a 1,3-Diallyl-Substituted NHC Ligand. Agata Wodarska, Andrzej Kozio, Maciej Dranka, Adam Gryff-Keller, Przemysaw Szczeciski, Jakub Jurkowski, and Antoni Pietrzykowski. Organometallics: January 22, 2015
  • Synthesis and Characterization of Ferrocene-Chelating Heteroscorpionate Complexes of Nickel(II) and Zinc(II). Mark Abubekerov and Paula L. Diaconescu. Inorg. Chem.: January 21, 2015

Recent Research & Development for Silicides

  • Phase Formation and Morphology of Nickel Silicide Thin Films Synthesized by Catalyzed Chemical Vapor Reaction of Nickel with Silane. Antony Premkumar Peter, Johan Meersschaut, Olivier Richard, Alain Moussa, Johnny Steenbergen, Marc Schaekers, Zsolt T?kei, Sven Van Elshocht, and Christoph Adelmann. Chem. Mater.: December 15, 2014
  • Lithium Silicide Nanocrystals: Synthesis, Chemical Stability, Thermal Stability, and Carbon Encapsulation. Jacqueline E. Cloud, Yonglong Wang, Xuemin Li, Tara S. Yoder, Yuan Yang, and Yongan Yang. Inorg. Chem.: September 29, 2014
  • Defect-Free Erbium Silicide Formation Using an Ultrathin Ni Interlayer. Juyun Choi, Seongheum Choi, Yu-Seon Kang, Sekwon Na, Hoo-Jeong Lee, Mann-Ho Cho, and Hyoungsub Kim. ACS Appl. Mater. Interfaces: August 5, 2014
  • Two-Dimensional Self-Assembled Gold Silicide Honeycomb Nanonetwork on Si(111)7×7. Fatemeh R. Rahsepar, Lei Zhang, and K. T. Leung. J. Phys. Chem. C: April 1, 2014
  • Silicide Formation Process of Er Films with Ta and TaN Capping Layers. Juyun Choi, Seongheum Choi, Jungwoo Kim, Sekwon Na, Hoo-Jeong Lee, Seok-Hee Lee, and Hyoungsub Kim. ACS Appl. Mater. Interfaces: November 18, 2013
  • Oxygen-Deficient Oxide Growth by Subliming the Oxide Source Material: The Cause of Silicide Formation in Rare Earth Oxides on Silicon. Oliver Bierwagen, André Proessdorf, Michael Niehle, Frank Grosse, Achim Trampert, and Max Klingsporn. Crystal Growth & Design: July 10, 2013
  • Vapor Phase Conversion Synthesis of Higher Manganese Silicide (MnSi1.75) Nanowire Arrays for Thermoelectric Applications. Ankit Pokhrel, Zachary P. Degregorio, Jeremy M. Higgins, Steven N. Girard, and Song Jin. Chem. Mater.: January 24, 2013
  • Synthesis and Characterization of Ferromagnetic Nickel–Cobalt Silicide Catalysts with Good Sulfur Tolerance in Hydrodesulfurization of Dibenzothiophene. Xiao Chen, Xinkui Wang, Jinghai Xiu, Christopher T. Williams, and Changhai Liang. J. Phys. Chem. C: November 7, 2012
  • Growth of Crystalline Copper Silicide Nanowires in High Yield within a High Boiling Point Solvent System. Hugh Geaney, Calum Dickinson, Colm O’Dwyer, Emma Mullane, Ajay Singh, and Kevin M. Ryan. Chem. Mater.: October 29, 2012
  • Real-Time Observations of Interfacial Lithiation in a Metal Silicide Thin Film. Tim T. Fister, Brandon R. Long, Andrew A. Gewirth, Bing Shi, Lahsen Assoufid, Sang Soo Lee, and Paul Fenter. J. Phys. Chem. C: September 17, 2012