Nickel Silicide Sputtering Target

High Purity Ni2Si Sputtering Targets
CAS 12059-14-2


Product Product Code Order or Specifications
(2N) 99% Nickel Silicide Sputtering Target NI-SI-02-ST Contact American Elements
(2N5) 99.5% Nickel Silicide Sputtering Target NI-SI-025-ST Contact American Elements
(3N) 99.9% Nickel Silicide Sputtering Target NI-SI-03-ST Contact American Elements
(3N5) 99.95% Nickel Silicide Sputtering Target NI-SI-035-ST Contact American Elements
(4N) 99.99% Nickel Silicide Sputtering Target NI-SI-04-ST Contact American Elements
(5N) 99.999% Nickel Silicide Sputtering Target NI-SI-05-ST Contact American Elements

CHEMICAL
IDENTIFIER
Formula CAS No. PubChem SID PubChem CID MDL No. EC No IUPAC Name Beilstein
Re. No.
SMILES
Identifier
InChI
Identifier
InChI
Key
Ni2Si 12059-14-2 N/A N/A N/A 235-033-1 N/A N/A [Ni]=[Si]=[Ni] InChI=1S/2Ni.Si RUFLMLWJRZAWLJ-UHFFFAOYSA-N

PROPERTIES Compound Formula Mol. Wt. Appearance Density

Exact Mass

Monoisotopic Mass Charge MSDS
Ni2Si 145.47 N/A 7.40 g/cm3 N/A 143.848007202148 N/A Safety Data Sheet

See research below. American Elements specializes in producing high purity Nickel Silicide Sputtering Targets with the highest possible density High Purity (99.99%) Nickel Silicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.

Nickel (Ni) atomic and molecular weight, atomic number and elemental symbolNickel (atomic symbol: Ni, atomic number: 28) is a Block D, Group 4, Period 4 element with an atomic weight of 58.6934. Nickel Bohr ModelThe number of electrons in each of nickel's shells is [2, 8, 16, 2] and its electron configuration is [Ar]3d8 4s2. Nickel was first discovered by Alex Constedt in 1751. The nickel atom has a radius of 124 pm and a Van der Waals radius of 184 pm. In its elemental form, nickel has a lustrous metallic silver appearance. Elemental Nickel Nickel is a hard and ductile transition metal that is considered corrosion-resistant because of its slow rate of oxidation. It is one of four elements that are ferromagnetic and is used in the production of various type of magnets for commercial use. Nickel is sometimes found free in nature but is more commonly found in ores. The bulk of mined nickel comes from laterite and magmatic sulfide ores. The name originates from the German word "kupfernickel," which means "false copper" from the illusory copper color of the ore. For more information on nickel, including properties, safety data, research, and American Elements' catalog of nickel products, visit the Nickel Information Center.

Silicon (Si) atomic and molecular weight, atomic number and elemental symbolSilicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy Ferrosilicon.Elemental Silicon Silica (or silicon oxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word "silex" which means flint or hard stone. For more information on silicon, including properties, safety data, research, and American Elements' catalog of silicon products, visit the Silicon Information Center.

HEALTH, SAFETY & TRANSPORTATION INFORMATION
Material Safety Data Sheet MSDS
Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Precautions N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
Globally Harmonized System of
Classification and Labelling (GHS)
N/A        

NICKEL SILICDE (Ni2Si) SYNONYMS
Silanediylidenedinickel(II), dinickel silicide

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PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.


Have a Question? Ask a Chemical Engineer or Material Scientist
Request an MSDS or Certificate of Analysis





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Production Catalog Available in 36 Countries & Languages


Recent Research & Development for Nickel

  • Synthesis, crystal structure, fluorescence and electrochemical studies of a new tridentate Schiff base ligand and its nickel(II) and palladium(II) complexes. Shafaatian B, Soleymanpour A, Kholghi Oskouei N, Notash B, Rezvani SA. Spectrochim Acta A Mol Biomol Spectrosc. 2014.
  • Study on the origin of amorphous carbon peaks on graphene films synthesized on nickel catalysts. Kahng YH, Kang SO, Jo G, Choe M, Park W, Lee S, Yoon J, Lee K, Lee T. J Nanosci Nanotechnol. 2014.
  • Hydrothermal synthesis of graphene/nickel oxide nanocomposites used as the electrode for supercapacitors. Zhou Z, Ni H, Fan LZ. J Nanosci Nanotechnol. 2014.
  • One-step electrodeposition of graphene loaded nickel oxides nanoparticles for acetaminophen detection. Liu GT, Chen HF, Lin GM, Ye PP, Wang XP, Jiao YZ, Guo XY, Wen Y, Yang HF. Biosens Bioelectron. 2014.
  • Efficacy of reducing agent and surfactant contacting pattern on the performance characteristics of nickel electroless plating baths coupled with and without ultrasound. Agarwal A, Pujari M, Uppaluri R, Verma A. Ultrason Sonochem. 2014.
  • Nickel oxide hollow microsphere for non-enzyme glucose detection. Ci S, Huang T, Wen Z, Cui S, Mao S, Steeber DA, Chen J. Biosens Bioelectron. 2014 Apr.
  • Electrocatalysis and electroanalysis of nickel, its oxides, hydroxides and oxyhydroxides toward small molecules. Miao Y, Ouyang L, Zhou S, Xu L, Yang Z, Xiao M, Ouyang R. Biosens Bioelectron. 2014 Mar.
  • Halo-substituted thiosemicarbazones and their copper(II), nickel(II) complexes: Detailed spectroscopic characterization and study of antitumour activity against HepG2 human hepatoblastoma cells. Jagadeesh M, Kalangi SK, Sivarama Krishna L, Reddy AV. Spectrochim Acta A Mol Biomol Spectrosc. 2014
  • Low elastic modulus titanium-nickel scaffolds for bone implants. Li J, Yang H, Wang H, Ruan J. Mater Sci Eng C Mater Biol Appl. 2014 Jan
  • Platelet-like nickel hydroxide: Synthesis and the transferring to nickel oxide as a gas sensor. Zhu G, Xu H, Liu Y, Xi C, Yang J, Shen X, Zhu J, Yang J. J Colloid Interface Sci. 2013 Dec.
  • Direct electrochemistry and electrocatalysis of heme proteins immobilised in carbon-coated nickel magnetic nanoparticle-chitosan-dimethylformamide composite films in room-temperature ionic liquids. Bioelectrochemistry. 2013 | first author:Wang T
  • Influence of the microstructure on electrochemical corrosion and nickel release in NiTi orthodontic archwires. Mater Sci Eng C Mater Biol Appl. 2013 create date:2013/10/08 | first author:Briceño J
  • Nickel analysis in real samples by Ni(2+) selective PVC membrane electrode based on a new Schiff base. Mater Sci Eng C Mater Biol Appl. 2013 create date:2013/10/08 | first author:Tomar PK
  • Preparation of biomorphic porous calcium titanate and its application for preconcentration of nickel in water and food samples. Mater Sci Eng C Mater Biol Appl. 2013 create date:2013/10/08 | first author:Zhang D
  • Functionalization of nickel nanowires with a fluorophore aiming at new probes for multimodal bioanalysis. J Colloid Interface Sci. 2013 create date:2013/09/04 | first author:Pinheiro PC
  • Ambient arylmagnesiation of alkynes catalysed by ligandless nickel(ii). Chem Commun (Camb). 2013 create date:2013/09/21 | first author:Xue F
  • Dietary nickel chloride restrains the development of small intestine in broilers. Biol Trace Elem Res. 2013 create date:2013/08/21 | first author:Wu BSynthesis, characterization and structural determination of some nickel(II) complexes containing imido Schiff bases and substituted phosphine ligands. Kianfar AH, Ebrahimi M. Spectrochim Acta A Mol Biomol Spectrosc. 2013 Nov
  • An electrochemical acetylcholine sensor based on lichen-like nickel oxide nanostructure. Sattarahmady N, Heli H, Vais RD. Biosens Bioelectron. 2013 Oct 15.
  • Synthesis of HPMC stabilized nickel nanoparticles and investigation of their magnetic and catalytic properties. Maity D, Mollick MM, Mondal D, Bhowmick B, Neogi SK, Banerjee A, Chattopadhyay S, Bandyopadhyay S, Chattopadhyay D. Carbohydr Polym. 2013 Oct 15.
  • Nickel(iii) complexes of di-amidato-di-phenolato ligands: effect of H-bonding. Eckshtain-Levi M, Orio M, Lavi R, Benisvy L. Dalton Trans. 2013 Oct.

Recent Research & Development for Silicides

  • Hiroyuki Usui, Kazuma Nouno, Yuya Takemoto, Kengo Nakada, Akira Ishii, Hiroki Sakaguchi, Influence of mechanical grinding on lithium insertion and extraction properties of iron silicide/silicon composites, Journal of Power Sources, Volume 268, 5 December 2014
  • Johannes de Boor, Titas Dasgupta, Hendrik Kolb, Camille Compere, Klemens Kelm, Echard Mueller, Microstructural effects on thermoelectric efficiency: A case study on magnesium silicide, Acta Materialia, Volume 77, 15 September 2014
  • Wan Wang, Binyu Zhang, Chungen Zhou, Formation and oxidation resistance of Hf and Al modified silicide coating on Nb–Si based alloy, Corrosion Science, Volume 86, September 2014
  • Hiroyuki Usui, Masahito Nomura, Hiroki Nishino, Masatoshi Kusatsu, Tadatoshi Murota, Hiroki Sakaguchi, Gadolinium silicide/silicon composite with excellent high-rate performance as lithium-ion battery anode, Materials Letters, Volume 130, 1 September 2014
  • Juncong Wang, Junfei Fang, Zhaodi Ren, Anhong Hu, Ning Ma, Piyi Du, Formation of Pb0.6Sr0.4(Ti0.97Mg0.03)O2.97 thin films on assembled bottom electrodes with titanium silicide nanowires, Vacuum, Volume 107, September 2014
  • L. Portebois, S. Mathieu, Y. Bouizi, M. Vilasi, S. Mathieu, Effect of boron addition on the oxidation resistance of silicide protective coatings: A focus on boron location in as-coated and oxidised coated niobium alloys, Surface and Coatings Technology, Volume 253, 25 August 2014
  • G. Utlu, N. Artunç, The effects of grain boundary scattering on electrical resistivity of Ag/NiSi silicide films formed on silicon substrate at 500 °C by RTA, Applied Surface Science, Volume 310, 15 August 2014
  • Nikhil Satyala, Jerzy S. Krasinski, Daryoosh Vashaee, Simultaneous enhancement of mechanical and thermoelectric properties of polycrystalline magnesium silicide with conductive glass inclusion, Acta Materialia, Volume 74, 1 August 2014
  • M. Afshar-Mohajer, A. Yaghoubi, S. Ramesh, A.R. Bushroa, K.M.C. Chin, C.C. Tin, W.S. Chiu, Electrophoretic deposition of magnesium silicates on titanium implants: Ion migration and silicide interfaces, Applied Surface Science, Volume 307, 15 July 2014
  • Koji Hagihara, Tatsuya Fushiki, Takayoshi Nakano, Control of microstructure and fracture toughness improvement of NbSi2/MoSi2 duplex lamellar silicides by TaC particles dispersion, Scripta Materialia, Volume 82, 1 July 2014