Nickel Silicide Sputtering Target

High Purity Ni2Si Sputtering Targets
CAS 12059-14-2


Product Product Code Order or Specifications
(2N) 99% Nickel Silicide Sputtering Target NI-SI-02-ST Contact American Elements
(2N5) 99.5% Nickel Silicide Sputtering Target NI-SI-025-ST Contact American Elements
(3N) 99.9% Nickel Silicide Sputtering Target NI-SI-03-ST Contact American Elements
(3N5) 99.95% Nickel Silicide Sputtering Target NI-SI-035-ST Contact American Elements
(4N) 99.99% Nickel Silicide Sputtering Target NI-SI-04-ST Contact American Elements
(5N) 99.999% Nickel Silicide Sputtering Target NI-SI-05-ST Contact American Elements

CHEMICAL
IDENTIFIER
Formula CAS No. PubChem SID PubChem CID MDL No. EC No IUPAC Name Beilstein
Re. No.
SMILES
Identifier
InChI
Identifier
InChI
Key
Ni2Si 12059-14-2 N/A N/A N/A 235-033-1 N/A N/A [Ni]=[Si]=[Ni] InChI=1S/2Ni.Si RUFLMLWJRZAWLJ-UHFFFAOYSA-N

PROPERTIES Compound Formula Mol. Wt. Appearance Density

Exact Mass

Monoisotopic Mass Charge MSDS
Ni2Si 145.47 N/A 7.40 g/cm3 N/A 143.848007202148 N/A Safety Data Sheet

See research below. American Elements specializes in producing high purity Nickel Silicide Sputtering Targets with the highest possible density High Purity (99.99%) Nickel Silicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.

Nickel (Ni) atomic and molecular weight, atomic number and elemental symbolNickel (atomic symbol: Ni, atomic number: 28) is a Block D, Group 4, Period 4 element with an atomic weight of 58.6934. Nickel Bohr ModelThe number of electrons in each of nickel's shells is [2, 8, 16, 2] and its electron configuration is [Ar]3d8 4s2. Nickel was first discovered by Alex Constedt in 1751. The nickel atom has a radius of 124 pm and a Van der Waals radius of 184 pm. In its elemental form, nickel has a lustrous metallic silver appearance. Elemental Nickel Nickel is a hard and ductile transition metal that is considered corrosion-resistant because of its slow rate of oxidation. It is one of four elements that are ferromagnetic and is used in the production of various type of magnets for commercial use. Nickel is sometimes found free in nature but is more commonly found in ores. The bulk of mined nickel comes from laterite and magmatic sulfide ores. The name originates from the German word "kupfernickel," which means "false copper" from the illusory copper color of the ore. For more information on nickel, including properties, safety data, research, and American Elements' catalog of nickel products, visit the Nickel Information Center.

Silicon (Si) atomic and molecular weight, atomic number and elemental symbolSilicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy Ferrosilicon.Elemental Silicon Silica (or silicon oxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word "silex" which means flint or hard stone. For more information on silicon, including properties, safety data, research, and American Elements' catalog of silicon products, visit the Silicon Information Center.

HEALTH, SAFETY & TRANSPORTATION INFORMATION
Material Safety Data Sheet MSDS
Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Precautions N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
Globally Harmonized System of
Classification and Labelling (GHS)
N/A        

NICKEL SILICDE (Ni2Si) SYNONYMS
Silanediylidenedinickel(II), dinickel silicide

CUSTOMERS FOR NICKEL SILICDE SPUTTERING TARGETS HAVE ALSO LOOKED AT
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PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.


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Request an MSDS or Certificate of Analysis





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Recent Research & Development for Nickel

  • Peng-Fei Yin, Chao Zhou, Xiang-Yu Han, Zheng-Ren Zhang, Chuan-Hui Xia, Li-Li Sun, Shape and phase evolution of nickel sulfide nano/microcrystallines via a facile way, Journal of Alloys and Compounds, Volume 620, 25 January 2015
  • F.F. Han, J.X. Chang, H. Li, L.H. Lou, J. Zhang, Influence of Ta content on hot corrosion behaviour of a directionally solidified nickel base superalloy, Journal of Alloys and Compounds, Volume 619, 15 January 2015
  • Zhen Li, Jiesheng Han, Jinjun Lu, Jianmin Chen, Cavitation erosion behavior of Hastelloy C-276 nickel-based alloy, Journal of Alloys and Compounds, Volume 619, 15 January 2015
  • Rosa Carballo, Berta Covelo, Ana B. Lago, Arantxa Pino-Cuevas, Ezequiel M. Vázquez-López, Exploration of the solid state metallosupramolecular chemistry of mononuclear nickel(II) complexes with α-hydroxycarboxylates and 2,2′-dipyridylamine, Polyhedron, Volume 85, 8 January 2015
  • Sohail Saeed, Khuram Shahzad Ahmed, Naghmana Rashid, Mohammad Azad Malik, Paul O’Brien, Masood Akhtar, Rizwan Hussain, Wing-Tak Wong, Symmetrical and unsymmetrical nickel(II) complexes of N-(dialkylcarbamothioyl)-nitro substituted benzamide as single-source precursors for deposition of nickel sulfide nanostructured thin films by AACVD, Polyhedron, Volume 85, 8 January 2015
  • Xu-Feng Liu, Xie Li, Jing Yan, Synthetic and structural studies of the mononuclear nickel(II) ethanedithiolate complexes with chelating N-substituted bis(diphenylphosphanyl)amine, Polyhedron, Volume 85, 8 January 2015
  • Ali Hossein Kianfar, Mroteza Dostani, Wan Ahmad Kamil Mahmood, An unprecedented DDQ–nickel(II)Salen complex interaction and X-ray crystal structure of nickel(II)Salen.DDH co-crystal, Polyhedron, Volume 85, 8 January 2015
  • Kihun Jang, Seongil Yu, Sung-Hyeon Park, Hak-Sung Kim, Heejoon Ahn, Intense pulsed light-assisted facile and agile fabrication of cobalt oxide/nickel cobaltite nanoflakes on nickel-foam for high performance supercapacitor applications, Journal of Alloys and Compounds, Volume 618, 5 January 2015
  • Qiaoqiao Yin, Ru Qiao, Zhengquan Li, Xiao Li Zhang, Lanlan Zhu, Hierarchical nanostructures of nickel-doped zinc oxide: Morphology controlled synthesis and enhanced visible-light photocatalytic activity, Journal of Alloys and Compounds, Volume 618, 5 January 2015
  • Fei Sun, Jianxin Zhang, Shengcheng Mao, Ying Jiang, Qiang Feng, Zhenju Shen, Jixue Li, Ze Zhang, Xiaodong Han, Kink structures induced in nickel-based single crystal superalloys by high-Z element migration, Journal of Alloys and Compounds, Volume 618, 5 January 2015

Recent Research & Development for Silicides

  • M. Saleemi, A. Famengo, S. Fiameni, S. Boldrini, S. Battiston, M. Johnsson, M. Muhammed, M.S. Toprak, Thermoelectric performance of higher manganese silicide nanocomposites, Journal of Alloys and Compounds, Volume 619, 15 January 2015
  • Guillaume Bernard-Granger, Mathieu Soulier, Hilaire Ihou-Mouko, Christelle Navone, Mathieu Boidot, Jean Leforestier, Julia Simon, Microstructure investigations and thermoelectrical properties of a P-type polycrystalline higher manganese silicide material sintered from a gas-phase atomized powder, Journal of Alloys and Compounds, Volume 618, 5 January 2015
  • M.J. Prest, J.S. Richardson-Bullock, Q.T. Zhao, J.T. Muhonen, D. Gunnarsson, M. Prunnila, V.A. Shah, T.E. Whall, E.H.C. Parker, D.R. Leadley, Superconducting platinum silicide for electron cooling in silicon, Solid-State Electronics, Volume 103, January 2015
  • Gordon A. Alanko, Brian Jaques, Allyssa Bateman, Darryl P. Butt, Mechanochemical synthesis and spark plasma sintering of the cerium silicides, Journal of Alloys and Compounds, Volume 616, 15 December 2014
  • Hiroyuki Usui, Kazuma Nouno, Yuya Takemoto, Kengo Nakada, Akira Ishii, Hiroki Sakaguchi, Influence of mechanical grinding on lithium insertion and extraction properties of iron silicide/silicon composites, Journal of Power Sources, Volume 268, 5 December 2014
  • D.O. Poletaev, A.G. Lipnitskii, A.I. Kartamyshev, D.A. Aksyonov, E.S. Tkachev, S.S. Manokhin, M.B. Ivanov, Yu. R. Kolobov, Ab initio-based prediction and TEM study of silicide precipitation in titanium, Computational Materials Science, Volume 95, December 2014
  • P. Tsakiropoulos, On the macrosegregation of silicon in niobium silicide based alloys, Intermetallics, Volume 55, December 2014
  • Toshihiro Yamazaki, Yuichiro Koizumi, Koretaka Yuge, Akihiko Chiba, Koji Hagihara, Takayoshi Nakano, Kyosuke Kishida, Haruyuki Inui, Mechanisms of Cr segregation to C11b/C40 lamellar interface in (Mo,Nb)Si2 duplex silicide: A phase-field study to bridge experimental and first-principles investigations, Intermetallics, Volume 54, November 2014
  • Yeon Soo Kim, J.M. Park, K.H. Lee, B.O. Yoo, H.J. Ryu, B. Ye, In-pile test results of U-silicide or U-nitride coated U-7Mo particle dispersion fuel in Al, Journal of Nuclear Materials, Volume 454, Issues 1–3, November 2014
  • Fang Yuan, Y. Mozharivskyj, A.V. Morozkin, A.V. Knotko, V.O. Yapaskurt, M. Pani, A. Provino, P. Manfrinetti, The Dy–Ni–Si system as a representative of the rare earth–Ni–Si family: Its isothermal section and new rare-earth nickel silicides, Journal of Solid State Chemistry, Volume 219, November 2014