Tantalum Elemental Symbol
Tantalum



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Tantale Tantal Tantalio Tântalo Tántalo Tantal

Tantalum(Ta) atomic and molecular weight, atomic number and elemental symbolTantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of tantalum's shells is 2, 8, 18, 32, 11, 2 and its electron configuration is [Xe] 4f14 5d3 6s2. Tantalum Bohr ModelThe tantalum atom has a radius of 143.pm and its Van der Waals radius is 200.pm. In its elemental form, CAS 7440-25-7, tantalum has a gray blue appearance. High Purity (99.999%) Tantalum (Ta) MetalTantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Tantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos, meaning Father of Niobe in Greek mythology.

Tantalum has a number of interesting properties that make it particularly useful in electronic applications. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for the electronic capacitors used in most telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers.Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. High Purity (99.999%) Tantalum Oxide (Ta2O5) PowderTantalum is added to glass for its high refractive index. It also has various applications in nuclear energy. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity). Elemental or metallic forms include pellets, rod, wire and granules for evaporation source material purposes. High Purity (99.999%) Tantalum Sputtering Target Tantalum nanoparticles and nanopowders provide ultra-high surface area which nanotechnology research and recent experiments demonstrate function to create new and unique properties and benefits. Oxides are available in powder and dense pellet form for such uses as optical coating and thin film applications. Oxides tend to be insoluble. Fluorides are another insoluble form for uses in which oxygen is undesirable such as metallurgy, chemical and physical vapor deposition and in some optical coatings. Tantalum is also available in soluble forms including chlorides, nitrates and acetates. These compounds can be manufactured as solutions at specified stoichiometries.

Tantalum is not toxic in its elemental form; however, safety data for Tantalum and its compounds can vary widely depending on the form. For potential hazard information, toxicity, and road, sea and air transportation limitations, such as DOT Hazard Class, DOT Number, EU Number, NFPA Health rating and RTECS Class, please see the specific material or compound referenced in the Products tab below.


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Tantalum Properties


GENERAL PROPERTIES   PHYSICAL PROPERTIES  
Symbol: Ta Melting Point: 3290 K, 3017 °C, 5463 °F
Atomic Number: 73 Boiling Point: 5731 K, 5458 °C, 9856 °F
Atomic Weight: 180.94788 Density: 16.69 g·cm−3
Element Category: transition metal Liquid Density @ Melting Point: 15 g·cm−3
Group, Period, Block: 5, 6, d Specific Heat: 0.14 (kJ/kg K)
    Heat of Vaporization 758.22 kJ mol-1
CHEMICAL STRUCTURE Heat of Fusion 31.4 kJ mol-1
Electrons: 73 Thermal Conductivity: 57.5 W·m−1·K−1
Protons: 73 Thermal Expansion: (25 °C) 6.3 µm·m−1·K−1
Neutrons: 108 Electrical Resistivity: (20 °C) 131 nΩ·m
Electron Configuration: [Xe] 4f145d36s2 Electronegativity: 1.5 (Pauling scale)
Atomic Radius: 146 pm Tensile Strength: N/A
Covalent Radius: 170±8 pm Molar Heat Capacity: 25.36 J·mol−1·K−1
Van der Waals radius: 200.pm Young's Modulus: 186 GPa
Oxidation States: 5, 4, 3, 2, -1 (mildly acidic oxide) Shear Modulus: 69 GPa
Phase: Solid Bulk Modulus: 200 GPa
Crystal Structure: body-centered cubic Poisson Ratio: 0.34
Magnetic Ordering: paramagnetic Mohs Hardness: 6.5
1st Ionization Energy: 761 kJ·mol−1 Vickers Hardness: 873 MPa
2nd Ionization Energy: 1500 kJ·mol−1 Brinell Hardness: 800 MPa
3rd Ionization Energy: N/A Speed of Sound: (20 °C) 3400 m·s−1
       
IDENTIFIERS   MISCELLANEOUS  
CAS Number: 7440-25-7 Abundance in typical human body, by weight: N/A
ChemSpider ID: 22395 Abundance in typical human body, by atom: N/A
PubChem CID: 23956 Abundance in universe, by weight: 0.08 ppb
MDL Number: MFCD00011252 Abundance in universe, by atom: 0.0006 ppb
EC Number: 231-135-5 Discovered By: Anders Gustaf Ekeberg
Beilstein Number: N/A Discovery Date: 1802
SMILES Identifier: [Ta]  
InChI Identifier: InChI=1S/Ta Other Names: Tantale, Tantal, Tántalo
InChI Key: GUVRBAGPIYLISA-UHFFFAOYSA-N  
       
       
       
       
       

Tantalum Products

Metal Forms  •  Compounds  •  Alloys  •  Oxide Forms  •  Organometallic Compounds
Sputtering Targets  •  Nanomaterials  •  Semiconductor Materials

Compounds

Ammonium Heptafluorotantalate(V)
Barium Tantalum Oxide
Magnesium Tantalate
PZT (Lead Zirconate Titanate)
Potassium Heptafluorotantalate
Potassium Tantalum Niobium Oxide
Potassium Tantalum Oxide
Rubidium Tantalate
Tantalum Acetate Solution
Tantalum Aluminide
Tantalum Boride TaB
Tantalum Boride TaB2
Tantalum(III) Bromide TaBr3
Tantalum(V) Bromide TaBr5
Tantalum Carbide TaC
Tantalum Carbide Ta2C
Tantalum Carbide Foam
Tantalum Carbide Honeycomb
Tantalum Carbide Powder
Tantalum Carbide Sponge
Tantalum Carbide Wool
Tantalum(V) Chloride
Tantalum Chloride Solution
Tantalum Fluoride TaF3
Tantalum(V) Fluoride TaF5
Tantalum Hafnium Carbide
Tantalum(IV) Iodide TaI4
Tantalum(V) Iodide TaI5
Tantalum Hafnium Carbide
Tantalum Hydride
Tantalum Niobium Carbide
Tantalum Nitrate
Tantalum Nitride
Tantalum Oxide
Tantalum Silicide TaSi2
Tantalum Silicide Ta5Si3
Tantalum Trichloride


Sputtering Targets

Aluminum Magnesium Copper Sputtering Target
Aluminum Tantalum Sputtering Target
Chromium Molybdenum Tantalum Sputtering Target
Cobalt Chromium Tantalum Boron Sputtering Target
Tantalum Aluminum Sputtering Target
Tantalum Carbide Sputtering Target
Tantalum Molybdenum Sputtering Target
Tantalum Nitride Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Phosphide Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Selenide Sputtering Target
Tantalum Silicide Sputtering Target
Tantalum Sputtering Target
Tantalum Telluride Sputtering Target


Oxide Forms

Tantalum Oxide Nanopowder
Tantalum Oxide Particles
Tantalum Oxide Pellets
Tantalum Oxide Pieces
Tantalum Oxide Powder
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Shot
Tantalum Oxide Sputtering Target
Tantalum Oxide Tablets


Recent Research & Development for Tantalum

  • Zaenal Awaludin, Takeyoshi Okajima, Takeo Ohsaka, Preparation of reduced tantalum pentoxide by electrochemical technique for oxygen reduction reaction, Journal of Power Sources, Volume 268, 5 December 2014
  • Qing Liao, Yanjie Wang, Yan Chen, Yanying Wei, Haihui Wang, Novel bifunctional tantalum and bismuth co-doped perovskite BaBi0.05Co0.8Ta0.15O3-d with high oxygen permeation, Journal of Membrane Science, Volume 468, 15 October 2014
  • Luciano Cordeiro, Robson Manoel Silva, Gabriele Matinatti de Pietro, Camila Pereira, Elivelton Alves Ferreira, Sidney J.L. Ribeiro, Younes Messaddeq, Fábia Castro Cassanjes, Gael Poirier, Thermal and structural properties of tantalum alkali-phosphate glasses, Journal of Non-Crystalline Solids, Volume 402, 15 October 2014
  • Agnieszka Gubernat, Lukasz Zych, The isothermal sintering of the single-phase non-stoichiometric niobium carbide (NbC1-x) and tantalum carbide (TaC1-x), Journal of the European Ceramic Society, Volume 34, Issue 12, October 2014
  • Yunlang Cheng, Ling Cao, Gang He, Guang Yao, Xueping Song, Zhaoqi Sun, Preparation, microstructure and photoelectrical properties of Tantalum-doped zinc oxide transparent conducting films, Journal of Alloys and Compounds, Volume 608, 25 September 2014
  • C. Deng, S.F. Liu, X.B. Hao, J.L. Ji, Z.Q. Zhang, Q. Liu, Orientation dependence of stored energy release and microstructure evolution in cold rolled tantalum, International Journal of Refractory Metals and Hard Materials, Volume 46, September 2014
  • Z.Y. Nuru, C.J. Arendse, S. Khamlich, L. Kotsedi, M. Maaza, A Tantalum diffusion barrier layer to improve the thermal stability of AlxOy/Pt/AlxOy multilayer solar absorber, Solar Energy, Volume 107, September 2014
  • Konstantin P. Savkin, Alexey S. Bugaev, Alexey G. Nikolaev, Efim M. Oks, Maxim V. Shandrikov, Georgy Yu. Yushkov, Andrey V. Tyunkov, Elena V. Savruk, Sheet resistance of alumina ceramic after high energy implantation of tantalum ions, Applied Surface Science, Volume 310, 15 August 2014
  • Yaron Amouyal, Zugang Mao, David N. Seidman, Combined atom probe tomography and first-principles calculations for studying atomistic interactions between tungsten and tantalum in nickel-based alloys, Acta Materialia, Volume 74, 1 August 2014
  • C. Hertl, L. Koll, T. Schmitz, E. Werner, U. Gbureck, Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium, Materials Science and Engineering: C, Volume 41, 1 August 2014
  • Nuno P. Barradas, E. Alves, M. Fonseca, Z. Siketic, I. Bogdanovic Radovic, Stopping power of C, O and Cl in tantalum oxide, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Volume 332, 1 August 2014
  • J.C. Sarker, R. Vasan, Y.F. Makableh, S. Lee, A.I. Nusir, M.O. Manasreh, Enhanced performance of surface modified InAs quantum dots solar cell by a sol–gel grown tantalum pentoxide antireflection coating, Solar Energy Materials and Solar Cells, Volume 127, August 2014
  • Nicholas A. Pedrazas, Thomas E. Buchheit, Elizabeth A. Holm, Eric M. Taleff, Dynamic abnormal grain growth in tantalum, Materials Science and Engineering: A, Volume 610, 29 July 2014
  • Y.S. Zhang, L.C. Zhang, H.Z. Niu, X.F. Bai, S. Yu, X.Q. Ma, Z.T. Yu, Deformation twinning and localized amorphization in nanocrystalline tantalum induced by sliding friction, Materials Letters, Volume 127, 15 July 2014
  • H. Silva, J. Cruz, A. Redondo-Cubero, C. Santos, M. Fonseca, H. Luis, A.P. Jesus, Comparative analysis of anodized, implanted and sputtered tantalum oxide targets for the study of 16O+16O fusion reaction, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Volume 331, 15 July 2014
  • B. Bouchet-Fabre, M. Pinault, E. Foy, M.C. Hugon, T. Minéa, M. Mayne-L’Hermite, Interface study between Nanostructured tantalum nitride films and Carbon Nanotubes grown by Chemical Vapour Deposition, Applied Surface Science, Available online 14 July 2014
  • C.J. Ruestes, A. Stukowski, Y. Tang, D.R. Tramontina, P. Erhart, B.A. Remington, H.M. Urbassek, M.A. Meyers, E.M. Bringa, Atomistic simulation of tantalum nanoindentation: Effects of indenter diameter, penetration velocity, and interatomic potentials on defect mechanisms and evolution, Materials Science and Engineering: A, Available online 11 July 2014
  • Binhua Chu, Da Li, Kuo Bao, Fubo Tian, Defang Duan, Xiaojing Sha, Pugeng Hou, Yunxian Liu, Huadi Zhang, Bingbing Liu, Tian Cui, Ultrahard boron-rich tantalum boride: monoclinic TaB4, Journal of Alloys and Compounds, Available online 5 July 2014
  • K.C. Atli, I. Karaman, R.D. Noebe, Influence of tantalum additions on the microstructure and shape memory response of Ti50.5Ni24.5Pd25 High-temperature shape memory alloy, Materials Science and Engineering: A, Available online 5 July 2014
  • Yushen Jin, Yanyan Li, Xibo Ma, Zhengbao Zha, Liangliang Shi, Jie Tian, Zhifei Dai, Encapsulating tantalum oxide into polypyrrole nanoparticles for X-ray CT/photoacoustic bimodal imaging-guided photothermal ablation of cancer, Biomaterials, Volume 35, Issue 22, July 2014

Tantalum Isotopes


Naturally occuring tantalum (Ta) has two stable isotopes: 180Ta (0.012%) and 181Ta (99.988%).

Nuclide Symbol Isotopic Mass Half-Life Nuclear Spin
180Ta 179.9474648 Observationally Stable 9-
181Ta 180.9479958 Observationally Stable 7/2+