Tantalum Elemental Symbol

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Tantale Tantal Tantalio Tântalo Tántalo Tantal

Tantalum(Ta) atomic and molecular weight, atomic number and elemental symbolTantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of tantalum's shells is 2, 8, 18, 32, 11, 2 and its electron configuration is [Xe] 4f14 5d3 6s2. Tantalum Bohr ModelThe tantalum atom has a radius of 143.pm and its Van der Waals radius is 200.pm. In its elemental form, CAS 7440-25-7, tantalum has a gray blue appearance. High Purity (99.999%) Tantalum (Ta) MetalTantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Tantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos, meaning Father of Niobe in Greek mythology.

Tantalum has a number of interesting properties that make it particularly useful in electronic applications. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for the electronic capacitors used in most telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers.Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. High Purity (99.999%) Tantalum Oxide (Ta2O5) PowderTantalum is added to glass for its high refractive index. It also has various applications in nuclear energy. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity). Elemental or metallic forms include pellets, rod, wire and granules for evaporation source material purposes. High Purity (99.999%) Tantalum Sputtering Target Tantalum nanoparticles and nanopowders provide ultra-high surface area which nanotechnology research and recent experiments demonstrate function to create new and unique properties and benefits. Oxides are available in powder and dense pellet form for such uses as optical coating and thin film applications. Oxides tend to be insoluble. Fluorides are another insoluble form for uses in which oxygen is undesirable such as metallurgy, chemical and physical vapor deposition and in some optical coatings. Tantalum is also available in soluble forms including chlorides, nitrates and acetates. These compounds can be manufactured as solutions at specified stoichiometries.

Tantalum is not toxic in its elemental form; however, safety data for Tantalum and its compounds can vary widely depending on the form. For potential hazard information, toxicity, and road, sea and air transportation limitations, such as DOT Hazard Class, DOT Number, EU Number, NFPA Health rating and RTECS Class, please see the specific material or compound referenced in the Products tab below.

  • Properties
  • Safety Data
  • Products
  • Research
  • Isotopes
  • Other Elements

Tantalum Properties

Symbol: Ta Melting Point: 3290 K, 3017 °C, 5463 °F
Atomic Number: 73 Boiling Point: 5731 K, 5458 °C, 9856 °F
Atomic Weight: 180.94788 Density: 16.69 g·cm−3
Element Category: transition metal Liquid Density @ Melting Point: 15 g·cm−3
Group, Period, Block: 5, 6, d Specific Heat: 0.14 (kJ/kg K)
    Heat of Vaporization 758.22 kJ mol-1
CHEMICAL STRUCTURE Heat of Fusion 31.4 kJ mol-1
Electrons: 73 Thermal Conductivity: 57.5 W·m−1·K−1
Protons: 73 Thermal Expansion: (25 °C) 6.3 µm·m−1·K−1
Neutrons: 108 Electrical Resistivity: (20 °C) 131 nΩ·m
Electron Configuration: [Xe] 4f145d36s2 Electronegativity: 1.5 (Pauling scale)
Atomic Radius: 146 pm Tensile Strength: N/A
Covalent Radius: 170±8 pm Molar Heat Capacity: 25.36 J·mol−1·K−1
Van der Waals radius: 200.pm Young's Modulus: 186 GPa
Oxidation States: 5, 4, 3, 2, -1 (mildly acidic oxide) Shear Modulus: 69 GPa
Phase: Solid Bulk Modulus: 200 GPa
Crystal Structure: body-centered cubic Poisson Ratio: 0.34
Magnetic Ordering: paramagnetic Mohs Hardness: 6.5
1st Ionization Energy: 761 kJ·mol−1 Vickers Hardness: 873 MPa
2nd Ionization Energy: 1500 kJ·mol−1 Brinell Hardness: 800 MPa
3rd Ionization Energy: N/A Speed of Sound: (20 °C) 3400 m·s−1
CAS Number: 7440-25-7 Abundance in typical human body, by weight: N/A
ChemSpider ID: 22395 Abundance in typical human body, by atom: N/A
PubChem CID: 23956 Abundance in universe, by weight: 0.08 ppb
MDL Number: MFCD00011252 Abundance in universe, by atom: 0.0006 ppb
EC Number: 231-135-5 Discovered By: Anders Gustaf Ekeberg
Beilstein Number: N/A Discovery Date: 1802
SMILES Identifier: [Ta]  
InChI Identifier: InChI=1S/Ta Other Names: Tantale, Tantal, Tántalo

Tantalum Products

Metal Forms  •  Compounds  •  Alloys  •  Oxide Forms  •  Organometallic Compounds
Sputtering Targets  •  Nanomaterials  •  Semiconductor Materials


Ammonium Heptafluorotantalate(V)
Barium Tantalum Oxide
Magnesium Tantalate
PZT (Lead Zirconate Titanate)
Potassium Heptafluorotantalate
Potassium Tantalum Niobium Oxide
Potassium Tantalum Oxide
Rubidium Tantalate
Tantalum Acetate Solution
Tantalum Aluminide
Tantalum Boride TaB
Tantalum Boride TaB2
Tantalum(III) Bromide TaBr3
Tantalum(V) Bromide TaBr5
Tantalum Carbide TaC
Tantalum Carbide Ta2C
Tantalum Carbide Foam
Tantalum Carbide Honeycomb
Tantalum Carbide Powder
Tantalum Carbide Sponge
Tantalum Carbide Wool
Tantalum(V) Chloride
Tantalum Chloride Solution
Tantalum Fluoride TaF3
Tantalum(V) Fluoride TaF5
Tantalum Hafnium Carbide
Tantalum(IV) Iodide TaI4
Tantalum(V) Iodide TaI5
Tantalum Hafnium Carbide
Tantalum Hydride
Tantalum Niobium Carbide
Tantalum Nitrate
Tantalum Nitride
Tantalum Oxide
Tantalum Silicide TaSi2
Tantalum Silicide Ta5Si3
Tantalum Trichloride

Sputtering Targets

Aluminum Magnesium Copper Sputtering Target
Aluminum Tantalum Sputtering Target
Chromium Molybdenum Tantalum Sputtering Target
Cobalt Chromium Tantalum Boron Sputtering Target
Tantalum Aluminum Sputtering Target
Tantalum Carbide Sputtering Target
Tantalum Molybdenum Sputtering Target
Tantalum Nitride Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Phosphide Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Selenide Sputtering Target
Tantalum Silicide Sputtering Target
Tantalum Sputtering Target
Tantalum Telluride Sputtering Target

Oxide Forms

Tantalum Oxide Nanopowder
Tantalum Oxide Particles
Tantalum Oxide Pellets
Tantalum Oxide Pieces
Tantalum Oxide Powder
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Shot
Tantalum Oxide Sputtering Target
Tantalum Oxide Tablets

Recent Research & Development for Tantalum

  • S.F. Liu, H.Y. Fan, C. Deng, X.B. Hao, Y. Guo, Q. Liu, Through-thickness texture in clock-rolled tantalum plate, International Journal of Refractory Metals and Hard Materials, Volume 48, January 2015
  • Youngmoo Kim, Eun-Pyo Kim, Joon-Woong Noh, Sung Ho Lee, Young-Sam Kwon, In Seok Oh, Fabrication and mechanical properties of powder metallurgy tantalum prepared by hot isostatic pressing, International Journal of Refractory Metals and Hard Materials, Volume 48, January 2015
  • Xiao-Yue Tan, Lai-Ma Luo, Ze-Long Lu, Guang-Nan Luo, Xiang Zan, Ji-Gui Cheng, Yu-Cheng Wu, Development of tungsten as plasma-facing materials by doping tantalum carbide nanoparticles, Powder Technology, Volume 269, January 2015
  • Binhua Chu, Da Li, Kuo Bao, Fubo Tian, Defang Duan, Xiaojing Sha, Pugeng Hou, Yunxian Liu, Huadi Zhang, Bingbing Liu, Tian Cui, Ultrahard boron-rich tantalum boride: Monoclinic TaB4, Journal of Alloys and Compounds, Volume 617, 25 December 2014
  • Zaenal Awaludin, Takeyoshi Okajima, Takeo Ohsaka, Preparation of reduced tantalum pentoxide by electrochemical technique for oxygen reduction reaction, Journal of Power Sources, Volume 268, 5 December 2014
  • Haitham Mohammad Abdelaal, Erik Pfeifer, Christina Grünberg, Bernd Harbrecht, Synthesis of tantalum pentoxide hollow spheres utilizing a sacrificial templating approach, Materials Letters, Volume 136, 1 December 2014
  • Yongsheng Zhou, Pan Jin, Shifu Chen, Yingchun Zhu, Tantalum nitride nanowires: Synthesis and characterization, Materials Letters, Volume 136, 1 December 2014
  • Xiao-Xiang Yu, Christopher R. Weinberger, Gregory B. Thompson, Ab initio investigations of the phase stability in tantalum carbides, Acta Materialia, Volume 80, November 2014
  • R. Govindarajan, M. Keswani, S. Raghavan, Galvanic corrosion characteristics of poly silicon–tantalum nitride couple immersed in dilute HF solutions, Materials Science in Semiconductor Processing, Volume 27, November 2014
  • Wei-Kang Hsieh, Kin-Tak Lam, Shoou-Jinn Chang, Characteristics of tantalum-doped silicon oxide-based resistive random access memory, Materials Science in Semiconductor Processing, Volume 27, November 2014

Tantalum Isotopes

Naturally occuring tantalum (Ta) has two stable isotopes: 180Ta (0.012%) and 181Ta (99.988%).

Nuclide Symbol Isotopic Mass Half-Life Nuclear Spin
180Ta 179.9474648 Observationally Stable 9-
181Ta 180.9479958 Observationally Stable 7/2+