American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards.See safety data and research below and pricing/lead time above. American Elements specializes in producing high purity Tantalum Aluminum Sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Tantalum as rods, powder and plates. Other shapes are available by request.
Tantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f14 5d3 6s2. In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in electronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below. See Tantalum research below.
Aluminum is a Block P, Group 13, Period 3 element. The number of electrons in each of Aluminum's shells is 2, 8, 3 and its electronic configuration is [Ne] 3s2 3p1. In its elemental form aluminum's CAS number is 7429-90-5. The aluminum atom has a radius of 143.2.pm and it's Van der Waals radius is 200.pm. Aluminum is the most abundant metal in the earth's crust. Aluminum is not known to be harmful but ingestion may cause Alzheimer's disease.Aluminum is a silvery-white metal that possesses many desirable characteristics. It is light, nonmagnetic and nonsparking.
It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many industrial applications where a strong, light, easily constructed material is needed. Although it's electrical conductivity is only about 60% that of copper, it is used in electrical transmission lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements impart a variety of useful properties. These alloys are of vital importance in the construction of modern aircraft and rockets. Aluminum, evaporated in a vacuum, forms a highly reflective coating for both visible light and radiant heat. They are used to coat telescope mirrors. Aluminum is available as metal and compounds with purities from 99% to 99.9999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. See Aluminum research below.
PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.
Mitral Valve Annuloplasty : A Quantitative Clinical and Mechanical Comparison of Different Annuloplasty Devices.
Rausch MK, Bothe W, Kvitting JP, Swanson JC, Miller DC, Kuhl E.
Ann Biomed Eng. 2011 Oct 25. [Epub ahead of print]
PMID:
22037916
[PubMed - as supplied by publisher]
The Tetrahydrometalate Species VH2(H2), NbH4, and TaH4: Matrix Infrared Spectra and Quantum Chemical Calculations.
Wang X, Andrews L.
J Phys Chem A. 2011 Oct 24. [Epub ahead of print]
PMID:
22017260
[PubMed - as supplied by publisher]
Controlled Synthesis of Tantalum Oxynitride and Nitride Nanoparticles.
Gao Q, Giordano C, Antonietti M.
Small. 2011 Oct 19. doi: 10.1002/smll.201101207. [Epub ahead of print]
PMID:
22009942
[PubMed - as supplied by publisher]
Surgical Technique: Porous Tantalum Reconstruction for Destructive Nonprimary Periacetabular Tumors.
Khan FA, Rose PS, Yanagisawa M, Lewallen DG, Sim FH.
Clin Orthop Relat Res. 2011 Oct 12. [Epub ahead of print]
PMID:
21989784
[PubMed - as supplied by publisher]
Carbon Radical Generation by d(0) Tantalum Complexes with ?-Diimine Ligands through Ligand-Centered Redox Processes.
Tsurugi H, Saito T, Tanahashi H, Arnold J, Mashima K.
J Am Chem Soc. 2011 Oct 26. [Epub ahead of print]
PMID:
21981364
[PubMed - as supplied by publisher]
Trabecular metal cup without augments for acetabular revision in case of extensive bone loss and low bone-prosthesis contact.
Pierannunzii L, Mambretti A, D'Imporzano M.
Int J Immunopathol Pharmacol. 2011 Jan-Mar;24(1 Suppl 2):133-7.
PMID:
21669152
[PubMed - indexed for MEDLINE]
Effects of the [OC6F5] moiety upon structural geometry: crystal structures of half-sandwich tantalum(V) aryloxide complexes from reaction of Cp*Ta(N(t)Bu)(CH2R)2 with pentafluorophenol.
Cole JM, Chan MC, Gibson VC, Howard JA.
Acta Crystallogr B. 2011 Oct;67(Pt 5):416-24. Epub 2011 Aug 31.
PMID:
21931211
[PubMed]
Surgical Technique: A Cup-in-Cup Technique to Restore Offset in Severe Protrusio Acetabular Defects.
Blumenfeld TJ, Bargar WL.
Clin Orthop Relat Res. 2011 Sep 14. [Epub ahead of print]
PMID:
21915769
[PubMed - as supplied by publisher]
Tantalum (oxy)nitrides: Preparation, characterisation and enhancement of photo-Fenton-like degradation of atrazine under visible light.
Du Y, Zhao L, Su Y.
J Hazard Mater. 2011 Nov 15;195:291-7. Epub 2011 Aug 22.
PMID:
21885191
[PubMed - in process]
Prospective Results of Uncemented Tantalum Monoblock Tibia in Total Knee Arthroplasty Minimum 5-Year Follow-up in Patients Younger Than 55 Years.
Kamath AF, Lee GC, Sheth NP, Nelson CL, Garino JP, Israelite CL.
J Arthroplasty. 2011 Aug 25. [Epub ahead of print]
PMID:
21872424
[PubMed - as supplied by publisher]
X-ray absorption, photoemission spectroscopy, and Raman scattering analysis of amorphous tantalum oxide with a large extent of oxygen nonstoichiometry.
Tsuchiya T, Imai H, Miyoshi S, Glans PA, Guo J, Yamaguchi S.
Phys Chem Chem Phys. 2011 Oct 14;13(38):17013-8. Epub 2011 Aug 24.
PMID:
21863188
[PubMed - in process]
Evaluation of gene expression in MG63 human osteoblastlike cells exposed to tantalum powder by microarray technology.
Sollazzo V, Pezzetti F, Massari L, Palmieri A, Brunelli G, Zollino I, Lucchese A, Caruso G, Carinci F.
Int J Periodontics Restorative Dent. 2011 Jul-Aug;31(4):e17-28.
PMID:
21837296
[PubMed - in process]
Hemocompatibility investigation of the NiTi alloy implanted with tantalum.
Zhao T, Li Y, Gao Y, Xiang Y, Chen H, Zhang T.
J Mater Sci Mater Med. 2011 Oct;22(10):2311-8. Epub 2011 Aug 11.
PMID:
21833606
[PubMed - in process]
[Treatment of adult early femur head necrosis with the tantalum screw].
Luo HY, Chen CW.
Zhongguo Gu Shang. 2011 Jun;24(6):482-5. Chinese.
PMID:
21786551
[PubMed - indexed for MEDLINE]
A comparison of calibration methods for stereo fluoroscopic imaging systems.
Kaptein BL, Shelburne KB, Torry MR, Giphart JE.
J Biomech. 2011 Sep 2;44(13):2511-5. Epub 2011 Jul 23.
PMID:
21783196
[PubMed - in process]
Titanium and tantalum as mesenchymal stem cell scaffolds for spinal fusion: an in vitro comparative study.
Blanco JF, Sánchez-Guijo FM, Carrancio S, Muntion S, García-Briñon J, del Cañizo MC.
Eur Spine J. 2011 Aug;20 Suppl 3:353-60. Epub 2011 Jul 16.
PMID:
21779858
[PubMed - in process]
Synthetic and structural studies of monocyclopentadienyl cyclometalated aryl tantalum(V) compounds.
Galajov M, Galindo A, García C, Gómez M, Gómez-Sal P, Parra A.
Dalton Trans. 2011 Sep 7;40(33):8399-406. Epub 2011 Jul 22.
PMID:
21779602
[PubMed - in process]
Designing catalysts for nitrene transfer using early transition metals and redox-active ligands.
Heyduk AF, Zarkesh RA, Nguyen AI.
Inorg Chem. 2011 Oct 17;50(20):9849-63. Epub 2011 Jul 20.
PMID:
21774482
[PubMed - in process]
A randomised study of peri-prosthetic bone density after cemented versus trabecular fixation of a polyethylene acetabular component.
Periasamy K, Watson WS, Mohammed A, Murray H, Walker B, Patil S, Meek RM.
J Bone Joint Surg Br. 2011 Aug;93(8):1033-44.
PMID:
21768625
[PubMed - indexed for MEDLINE]
Bis(?-2-tert-butyl-phenyl-imido-1:2?N:N)chlorido-2?Cl-(diethyl ether-1?O)(2?-penta-methyl-cyclo-penta-dien-yl)lithiumtantalum(V).
Cole JM, Chan MC, Gibson VC, Howard JA.
Acta Crystallogr Sect E Struct Rep Online. 2011 Jun 1;67(Pt 6):m688-9. Epub 2011 May 7.
PMID:
21754594
[PubMed]
Proud sponsors of Aeromat 2012. Please join us and our customers & co-sponsors Boeing and ATI on
June 18-20, 2012
in Charlotte, North Carolina
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Tantalum as rods, powder and plates. Other shapes are available by request. 
Tantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f14 5d3 6s2. In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in 
electronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most 
telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below. See Tantalum research below.
Aluminum is a Block P, Group 13, Period 3 element. The number of electrons in each of Aluminum's shells is 2, 8, 3 and its electronic configuration is [Ne] 3s2 3p1. In its elemental form aluminum's CAS number is 7429-90-5. The aluminum atom has a radius of 143.2.pm and it's Van der Waals radius is 200.pm. Aluminum is the most abundant metal in the earth's crust. Aluminum is not known to be harmful but ingestion may cause Alzheimer's disease.Aluminum is a silvery-white metal that possesses many desirable characteristics. It is light, nonmagnetic and nonsparking.
It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many
industrial applications where a strong, light, easily constructed material is needed. Although it's electrical conductivity is only about 60% that of copper, it is used in electrical transmission 
lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements impart a variety of useful properties. These alloys are of vital importance in the construction of modern aircraft and rockets. Aluminum, evaporated in a vacuum, forms a highly reflective coating for both visible light and radiant heat. They are used to coat telescope mirrors. Aluminum is available as metal and compounds with purities from 99% to 99.9999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. See Aluminum research below.
