American Elements specializes in producing high purity Shot and irregular shaped Tantalum Pieces with the highest possible density and smallest possible average grain sizes for use in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Pieces sizes average in the range of 3 mm, 4 -5 mm, 100 - 150 mm, 1/8" and 1/4". We can also provide Pieces and Shot outside this range. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. See research below. We also produce Tantalum as rod, ingot, powder, pellets, disc, granules, wire, and in compound forms, such as oxide. Other shapes are available by request.
Tantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f14 5d3 6s2. In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in electronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below. See Tantalum research below.
PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Bullion and bar forms are best if purchasing solely for physical possession and risk exposure.
Mitral Valve Annuloplasty : A Quantitative Clinical and Mechanical Comparison of Different Annuloplasty Devices.
Rausch MK, Bothe W, Kvitting JP, Swanson JC, Miller DC, Kuhl E.
Ann Biomed Eng. 2011 Oct 25. [Epub ahead of print]
PMID:
22037916
[PubMed - as supplied by publisher]
The Tetrahydrometalate Species VH2(H2), NbH4, and TaH4: Matrix Infrared Spectra and Quantum Chemical Calculations.
Wang X, Andrews L.
J Phys Chem A. 2011 Oct 24. [Epub ahead of print]
PMID:
22017260
[PubMed - as supplied by publisher]
Controlled Synthesis of Tantalum Oxynitride and Nitride Nanoparticles.
Gao Q, Giordano C, Antonietti M.
Small. 2011 Oct 19. doi: 10.1002/smll.201101207. [Epub ahead of print]
PMID:
22009942
[PubMed - as supplied by publisher]
Surgical Technique: Porous Tantalum Reconstruction for Destructive Nonprimary Periacetabular Tumors.
Khan FA, Rose PS, Yanagisawa M, Lewallen DG, Sim FH.
Clin Orthop Relat Res. 2011 Oct 12. [Epub ahead of print]
PMID:
21989784
[PubMed - as supplied by publisher]
Carbon Radical Generation by d(0) Tantalum Complexes with ?-Diimine Ligands through Ligand-Centered Redox Processes.
Tsurugi H, Saito T, Tanahashi H, Arnold J, Mashima K.
J Am Chem Soc. 2011 Oct 26. [Epub ahead of print]
PMID:
21981364
[PubMed - as supplied by publisher]
Trabecular metal cup without augments for acetabular revision in case of extensive bone loss and low bone-prosthesis contact.
Pierannunzii L, Mambretti A, D'Imporzano M.
Int J Immunopathol Pharmacol. 2011 Jan-Mar;24(1 Suppl 2):133-7.
PMID:
21669152
[PubMed - indexed for MEDLINE]
Effects of the [OC6F5] moiety upon structural geometry: crystal structures of half-sandwich tantalum(V) aryloxide complexes from reaction of Cp*Ta(N(t)Bu)(CH2R)2 with pentafluorophenol.
Cole JM, Chan MC, Gibson VC, Howard JA.
Acta Crystallogr B. 2011 Oct;67(Pt 5):416-24. Epub 2011 Aug 31.
PMID:
21931211
[PubMed]
Surgical Technique: A Cup-in-Cup Technique to Restore Offset in Severe Protrusio Acetabular Defects.
Blumenfeld TJ, Bargar WL.
Clin Orthop Relat Res. 2011 Sep 14. [Epub ahead of print]
PMID:
21915769
[PubMed - as supplied by publisher]
Tantalum (oxy)nitrides: Preparation, characterisation and enhancement of photo-Fenton-like degradation of atrazine under visible light.
Du Y, Zhao L, Su Y.
J Hazard Mater. 2011 Nov 15;195:291-7. Epub 2011 Aug 22.
PMID:
21885191
[PubMed - in process]
Prospective Results of Uncemented Tantalum Monoblock Tibia in Total Knee Arthroplasty Minimum 5-Year Follow-up in Patients Younger Than 55 Years.
Kamath AF, Lee GC, Sheth NP, Nelson CL, Garino JP, Israelite CL.
J Arthroplasty. 2011 Aug 25. [Epub ahead of print]
PMID:
21872424
[PubMed - as supplied by publisher]
X-ray absorption, photoemission spectroscopy, and Raman scattering analysis of amorphous tantalum oxide with a large extent of oxygen nonstoichiometry.
Tsuchiya T, Imai H, Miyoshi S, Glans PA, Guo J, Yamaguchi S.
Phys Chem Chem Phys. 2011 Oct 14;13(38):17013-8. Epub 2011 Aug 24.
PMID:
21863188
[PubMed - in process]
Evaluation of gene expression in MG63 human osteoblastlike cells exposed to tantalum powder by microarray technology.
Sollazzo V, Pezzetti F, Massari L, Palmieri A, Brunelli G, Zollino I, Lucchese A, Caruso G, Carinci F.
Int J Periodontics Restorative Dent. 2011 Jul-Aug;31(4):e17-28.
PMID:
21837296
[PubMed - in process]
Hemocompatibility investigation of the NiTi alloy implanted with tantalum.
Zhao T, Li Y, Gao Y, Xiang Y, Chen H, Zhang T.
J Mater Sci Mater Med. 2011 Oct;22(10):2311-8. Epub 2011 Aug 11.
PMID:
21833606
[PubMed - in process]
[Treatment of adult early femur head necrosis with the tantalum screw].
Luo HY, Chen CW.
Zhongguo Gu Shang. 2011 Jun;24(6):482-5. Chinese.
PMID:
21786551
[PubMed - indexed for MEDLINE]
A comparison of calibration methods for stereo fluoroscopic imaging systems.
Kaptein BL, Shelburne KB, Torry MR, Giphart JE.
J Biomech. 2011 Sep 2;44(13):2511-5. Epub 2011 Jul 23.
PMID:
21783196
[PubMed - in process]
Titanium and tantalum as mesenchymal stem cell scaffolds for spinal fusion: an in vitro comparative study.
Blanco JF, Sánchez-Guijo FM, Carrancio S, Muntion S, García-Briñon J, del Cañizo MC.
Eur Spine J. 2011 Aug;20 Suppl 3:353-60. Epub 2011 Jul 16.
PMID:
21779858
[PubMed - in process]
Synthetic and structural studies of monocyclopentadienyl cyclometalated aryl tantalum(V) compounds.
Galajov M, Galindo A, García C, Gómez M, Gómez-Sal P, Parra A.
Dalton Trans. 2011 Sep 7;40(33):8399-406. Epub 2011 Jul 22.
PMID:
21779602
[PubMed - in process]
Designing catalysts for nitrene transfer using early transition metals and redox-active ligands.
Heyduk AF, Zarkesh RA, Nguyen AI.
Inorg Chem. 2011 Oct 17;50(20):9849-63. Epub 2011 Jul 20.
PMID:
21774482
[PubMed - in process]
A randomised study of peri-prosthetic bone density after cemented versus trabecular fixation of a polyethylene acetabular component.
Periasamy K, Watson WS, Mohammed A, Murray H, Walker B, Patil S, Meek RM.
J Bone Joint Surg Br. 2011 Aug;93(8):1033-44.
PMID:
21768625
[PubMed - indexed for MEDLINE]
Bis(?-2-tert-butyl-phenyl-imido-1:2?N:N)chlorido-2?Cl-(diethyl ether-1?O)(2?-penta-methyl-cyclo-penta-dien-yl)lithiumtantalum(V).
Cole JM, Chan MC, Gibson VC, Howard JA.
Acta Crystallogr Sect E Struct Rep Online. 2011 Jun 1;67(Pt 6):m688-9. Epub 2011 May 7.
PMID:
21754594
[PubMed]
and smallest possible average grain sizes for use in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Pieces sizes average in the range of 3 mm, 4 -5 mm, 100 - 150 mm, 1/8" and 1/4". We can also provide Pieces and Shot outside this range. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. See research below. We also produce Tantalum as rod, ingot, powder, pellets, disc, granules, wire, and in compound forms, such as oxide. Other shapes are available by request. 
Tantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f14 5d3 6s2. In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in 
electronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most 
telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below. See Tantalum research below.
