Tantalum Pellets

High Purity Ta Pellets
CAS 7440-25-7


Product Product Code Order or Specifications
(2N) 99% Tantalum Pellets TA-M-02-PE Contact American Elements
(3N) 99.9% Tantalum Pellets TA-M-03-PE Contact American Elements
(4N) 99.99% Tantalum Pellets TA-M-04-PE Contact American Elements
(5N) 99.999% Tantalum Pellets TA-M-05-PE Contact American Elements

CHEMICAL
IDENTIFIER
Formula CAS No. PubChem SID PubChem CID MDL No. EC No Beilstein
Re. No.
SMILES
Identifier
InChI
Identifier
InChI
Key
Ta 7440-25-7 24855933 N/A MFCD00011252 231-135-5 N/A [Ta] InChI=1S/Ta GUVRBAGPIYLISA-UHFFFAOYSA-N

PROPERTIES Mol. Wt. Appearance Density Tensile Strength Melting Point Boiling Point Thermal Conductivity Electrical Resistivity Eletronegativity Specific Heat Heat of Vaporization Heat of Fusion MSDS
180.94 Silvery-gray 16.654 gm/cc up to 130,000 psi 2996 °C 5425 °C 0.575 W/cm/K @ 298.2 K 12.45 microhm-cm @ 0°C 1.5 Paulings 0.0334 Cal/g/K @ 25 °C 180 K-Cal/gm atom at 5425°C 7.5 Cal/gm mole Safety Data Sheet

American Elements specializes in producing high purity uniform shaped Tantalum Pellets with the highest possible density High Purity Pelletsand smallest possible average grain sizes for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Pellet sizes range from 1/8" x 1/8" to 1/4" x 1/4" and 3 mm diameter. We can also provide Pellets outside this range for ultra high purity thin film applications, such as fuel cells and solar energy layers. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. See research below. We also produce Tantalum as rod, ingot, powder, pieces, disc, granules, wire, and in compound forms, such as oxide. Other shapes are available by request.

Tantalum (Ta) atomic and molecular weight, atomic number and elemental symbolTantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. The number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. Tantalum Bohr ModelThe tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm Tantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden; however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. High Purity (99.999%) Tantalum (Ta) Metal In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. For more information on tantalum, including properties, safety data, research, and American Elements' catalog of tantalum products, visit the Tantalum Information Center.


HEALTH, SAFETY & TRANSPORTATION INFORMATION
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PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.


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Recent Research & Development for Tantalum

  • Zaenal Awaludin, Takeyoshi Okajima, Takeo Ohsaka, Preparation of reduced tantalum pentoxide by electrochemical technique for oxygen reduction reaction, Journal of Power Sources, Volume 268, 5 December 2014
  • R. Govindarajan, M. Keswani, S. Raghavan, Galvanic corrosion characteristics of poly silicon–tantalum nitride couple immersed in dilute HF solutions, Materials Science in Semiconductor Processing, Volume 27, November 2014
  • Wei-Kang Hsieh, Kin-Tak Lam, Shoou-Jinn Chang, Characteristics of tantalum-doped silicon oxide-based resistive random access memory, Materials Science in Semiconductor Processing, Volume 27, November 2014
  • Diletta Sciti, Laura Silvestroni, Jean-Louis Sans, Luca Mercatelli, Marco Meucci, Elisa Sani, Tantalum diboride-based ceramics for bulk solar absorbers, Solar Energy Materials and Solar Cells, Volume 130, November 2014
  • Qing Liao, Yanjie Wang, Yan Chen, Yanying Wei, Haihui Wang, Novel bifunctional tantalum and bismuth co-doped perovskite BaBi0.05Co0.8Ta0.15O3-d with high oxygen permeation, Journal of Membrane Science, Volume 468, 15 October 2014
  • Luciano Cordeiro, Robson Manoel Silva, Gabriele Matinatti de Pietro, Camila Pereira, Elivelton Alves Ferreira, Sidney J.L. Ribeiro, Younes Messaddeq, Fábia Castro Cassanjes, Gael Poirier, Thermal and structural properties of tantalum alkali-phosphate glasses, Journal of Non-Crystalline Solids, Volume 402, 15 October 2014
  • T.P. Remington, C.J. Ruestes, E.M. Bringa, B.A. Remington, C.H. Lu, B. Kad, M.A. Meyers, Plastic deformation in nanoindentation of tantalum: A new mechanism for prismatic loop formation, Acta Materialia, Volume 78, 1 October 2014
  • Agnieszka Gubernat, Lukasz Zych, The isothermal sintering of the single-phase non-stoichiometric niobium carbide (NbC1-x) and tantalum carbide (TaC1-x), Journal of the European Ceramic Society, Volume 34, Issue 12, October 2014
  • Yunlang Cheng, Ling Cao, Gang He, Guang Yao, Xueping Song, Zhaoqi Sun, Preparation, microstructure and photoelectrical properties of Tantalum-doped zinc oxide transparent conducting films, Journal of Alloys and Compounds, Volume 608, 25 September 2014
  • K.C. Atli, I. Karaman, R.D. Noebe, Influence of tantalum additions on the microstructure and shape memory response of Ti50.5Ni24.5Pd25 high-temperature shape memory alloy, Materials Science and Engineering: A, Volume 613, 8 September 2014
  • C.J. Ruestes, A. Stukowski, Y. Tang, D.R. Tramontina, P. Erhart, B.A. Remington, H.M. Urbassek, M.A. Meyers, E.M. Bringa, Atomistic simulation of tantalum nanoindentation: Effects of indenter diameter, penetration velocity, and interatomic potentials on defect mechanisms and evolution, Materials Science and Engineering: A, Volume 613, 8 September 2014
  • C. Deng, S.F. Liu, X.B. Hao, J.L. Ji, Z.Q. Zhang, Q. Liu, Orientation dependence of stored energy release and microstructure evolution in cold rolled tantalum, International Journal of Refractory Metals and Hard Materials, Volume 46, September 2014
  • Z.Y. Nuru, C.J. Arendse, S. Khamlich, L. Kotsedi, M. Maaza, A Tantalum diffusion barrier layer to improve the thermal stability of AlxOy/Pt/AlxOy multilayer solar absorber, Solar Energy, Volume 107, September 2014
  • Konstantin P. Savkin, Alexey S. Bugaev, Alexey G. Nikolaev, Efim M. Oks, Maxim V. Shandrikov, Georgy Yu. Yushkov, Andrey V. Tyunkov, Elena V. Savruk, Sheet resistance of alumina ceramic after high energy implantation of tantalum ions, Applied Surface Science, Volume 310, 15 August 2014
  • Haitham Mohammad Abdelaal, Erik Pfeifer, Christina Grünberg, Bernd Harbrecht, Synthesis of tantalum pentaoxide hollow Spheres utilizing a sacrificial templating approach, Materials Letters, Available online 11 August 2014
  • Yaron Amouyal, Zugang Mao, David N. Seidman, Combined atom probe tomography and first-principles calculations for studying atomistic interactions between tungsten and tantalum in nickel-based alloys, Acta Materialia, Volume 74, 1 August 2014
  • C. Hertl, L. Koll, T. Schmitz, E. Werner, U. Gbureck, Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium, Materials Science and Engineering: C, Volume 41, 1 August 2014
  • Nuno P. Barradas, E. Alves, M. Fonseca, Z. Siketic, I. Bogdanovic Radovic, Stopping power of C, O and Cl in tantalum oxide, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Volume 332, 1 August 2014
  • J.C. Sarker, R. Vasan, Y.F. Makableh, S. Lee, A.I. Nusir, M.O. Manasreh, Enhanced performance of surface modified InAs quantum dots solar cell by a sol–gel grown tantalum pentoxide antireflection coating, Solar Energy Materials and Solar Cells, Volume 127, August 2014
  • Nicholas A. Pedrazas, Thomas E. Buchheit, Elizabeth A. Holm, Eric M. Taleff, Dynamic abnormal grain growth in tantalum, Materials Science and Engineering: A, Volume 610, 29 July 2014