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Tantalum Rod

High Purity Ta Rod
CAS 7440-25-7

Product Product Code Request Quote
(2N) 99% Tantalum Rod TA-M-02-R Request Quote
(3N) 99.9% Tantalum Rod TA-M-03-R Request Quote
(4N) 99.99% Tantalum Rod TA-M-04-R Request Quote
(5N) 99.999% Tantalum Rod TA-M-05-R Request Quote

Formula CAS No. PubChem SID PubChem CID MDL No. EC No Beilstein
Re. No.
Ta 7440-25-7 24855933 N/A MFCD00011252 231-135-5 N/A [Ta] InChI=1S/Ta GUVRBAGPIYLISA-UHFFFAOYSA-N

PROPERTIES Mol. Wt. Appearance Density Tensile Strength Melting Point Boiling Point Thermal Conductivity Electrical Resistivity Eletronegativity Specific Heat Heat of Vaporization Heat of Fusion MSDS
180.94 Silvery-gray 16.654 gm/cc up to 130,000 psi 2996 °C 5425 °C 0.575 W/cm/K @ 298.2 K 12.45 microhm-cm @ 0°C 1.5 Paulings 0.0334 Cal/g/K @ 25 °C 180 K-Cal/gm atom at 5425°C 7.5 Cal/gm mole Safety Data Sheet

American Elements specializes in producing high purity uniform shaped Tantalum Rod with the highest possible density 99.9+% Ultra High Purity Metallic Rods and smallest possible average grain sizes for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Rod sizes range from 1/8" x 1/8" to 1/4" x 1/4" and 3 mm diameter. We can also provide Rod outside this range and deposition materials for specific applications such as fuel cells and solar energy and for thin film deposition on glass or metal substrates. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles () and in the form of solutions and organometallics. We have a variety of standard sized rod molds. See safety data and research below and pricing/lead time above. We also produce Tantalum as powder, ingot, pieces, pellets, disc, granules, wire, and in compound forms, such as oxide. Other shapes are available by request.

Tantalum (Ta) atomic and molecular weight, atomic number and elemental symbolTantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. The number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. Tantalum Bohr ModelThe tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. Tantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden; however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. High Purity (99.999%) Tantalum (Ta) Metal In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. For more information on tantalum, including properties, safety data, research, and American Elements' catalog of tantalum products, visit the Tantalum element page.


Tantalum Fluoride Tantalum Chloride Tantalum Sputtering Target Tantalum Metal Aluminum Niobium Tantalum Alloy
Tantalum Nitrate Tantalum Nanoparticles Tantalum Oxide Pellets Tantalum Oxide Tantalum Powder
Tantalum Aluminum Alloy Tantalum Pellets Tantalum Foil Tantalum Acetate Solution Tantalum Rod
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Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.

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Recent Research & Development for Tantalum

  • Modulation of Human Mesenchymal Stem Cell Behaviour on Ordered Tantalum Nanotopographies Fabricated Using Colloidal Lithography and Glancing Angle Deposition. Peng-Yuan Wang, Dines T. Bennetsen, Morten Foss, Thomas Ameringer, Helmut Thissen, and Peter Kingshott. ACS Appl. Mater. Interfaces: February 9, 2015
  • Design of Volatile Mixed-Ligand Tantalum (V) Compounds as Precursors to Ta2O5 Films. Sanjay Mathur, Linus Appel, Raquel Fiz, Wieland Tyrra, and Ingo Pantenburg. Crystal Growth & Design: February 3, 2015
  • Effect of Anions on the Stability and Solubility of Tantalum Complexes in Water. Ana Conde, Beatriz Cruzado, Rosa Fandos, Antonio Otero, Ana M. Rodríguez, and María José Ruiz. Organometallics: December 29, 2014
  • Conflict Minerals in the Compute Sector: Estimating Extent of Tin, Tantalum, Tungsten, and Gold Use in ICT Products. Colin Fitzpatrick, Elsa Olivetti, T. Reed Miller, Richard Roth, and Randolph Kirchain. Environ. Sci. Technol.: December 2, 2014
  • Tantalum Segregation in Ta-Doped TiO2 and the Related Impact on Charge Separation during Illumination. Leigh R. Sheppard, Simon Hager, John Holik, Rong Liu, Sam Macartney, and Richard Wuhrer. J. Phys. Chem. C: December 2, 2014
  • Vapor Pressures of (3-(Dimethylamino)propyl)dimethylindium, (tert-Butylimino)bis(diethylamino)cyclopentadienyltantalum, and (tert-Butylimino)tris(ethylmethylamino)tantalum. Pavel Morávek, Ji?í Pangrác, Michal Fulem, Eduard Hulicius, and Kv?toslav R?ži?ka. J. Chem. Eng. Data: November 5, 2014
  • Synthesis and Crystal Structure of ?-TaON, a Metastable Polymorph of Tantalum Oxide Nitride. Tobias Lüdtke, Alexander Schmidt, Caren Göbel, Anna Fischer, Nils Becker, Christoph Reimann, Thomas Bredow, Richard Dronskowski, and Martin Lerch. Inorg. Chem.: October 13, 2014
  • Carbon–Carbon Bond Forming Reactions with Tantalum Diamidophosphine Complexes That Incorporate Alkyne Ligands. Kyle D. J. Parker and Michael D. Fryzuk. Organometallics: October 13, 2014
  • Tuning Resistive Switching Characteristics of Tantalum Oxide Memristors through Si Doping. Sungho Kim, ShinHyun Choi, Jihang Lee, and Wei D. Lu. ACS Nano: September 25, 2014
  • A Tantalum Methylidene Complex Supported by a Robust and Sterically Encumbering Aryloxide Ligand. Keith Searles, Balazs Pinter, Chun-Hsing Chen, and Daniel J. Mindiola. Organometallics: August 6, 2014