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Tantalum Furnace Elements

High Purity Ta
CAS 7440-25-7


Product Product Code Request Quote
(2N) 99% Tantalum Furnace Elements TA-M-02-FURN Request Quote
(3N) 99.9% Tantalum Furnace Elements TA-M-03-FURN Request Quote
(4N) 99.99% Tantalum Furnace Elements TA-M-04-FURN Request Quote
(5N) 99.999% Tantalum Furnace Elements TA-M-05-FURN Request Quote

CHEMICAL
IDENTIFIER
Formula CAS No. PubChem CID MDL No. EC No Beilstein
Re. No.
SMILES
Identifier
InChI
Identifier
InChI
Key
Ta 7440-25-7 23956 MFCD00011252 231-135-5 N/A [Ta] InChI=1S/Ta GUVRBAGPIYLISA-UHFFFAOYSA-N

PROPERTIES Mol. Wt. Appearance Density Tensile Strength Melting Point Boiling Point Thermal Conductivity Electrical Resistivity Electronegativity Specific Heat Heat of Vaporization Heat of Fusion MSDS
180.94 Silvery-gray 16.69 g/cm3 up to 130,000 psi 3017 °C 5458 °C 57.5 W/m K 131nΩ·m (20°C) 1.5 Paulings 0.14
J/g mol
732.8
kJ/mol
36.57
kJ/mol
Safety Data Sheet

American Elements specializes in producting Tantalum-based furnace components for crystal synthesis and other applications. Typical furnace elements can include boats, carriers, crucibles, spacers, hangers, crowns, heating elements (wire, rod, mesh), hot zone components, rod (threaded, gun drilled), sheet (dimpled), shells & mantels, shielding components, tubing, shims, supports, and fasteners. American Elements can produce materials to custom specifications by request, in addition to custom compositions for commercial and research applications and new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as numerous other machined shapes and in the form of solutions and organometallic compounds. Ultra high purity and high purity forms also include metal powder, submicron powder and nanomaterials, targets for thin film deposition, and pellets for chemical vapor deposition (CVD) and physical vapor deposition (PVD) applications. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia) and follows applicable ASTM testing standards. Typical and custom packaging is available, as is additional technical and safety (MSDS) data. Please contact us for information on lead time and pricing above.

Tantalum (Ta) atomic and molecular weight, atomic number and elemental symbolTantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. The number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. Tantalum Bohr ModelThe tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. Tantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden; however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. High Purity (99.999%) Tantalum (Ta) Metal In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. For more information on tantalum, including properties, safety data, research, and American Elements' catalog of tantalum products, visit the Tantalum element page.


HEALTH, SAFETY & TRANSPORTATION INFORMATION
Material Safety Data Sheet MSDS
Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Precautions N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
Globally Harmonized System of
Classification and Labelling (GHS)
N/A        

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PACKAGING SPECIFICATIONS FOR BULK & RESEARCH QUANTITIES
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.


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Recent Research & Development for Tantalum

  • Modulation of Human Mesenchymal Stem Cell Behaviour on Ordered Tantalum Nanotopographies Fabricated Using Colloidal Lithography and Glancing Angle Deposition. Peng-Yuan Wang, Dines T. Bennetsen, Morten Foss, Thomas Ameringer, Helmut Thissen, and Peter Kingshott. ACS Appl. Mater. Interfaces: February 9, 2015
  • Design of Volatile Mixed-Ligand Tantalum (V) Compounds as Precursors to Ta2O5 Films. Sanjay Mathur, Linus Appel, Raquel Fiz, Wieland Tyrra, and Ingo Pantenburg. Crystal Growth & Design: February 3, 2015
  • Effect of Anions on the Stability and Solubility of Tantalum Complexes in Water. Ana Conde, Beatriz Cruzado, Rosa Fandos, Antonio Otero, Ana M. Rodríguez, and María José Ruiz. Organometallics: December 29, 2014
  • Conflict Minerals in the Compute Sector: Estimating Extent of Tin, Tantalum, Tungsten, and Gold Use in ICT Products. Colin Fitzpatrick, Elsa Olivetti, T. Reed Miller, Richard Roth, and Randolph Kirchain. Environ. Sci. Technol.: December 2, 2014
  • Tantalum Segregation in Ta-Doped TiO2 and the Related Impact on Charge Separation during Illumination. Leigh R. Sheppard, Simon Hager, John Holik, Rong Liu, Sam Macartney, and Richard Wuhrer. J. Phys. Chem. C: December 2, 2014
  • Vapor Pressures of (3-(Dimethylamino)propyl)dimethylindium, (tert-Butylimino)bis(diethylamino)cyclopentadienyltantalum, and (tert-Butylimino)tris(ethylmethylamino)tantalum. Pavel Morávek, Ji?í Pangrác, Michal Fulem, Eduard Hulicius, and Kv?toslav R?ži?ka. J. Chem. Eng. Data: November 5, 2014
  • Synthesis and Crystal Structure of ?-TaON, a Metastable Polymorph of Tantalum Oxide Nitride. Tobias Lüdtke, Alexander Schmidt, Caren Göbel, Anna Fischer, Nils Becker, Christoph Reimann, Thomas Bredow, Richard Dronskowski, and Martin Lerch. Inorg. Chem.: October 13, 2014
  • Carbon–Carbon Bond Forming Reactions with Tantalum Diamidophosphine Complexes That Incorporate Alkyne Ligands. Kyle D. J. Parker and Michael D. Fryzuk. Organometallics: October 13, 2014
  • Tuning Resistive Switching Characteristics of Tantalum Oxide Memristors through Si Doping. Sungho Kim, ShinHyun Choi, Jihang Lee, and Wei D. Lu. ACS Nano: September 25, 2014
  • A Tantalum Methylidene Complex Supported by a Robust and Sterically Encumbering Aryloxide Ligand. Keith Searles, Balazs Pinter, Chun-Hsing Chen, and Daniel J. Mindiola. Organometallics: August 6, 2014