American Elements

 

Tantalum Oxide Rotatable Sputtering Target
High Purity Ta Oxide Rotatable Targets
1314-61-0
Product Product Code Order or Specifications
(2N) 99% Tantalum Oxide Rotatable Sputtering Target TA-OX-02-STR Contact American Elements
(2N5) 99.5% Tantalum Oxide Rotatable Sputtering Target TA-OX-025-STR Contact American Elements
(3N) 99.9% Tantalum Oxide Rotatable Sputtering Target TA-OX-03-STR Contact American Elements
(3N5) 99.95% Tantalum Oxide Rotatable Sputtering Target TA-OX-035-STR Contact American Elements
(4N) 99.99% Tantalum Oxide Rotatable Sputtering Target TA-OX-04-STR Contact American Elements
(5N) 99.999% Tantalum Oxide Rotatable Sputtering Target TA-OX-05-STR Contact American Elements

Oxide IonAmerican Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards.See safety data and research below and pricing/lead time above. American Elements specializes in producing high purity Tantalum Oxide rotatable sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube. Rotary Targets are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes and through other processes nanoparticles . We also produce Tantalum as disc, granules, ingot, oxide pellets, oxide pieces, oxide powder, and rod. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. Other shapes are available by request.

Tantalum(Ta) atomic and molecular weight, atomic number and elemental symbolTantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f14 5d3 6s2. In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in Elemental Tantalumelectronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most Tantalum Bohr Modeltelecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below. See Tantalum research below.

Formula CAS No. Appearance Molecular Weight
Ta2O5 1314-61-0 White Powder 441.89
PRODUCT CATALOG Tantalum Products Foil Submicron & Nanopowder Tolling Ultra High Purity Sputtering Target Crystal Growth Rod, Plate, Powder, etc.
Home

Have a Question? Ask a Chemical Engineer or Material Scientist   Request an MSDS or Certificate of Analysis

 


Search by Material, Product Name, Product Code, CAS Number, Formula, Element, Anion, Form, EC Number, MDL Number or PubChem ID.


German   Korean   French   Japanese   Spanish   Chinese (Simplified)   Portuguese   Russian   Chinese (Taiwan)  Italian   Turkish   Polish   Dutch   Czech   Swedish   Hungarian   Danish   Hebrew

Production Catalog Available in 36 Countries & Languages
  Print this Page Twitter
Periodic table of the elements science and academic information, elements and advanced materials data, scientific presentations and all pages, designs, concepts, logos, and color schemes herein are the copyrighted proprietary rights and intellectual property of American Elements. American Elements is a U.S. Registered Trademark. © 2001-2012. American Elements. All rights reserved.
Learn Six Sigma


USA Science & Engineering FestivalSponsors of the United States Science & Engineering Festival on April 28, 2012 in Washington D.C. Please join us and our customers & co-sponsors NASA, Lockheed Martin and the Department of Defense inspiring the next generation of scientists and engineers.

Recent Research & Development for Tantalum

  • Low Voltage Electrowetting-on-Dielectric Platform using Multi-Layer Insulators. Lin YY, Evans RD, Welch E, Hsu BN, Madison AC, Fair RB. Sens Actuators B Chem. 2010 Sep 21;150(1):465-470.PMID: 20953362 [PubMed]Related citations

  • Trapping Unstable Terminal M-O Multiple Bonds of Monocyclopentadienyl Niobium and Tantalum Complexes with Lewis Acids. Sa´nchez-Nieves J, Frutos LM, Royo P, Castan~o O, Herdtweck E, Mosquera ME. Inorg Chem. 2010 Oct 15. [Epub ahead of print]PMID: 20949930 [PubMed - as supplied by publisher]Related citations

  • Optical trapping and propulsion of red blood cells on waveguide surfaces. Ahluwalia BS, McCourt P, Huser T, Hellesø OG. Opt Express. 2010 Sep 27;18(20):21053-61. doi: 10.1364/OE.18.021053.PMID: 20941001 [PubMed - in process]Related citations

  • A new technique to measure micromotion distribution around a cementless femoral stem. Gortchacow M, Wettstein M, Pioletti DP, Terrier A. J Biomech. 2010 Oct 8. [Epub ahead of print]PMID: 20934705 [PubMed - as supplied by publisher]Related citations

  • A new mode of clinical failure of porous tantalum rod. Oh KJ, Pandher DS. Indian J Orthop. 2010 Oct;44(4):464-7.PMID: 20924493 [PubMed - in process]Free PMC ArticleFree textRelated citations

  • Effect of a porous tantalum rod on early and intermediate stages of necrosis of the femoral head. Liu G, Wang J, Yang S, Xu W, Ye S, Xia T. Biomed Mater. 2010 Oct 6;5(6):065003. [Epub ahead of print]PMID: 20924137 [PubMed - as supplied by publisher]Related citations

  • Cracking study of pentakis(dimethylamino)tantalum vapors by Knudsen cell mass spectrometry. Violet P, Nuta I, Chatillon C, Blanquet E. Rapid Commun Mass Spectrom. 2010 Oct 30;24(20):2949-56.PMID: 20872627 [PubMed - in process]Related citations

  • High-pressure--high-temperature polymorphism in ta: resolving an ongoing experimental controversy. Burakovsky L, Chen SP, Preston DL, Belonoshko AB, Rosengren A, Mikhaylushkin AS, Simak SI, Moriarty JA. Phys Rev Lett. 2010 Jun 25;104(25):255702. Epub 2010 Jun 21.PMID: 20867396 [PubMed - in process]Related citations

  • High melting points of tantalum in a laser-heated diamond anvil cell. Dewaele A, Mezouar M, Guignot N, Loubeyre P. Phys Rev Lett. 2010 Jun 25;104(25):255701. Epub 2010 Jun 21.PMID: 20867395 [PubMed - in process]Related citations

  • Tribo-electrochemical surface modification of tantalum using in situ AFM techniques. Huitink D, Gao F, Liang H. Scanning. 2010 Sep 17. [Epub ahead of print]PMID: 20853404 [PubMed - as supplied by publisher]Related citations

  • In vivo kinematics of mobile-bearing total knee arthroplasty during deep knee bending under weight-bearing conditions. Futai K, Tomita T, Yamazaki T, Tamaki M, Yoshikawa H, Sugamoto K. Knee Surg Sports Traumatol Arthrosc. 2010 Sep 16. [Epub ahead of print]PMID: 20845031 [PubMed - as supplied by publisher]Related citations

  • Synthesis, crystal structure, and properties of Mg(x)B50C8 or Mg(x)(B12)4(CBC)2(C2)2 (x = 2.4-4). Adasch V, Schroeder M, Kotzott D, Ludwig T, Vojteer N, Hillebrecht H. J Am Chem Soc. 2010 Oct 6;132(39):13723-32.PMID: 20839790 [PubMed - in process]Related citations

  • C--h bond cleavage and regioselective C--C coupling on a tantalum-bound pincer ligand. Conde A, Fandos R, Hernández C, Otero A, Rodríguez A. Chemistry. 2010 Oct 25;16(40):12074-8. No abstract available. PMID: 20839187 [PubMed - in process]Related citations

  • Peculiarities of circulatory system response on influence of modern tantalum manufacture factors in workers. Omarova D, Ismailova A, Sultanbekov Z. Georgian Med News. 2010 Jul-Aug;(184-185):70-6.PMID: 20834079 [PubMed - in process]Related citations

  • Biocompatible two-layer tantalum/titania-polymer hybrid coating. Cortecchia E, Pacilli A, Pasquinelli G, Scandola M. Biomacromolecules. 2010 Sep 13;11(9):2446-53.PMID: 20831278 [PubMed - in process]Related citations

  • Mechanical properties of low modulus beta titanium alloys designed from the electronic approach. Laheurte P, Prima F, Eberhardt A, Gloriant T, Wary M, Patoor E. J Mech Behav Biomed Mater. 2010 Nov;3(8):565-73. Epub 2010 Jul 24.PMID: 20826362 [PubMed - in process]Related citations

  • A Monoblock Porous Tantalum Acetabular Cup Has No Osteolysis on CT at 10 Years. Moen TC, Ghate R, Salaz N, Ghodasra J, Stulberg SD. Clin Orthop Relat Res. 2010 Aug 31. [Epub ahead of print]PMID: 20809172 [PubMed - as supplied by publisher]Related citations

  • Bisphosphonate Remains Highly Localized After Elution From Porous Implants. McKenzie K, Dennis Bobyn J, Roberts J, Karabasz D, Tanzer M. Clin Orthop Relat Res. 2010 Aug 31. [Epub ahead of print]PMID: 20809167 [PubMed - as supplied by publisher]Related citations

  • Clinical device-related article surface characterization of explanted endovascular stents: evidence of in vivo corrosion. Halwani DO, Anderson PG, Brott BC, Anayiotos AS, Lemons JE. J Biomed Mater Res B Appl Biomater. 2010 Oct;95(1):225-38.PMID: 20737558 [PubMed - in process]Related citations

  • From metallaborane to borylene complexes: syntheses and structures of triply bridged ruthenium and tantalum borylene complexes. Geetharani K, Bose SK, Varghese B, Ghosh S. Chemistry. 2010 Oct 4;16(37):11357-66.PMID: 20730749 [PubMed - in process]Related citations

 

American Elements is a copyrighted U.S. Trademark. All rights reserved.