American Elements: Tantalum Rotatable Sputtering Target Supplier & Tech Info

American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards.See safety data and research below and pricing/lead time above. American Elements specializes in producing high purity Tantalum rotatable sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube. Rotary Targets are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes and through other processes nanoparticles . We also produce Tantalum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Tantalum is a Block D, Group 5, Period 6 element. The number of electrons in each of Tantalum's shells is 2, 8, 18, 32, 11, 2 and its electronic configuration is [Xe] 4f¹⁴ 5d³ 6s². In its elemental form tantalum's CAS number is 7440-25-7. The tantalum atom has a radius of 143.pm and it's Van der Waals radius is 200.pm. Tantalum is not toxic. Tantalum has a number of interesting properties that make it particularly useful in electronic applications. Tantalum is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It has the third highest melting point, surpassed only by rhenium and tungsten, yet it is highly conductive to heat and electricity. This has made it the material of choice for electronic capacitors for most telecommunications and hand held electronics equipment, such as cell phones, laptop computers and pagers. Tantalum compounds, such as the oxide and chloride, are the basis for di-electric coatings. Tantalum is added to glass for its high refractive index. It has various applications in nuclear energy. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology. See Tantalum research below.

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