American Elements: Titanium Oxide Sputtering Target Supplier & Tech Info

American Elements specializes in producing high purity Titanium oxide sputtering targets with the highest possible density High Purity (99.99%) Metallic Sputtering Target

High Purity (99.99%) Metallic Sputtering Target

and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Titanium Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. See research below. Other shapes are available by request.

Titanium is a Block D, Group 4, Period 4 element. The electronic configuration is [Ar] 3d² 4s². In its elemental form titanium's CAS number is 7440-32-6. The titanium atom has a radius of 144.8.pm and it's Van der Waals radius is 200.pm. In its metallic form it is not only very strong and light weight, but also highly resistant to corrosion. Thus it can be found in numerous aerospace and military applications. In its oxide form it used in low grades to produce a white pigment. Titanium is the bases for numerous commercially essential comoound groups, such as barium titanates in electronic and di-electric formulations and in crystal growth for ruby and sapphire lasers.