American Elements: Thallium Oxide Sputtering Target Supplier & Tech Info

American Elements specializes in producing high purity Thallium oxide sputtering targets with the highest possible density High Purity (99.99%) Metallic Sputtering Target

High Purity (99.99%) Metallic Sputtering Target

and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Thallium Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. See research below. Other shapes are available by request.

Thallium is a Block P, Group 13, Period 6 element. The electronic configuration is [Xe] 4f¹⁴ 5d¹⁰ 6s² 6p¹. In its elemental form thallium's CAS number is 7440-28-0. The thallium atom has a radius of 170.pm and it's Van der Waals radius is 196.pm. Thallium is primarily used for its electrical conductivity as thallium sulfide which changes with exposure to infrared light. This ability makes the compound useful in photocells. Thallium bromide-iodide crystals have been used as infrared optical materials. Thallium has been used, with sulfur or selenium and arsenic, to produce low melting glasses which becomes fluid between 125 and 150 C. These glasses have properties at room temperatures similar to ordinary glasses and are said to be durable and insoluble in water. Thallium oxide has been used to produce glasses with a high index of refraction, and is also used in the manufacture of photo cells.