Tungsten Carbide Sputtering Target
WC
7440-02-0
7440-02-0
| Product | Product Code |
Order or Specifications |
99% Tungsten Carbide Sputtering Target |
W-C-02-ST
|
 |
99.5% Tungsten Carbide Sputtering Target |
W-C-025-ST
|
|
99.9% Tungsten Carbide Sputtering Target |
W-C-03-ST
|
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99.95% Tungsten Carbide Sputtering Target |
W-C-035-ST
|
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99.99% Tungsten Carbide Sputtering Target |
W-C-04-ST
|
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99.999% Tungsten Carbide Sputtering Target |
W-C-05-ST
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See research below. American Elements specializes in producing high purity Tungsten Carbide sputtering targets with the highest possible density 
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Tungsten as rods, powder and plates. Other shapes are available by request.
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Tungsten as rods, powder and plates. Other shapes are available by request.
Tungsten is a Block D, Group 6, Period 6 element. The electronic configuration is [Xe] 4f14 5d4 6s2. In its elemental form tungsten's CAS number is 7440-33-7. The tungsten atom has a radius of 137.pm and it's Van der Waals radius is 200.pm. Tungsten has the highest melting point of all the metallic elements and because of this has its first significant commercial application as the filament in incandescent light bulbs and fluorescent light bulbs. Tungsten is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. Later it was used in the first television tubes.
| Formula | CAS No. | Appearance | Molecular Weight |
| WC | 7440-02-0 | Metal |
| PRODUCT CATALOG | Submicron & Nanopowder | Tolling | Ultra High Purity | Sputtering Target | Crystal Growth | Rod, Plate, Powder, etc. |
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This website and all pages, designs, concepts, logos, and color schemes herein are
the copyrighted proprietary rights and intellectual property of American Elements.
This website and all pages, designs, concepts, logos, and color schemes herein are
the copyrighted proprietary rights and intellectual property of American Elements.
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Recent Research & Development for Tungsten
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