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Aluminum Manganese Sputtering Target

Linear Formula:

Al-Mn

MDL Number:

N/A

EC No.:

N/A

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Al-Mn Sputtering Target
AL-MN-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Al-Mn Sputtering Target
AL-MN-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Al-Mn Sputtering Target
AL-MN-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Al-Mn Sputtering Target
AL-MN-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Al-Mn Sputtering Target
AL-MN-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Al-Mn Sputtering Target
AL-MN-05-ST
Pricing > SDS > Data Sheet >

Aluminum Manganese Sputtering Target Properties (Theoretical)

Compound Formula AlMn
Appearance Metallic target
Melting Point N/A
Boiling Point N/A
Density 2.72 g/cm3
Thermal Conductivity 163 W/m-K
Exact Mass 81.92 g/mol
Monoisotopic Mass 81.92 g/mol

Aluminum Manganese Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Transport Information N/A
MSDS / SDS

About Aluminum Manganese Sputtering Target

High Purity (99.99%) Aluminum Manganese Sputtering TargetAmerican Elements specializes in producing high purity Aluminum Manganese Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Please contact us for information on lead time and pricing above.

Aluminum Manganese Sputtering Target Synonyms

Aluminum-manganese, AlMn, 3004 aluminium alloy, wrought aluminum-manganese alloys (3xxx series), 3005, 3105, 3003, 3102, 3104, aluminum magnesium splatter master alloy, aluminum manganese additive tablets, AlMn10, AlMn15, AlMn20, AlMn25, AlMn30, AlMn60, AlMn80, Mn75, Mn80

Chemical Identifiers

Linear Formula Al-Mn
MDL Number N/A
EC No. N/A
Pubchem CID 44481797
IUPAC Name aluminum; manganese
SMILES [Al].[Mn]
InchI Identifier InChI=1S/Al.Mn
InchI Key QDGLHJGLFHGFSU-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Aluminum products. Aluminum (or Aluminum) (atomic symbol: Al, atomic number: 13) is a Block P, Group 13, Period 3 element with an atomic weight of 26.9815386. It is the third most abundant element in the earth's crust and the most abundant metallic element. Aluminum Bohr Model Aluminum's name is derived from alumina, the mineral from which Sir Humphrey Davy attempted to refine it from in 1812. It wasn't until 1825 that Aluminum was first isolated by Hans Christian Oersted. Aluminum is a silvery gray metal that possesses many desirable characteristics. It is light, nonmagnetic and non-sparking. It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many industrial applications where a strong, light, easily constructed material is needed. Elemental AluminumAlthough it has only 60% of the electrical conductivity of copper, it is used in electrical transmission lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements it imparts a variety of useful properties. Aluminum was first predicted by Antoine Lavoisierin 1787 and first isolated by Friedrich Wöhler in 1827.

See more Manganese products. Manganese (atomic symbol: Mn, atomic number: 25) is a Block D, Group 7, Period 4 element with an atomic weight of 54.938045. Manganese Bohr ModelThe number of electrons in each of Manganese's shells is [2, 8, 13, 2] and its electron configuration is [Ar] 3d5 4s2. The manganese atom has a radius of 127 pm and a Van der Waals radius of 197 pm. Manganese was first discovered by Torbern Olof Bergman in 1770 and first isolated by Johann Gottlieb Gahn in 1774. In its elemental form, manganese has a silvery metallic appearance. Elemental ManganeseIt is a paramagnetic metal that oxidizes easily in addition to being very hard and brittle. Manganese is found as a free element in nature and also in the minerals pyrolusite, braunite, psilomelane, and rhodochrosite. The name Manganese originates from the Latin word mangnes, meaning "magnet."

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December 12, 2018
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