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Aluminum Tantalum Sputtering Target

Al-Ta

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Aluminum Tantalum Sputtering Target
AL-TA-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Aluminum Tantalum Sputtering Target
AL-TA-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Aluminum Tantalum Sputtering Target
AL-TA-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Aluminum Tantalum Sputtering Target
AL-TA-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Aluminum Tantalum Sputtering Target
AL-TA-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Aluminum Tantalum Sputtering Target
AL-TA-05-ST
Pricing > SDS > Data Sheet >

Aluminum Tantalum Sputtering Target Properties

Appearance

Target

Aluminum Tantalum Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Transport Information N/A
MSDS / SDS

About Aluminum Tantalum Sputtering Target

American Elements specializes in producing high purity Aluminum Tantalum Sputtering Targets with the highest possible density High Purity (99.99%) Aluminum Tantalum Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes. We also produce Aluminum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Aluminum Tantalum Sputtering Target Synonyms

N/A

Aluminum Tantalum Sputtering Target Chemical Identifiers

Linear Formula

Al-Ta

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Aluminum products. Aluminum (or Aluminum) (atomic symbol: Al, atomic number: 13) is a Block P, Group 13, Period 3 element with an atomic weight of 26.9815386. It is the third most abundant element in the earth's crust and the most abundant metallic element. Aluminum Bohr Model Aluminum's name is derived from alumina, the mineral from which Sir Humphrey Davy attempted to refine it from in 1812. It wasn't until 1825 that Aluminum was first isolated by Hans Christian Oersted. Aluminum is a silvery gray metal that possesses many desirable characteristics. It is light, nonmagnetic and non-sparking. It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many industrial applications where a strong, light, easily constructed material is needed. Elemental AluminumAlthough it has only 60% of the electrical conductivity of copper, it is used in electrical transmission lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements it imparts a variety of useful properties. Aluminum was first predicted by Antoine Lavoisierin 1787 and first isolated by Friedrich Wöhler in 1827.

See more Tantalum products. Tantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. Tantalum Bohr ModelThe number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. The tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. High Purity (99.999%) Tantalum (Ta) MetalTantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology.

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September 23, 2017
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