Boron Carbide BC Sputtering Target

CAS #:

Linear Formula:

BC

MDL Number:

N/A

EC No.:

234-565-1

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Boron Carbide (BC) Sputtering Target
BO-C-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Boron Carbide (BC) Sputtering Target
BO-C-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Boron Carbide (BC) Sputtering Target
BO-C-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Boron Carbide (BC) Sputtering Target
BO-C-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Boron Carbide (BC) Sputtering Target
BO-C-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Boron Carbide (BC) Sputtering Target
BO-C-05-ST
Pricing > SDS > Data Sheet >

Boron Carbide BC Sputtering Target Properties (Theoretical)

Compound Formula CB
Molecular Weight 22.82
Appearance Gray/black solid
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Electrical Resistivity 1.0 ω-cm
Poisson's Ratio 0.17-0.18
Specific Heat 0.94 J/g·°C
Thermal Conductivity 90 W/m·K
Thermal Expansion 4.50-5.60 µm/m·°C (25-500 °C)
Vickers Hardness 26 MPa
Exact Mass 23.009305 g/mol
Monoisotopic Mass 23.009305 g/mol

Boron Carbide BC Sputtering Target Health & Safety Information

Signal Word Warning
Hazard Statements H332
Hazard Codes Xn
Risk Codes 20
Safety Statements 22-39
RTECS Number N/A
Transport Information NONH for all modes of transport
WGK Germany 3
GHS Pictograms
MSDS / SDS

About Boron Carbide BC Sputtering Target

American Elements specializes in producing high purity Boron Carbide (BC) Sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Boron Carbide B4C Sputtering Targets. Other shapes are available by request.

Boron Carbide BC Sputtering Target Synonyms

Boron monocarbide, carbon monoboride

Chemical Identifiers

Linear Formula BC
MDL Number N/A
EC No. 234-565-1
Beilstein/Reaxys No. N/A
Pubchem CID 14931950
IUPAC Name methylidyneborane
SMILES B#[C]
InchI Identifier InChI=1S/CB/c1-2
InchI Key UPGPUHVYNXOPJN-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

Boron

See more Boron products. Boron Bohr ModelBoron (atomic symbol: B, atomic number: 5) is a Block P, Group 13, Period 2 element with an atomic weight of 10.81. The number of electrons in each of boron's shells is 2, 3 and its electron configuration is [He] 2s2 2p1. The boron atom has a radius of 90 pm and a Van der Waals radius of 192 pm. Boron was discovered by Joseph Louis Gay-Lussac and Louis Jacques Thénard in 1808 and was first isolated by Humphry Davy later that year. Boron is classified as a metalloid is not found naturally on earth. Elemental BoronAlong with carbon and nitrogen, boron is one of the few elements in the periodic table known to form stable compounds featuring triple bonds. Boron has an energy band gap of 1.50 to 1.56 eV, which is higher than that of either silicon or germanium. The name Boron originates from a combination of carbon and the Arabic word buraqu meaning borax.

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