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Chromium Silicon Oxide Sputtering Target

CAS #:

Linear Formula:

Cr:SiO

MDL Number:

MFCD02091702

EC No.:

N/A

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Chromium Silicon Oxide Sputtering Target
CR-SIO-02-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Chromium Silicon Oxide Sputtering Target
CR-SIO-03-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Chromium Silicon Oxide Sputtering Target
CR-SIO-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Chromium Silicon Oxide Sputtering Target
CR-SIO-05-ST
Pricing > SDS > Data Sheet >

Chromium Silicon Oxide Sputtering Target Properties (Theoretical)

Compound Formula CrSiO
Molecular Weight 96.08
Appearance Target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Exact Mass 95.912349
Monoisotopic Mass 95.912349

Chromium Silicon Oxide Sputtering Target Health & Safety Information

Signal Word Danger
Hazard Statements H334-H317
Hazard Codes Xn
Precautionary Statements P261-P272-P280-P285-P302+P352-P304+P341-P333+P313-P342+P311-P363-P501
Risk Codes 42/43
Safety Statements 24-37-45-60
RTECS Number N/A
Harmonized Tariff Code 2842.10
Transport Information NONH for all modes of transport
GHS Pictograms
MSDS / SDS

About Chromium Silicon Oxide Sputtering Target

American Elements specializes in producing high purity Chromium Silicon Oxide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Typical and custom packaging is available. Other shapes are available by request.

Chromium Silicon Oxide Sputtering Target Synonyms

Chromium silicon monoxide; Chromium-doped Silicon Oxide; CrSiO2; Chromium silicate; Silicon chromate

Chemical Identifiers

Linear Formula Cr:SiO
MDL Number MFCD02091702
EC No. N/A
Beilstein Registry No. N/A
Pubchem CID 57464841
IUPAC Name chromium; oxosilicon
SMILES O=[Si].[Cr]
InchI Identifier InChI=1S/Cr.OSi/c;1-2
InchI Key ASAMIKIYIFIKFS-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

See more Chromium products. Chromium (atomic symbol: Cr, atomic number: 24) is a Block D, Group 6, Period 4 element with an atomic weight of 51.9961. Chromium Bohr ModelThe number of electrons in each of Chromium's shells is 2, 8, 13, 1 and its electron configuration is [Ar] 3d5 4s1. Chromium was first discovered by Louis Nicolas Vauquelin in 1797. It was first isolated in 1798, also by Louis Nicolas Vauquelin. The chromium atom has a radius of 128 pm and a Van der Waals radius of 189 pm. In its elemental form, chromium has a lustrous steel-gray appearance. Elemental ChromiumChromium is the hardest metal element in the periodic table and the only element that exhibits antiferromagnetic ordering at room temperature, above which it tranforms into a paramagnetic solid. The most common source of chromium is chromite ore (FeCr2O4). Due to its various colorful compounds, Chromium was named after the Greek word 'chroma' meaning color.

See more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental SiliconSilica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.

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December 08, 2019
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