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Copper Chrome Sputtering Target

Linear Formula:

Cu-Cr

MDL Number:

N/A

EC No.:

N/A

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Copper Chrome Sputtering Target
CU-CR-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Copper Chrome Sputtering Target
CU-CR-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Copper Chrome Sputtering Target
CU-CR-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Copper Chrome Sputtering Target
CU-CR-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Copper Chrome Sputtering Target
CU-CR-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Copper Chrome Sputtering Target
CU-CR-05-ST
Pricing > SDS > Data Sheet >

Copper Chrome Sputtering Target Properties (Theoretical)

Compound Formula CuCr
Appearance Target
Melting Point 1070-1080 °C
Boiling Point N/A
Density 8.89 g/cm3

Copper Chrome Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Transport Information N/A
MSDS / SDS

About Copper Chrome Sputtering Target

American Elements specializes in producing high purity Copper Chrome Sputtering Targets with the highest possible density High Purity (99.99%) Copper Chrome Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Copper as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Copper Chrome Sputtering Target Synonyms

C182, C-182, C18200, Copper chrome, High copper wrought alloy, MIL-C-19311B, Cu:Cr 99:1, CAS 12506-91-1

Chemical Identifiers

Linear Formula Cu-Cr
MDL Number N/A
EC No. N/A
Pubchem CID 9833946
IUPAC Name chromium; copper
SMILES [Cr].[Cu]
InchI Identifier InChI=1S/Cr.Cu
InchI Key GXDVEXJTVGRLNW-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Chromium products. Chromium (atomic symbol: Cr, atomic number: 24) is a Block D, Group 6, Period 4 element with an atomic weight of 51.9961. Chromium Bohr ModelThe number of electrons in each of Chromium's shells is 2, 8, 13, 1 and its electron configuration is [Ar] 3d5 4s1. Chromium was first discovered by Louis Nicolas Vauquelin in 1797. It was first isolated in 1798, also by Louis Nicolas Vauquelin. The chromium atom has a radius of 128 pm and a Van der Waals radius of 189 pm. In its elemental form, chromium has a lustrous steel-gray appearance. Elemental ChromiumChromium is the hardest metal element in the periodic table and the only element that exhibits antiferromagnetic ordering at room temperature, above which it tranforms into a paramagnetic solid. The most common source of chromium is chromite ore (FeCr2O4). Due to its various colorful compounds, Chromium was named after the Greek word 'chroma' meaning color.

See more Copper products. Copper Bohr Model Copper (atomic symbol: Cu, atomic number: 29) is a Block D, Group 11, Period 4 element with an atomic weight of 63.546. The number of electrons in each of copper's shells is 2, 8, 18, 1 and its electron configuration is [Ar] 3d10 4s1. The copper atom has a radius of 128 pm and a Van der Waals radius of 186 pm. Copper was first discovered by Early Man prior to 9000 BC. In its elemental form, copper has a red-orange metallic luster appearance. Of all pure metals, only silver Elemental Copperhas a higher electrical conductivity.The origin of the word copper comes from the Latin word 'cuprium' which translates as "metal of Cyprus." Cyprus, a Mediterranean island, was known as an ancient source of mined copper.

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June 25, 2018
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