20th anniversary seal20th anniversary seal20th anniversary seal

Copper Gallium Sputtering Target

Linear Formula:

Cu-Ga

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Copper Gallium Sputtering Target
CU-GA-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Copper Gallium Sputtering Target
CU-GA-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Copper Gallium Sputtering Target
CU-GA-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Copper Gallium Sputtering Target
CU-GA-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Copper Gallium Sputtering Target
CU-GA-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Copper Gallium Sputtering Target
CU-GA-05-ST
Pricing > SDS > Data Sheet >
Question? Ask an American Elements EngineerWHOLESALE/SKU 0000-742-10821

Copper Gallium Sputtering Target Properties

Appearance

Target

Copper Gallium Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Transport Information N/A
MSDS / SDS

About Copper Gallium Sputtering Target

American Elements specializes in producing high purity Copper Gallium Sputtering Targets with the highest possible density High Purity (99.99%) Copper Gallium Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rotary (rotatable), planar, rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Copper as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Copper Gallium Sputtering Target Synonyms

Copper-gallium alloy sputtering target, CuGa, Cu-Ga,

Copper Gallium Sputtering Target Chemical Identifiers

Linear Formula

Cu-Ga

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Copper products. Copper Bohr Model Copper (atomic symbol: Cu, atomic number: 29) is a Block D, Group 11, Period 4 element with an atomic weight of 63.546. The number of electrons in each of copper's shells is 2, 8, 18, 1 and its electron configuration is [Ar] 3d10 4s1. The copper atom has a radius of 128 pm and a Van der Waals radius of 186 pm. Copper was first discovered by Early Man prior to 9000 BC. In its elemental form, copper has a red-orange metallic luster appearance. Of all pure metals, only silver Elemental Copperhas a higher electrical conductivity.The origin of the word copper comes from the Latin word 'cuprium' which translates as "metal of Cyprus." Cyprus, a Mediterranean island, was known as an ancient source of mined copper.

See more Gallium products. Gallium (atomic symbol: Ga, atomic number: 31) is a Block P, Group 13, Period 4 element with an atomic weight of 69.723.The number of electrons in each of Gallium's shells is 2, 8, 18, 3 and its electron configuration is [Ar] 3d10 4s2 4p1. The gallium atom has a radius of 122.1 pm and a Van der Waals radius of 187 pm. Gallium Bohr ModelGallium was predicted by Dmitri Mendeleev in 1871. It was first discovered and isolated by Lecoq de Boisbaudran in 1875. In its elemental form, gallium has a silvery appearance. Elemental GalliumGallium is one of three elements that occur naturally as a liquid at room temperature, the other two being mercury and cesium. Gallium does not exist as a free element in nature and is sourced commercially from bauxite and sphalerite. Currently, gallium is used in semiconductor devices for microelectronics and optics. The element name originates from the Latin word 'Gallia', the old name of France, and the word 'Gallus,' meaning rooster.

TODAY'S SCIENCE POST!

November 21, 2017
Los Angeles, CA
Each business day American Elements' scientists & engineers post their choice for the most exciting materials science news of the day

New way to write magnetic info could pave the way for hardware neural networks