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Hafnium Yttrium Sputtering Target

Linear Formula:

Hf-Y

MDL Number:

N/A

EC No.:

N/A

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Hafnium Yttrium Sputtering Target
HF-Y-02-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Hafnium Yttrium Sputtering Target
HF-Y-03-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Hafnium Yttrium Sputtering Target
HF-Y-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Hafnium Yttrium Sputtering Target
HF-Y-05-ST
Pricing > SDS > Data Sheet >

Hafnium Yttrium Sputtering Target Properties (Theoretical)

Compound Formula HfY
Appearance Metallic Target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A

Hafnium Yttrium Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Transport Information N/A
MSDS / SDS

About Hafnium Yttrium Sputtering Target

American Elements specializes in producing high purity Hafnium Yttrium Sputtering targets with the highest possible density High Purity (99.99%) Hafnium Yttrium Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards.

Hafnium Yttrium Sputtering Target Synonyms

Hafnium-yttrium, Hf-Y, HfY

Chemical Identifiers

Linear Formula Hf-Y
MDL Number N/A
EC No. N/A
Pubchem CID 23282010
IUPAC Name hafnium(4+); yttrium(3+)
SMILES InChI=1S/Hf.Y/q+4;+3
InchI Identifier [Y+3].[Hf+4]
InchI Key XRSQCSXGOXFKFZ-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Hafnium products. Hafnium (atomic symbol: Hf, atomic number: 72) is a Block D, Group 4, Period 6 element with an atomic weight of 178.49. Hafnium Bohr ModelThe number of electrons in each of Hafnium's shells is 2, 8, 18, 32, 10, 2 and its electron configuration is [Xe] 4f14 5d2 6s2. The hafnium atom has a radius of 159 pm and a Van der Waals radius of 212 pm. Hafnium was predicted by Dmitri Mendeleev in 1869 but it was not until 1922 that it was first isolated Dirk Coster and George de Hevesy. In its elemental form, hafnium has a lustrous silvery-gray appearance. Elemental HafniumHafnium does not exist as a free element in nature. It is found in zirconium compounds such as zircon. Hafnium is often a component of superalloys and circuits used in semiconductor device fabrication. Its name is derived from the Latin word Hafnia, meaning Copenhagen, where it was discovered.

See more Yttrium products. Yttrium (atomic symbol: Y, atomic number: 39) is a Block D, Group 3, Period 5 element with an atomic weight of 88.90585. Yttrium Bohr ModelThe number of electrons in each of yttrium's shells is [2, 8, 18, 9, 2] and its electron configuration is [Kr] 4d1 5s2. The yttrium atom has a radius of 180 pm and a Van der Waals radius of 219 pm. Yttrium was discovered by Johann Gadolin in 1794 and first isolated by Carl Gustav Mosander in 1840. In its elemental form, Yttrium has a silvery white metallic appearance. Yttrium has the highest thermodynamic affinity for oxygen of any element. Elemental YttriumYttrium is not found in nature as a free element and is almost always found combined with the lanthanides in rare earth minerals. While not part of the rare earth series, it resembles the heavy rare earths which are sometimes referred to as the "yttrics" for this reason. Another unique characteristic derives from its ability to form crystals with useful properties. The name yttrium originated from a Swedish village near Vaxholm called Yttbery where it was discovered.

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October 18, 2019
Los Angeles, CA
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