Linear Formula:

Fe-Si

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Iron Silicon Sputtering Target
FE-SI-02-ST
Pricing > SDS > Data Sheet >
(2N5) 99.5% Iron Silicon Sputtering Target
FE-SI-025-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Iron Silicon Sputtering Target
FE-SI-03-ST
Pricing > SDS > Data Sheet >
(3N5) 99.95% Iron Silicon Sputtering Target
FE-SI-035-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Iron Silicon Sputtering Target
FE-SI-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Iron Silicon Sputtering Target
FE-SI-05-ST
Pricing > SDS > Data Sheet >

Iron Silicon Sputtering Target Properties (Theoretical)

Appearance Target
Melting Point 1212-1630 °C
Boiling Point N/A
Density N/A
Solubility in H2O N/A

Iron Silicon Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
RTECS Number N/A
Transport Information N/A
MSDS / SDS

About Iron Silicon Sputtering Target

American Elements specializes in producing high purity Iron Silicon Sputtering Targets with the highest possible density High Purity (99.99%) Iron Silicon Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Iron as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Iron Silicon Sputtering Target Synonyms

FeSi2, Ferrosilicon, ferro silicon, FeSi2

Chemical Identifiers

Linear Formula Fe-Si
MDL Number N/A
EC No. N/A

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

Iron

See more Iron products. Iron (atomic symbol: Fe, atomic number: 26) is a Block D, Group 8, Period 4 element with an atomic weight of 55.845. The number of electrons in each of Iron's shells is 2, 8, 14, 2 and its electron configuration is [Ar] 3d6 4s2. Iron Bohr ModelThe iron atom has a radius of 126 pm and a Van der Waals radius of 194 pm. Iron was discovered by humans before 5000 BC. In its elemental form, iron has a lustrous grayish metallic appearance. Iron is the fourth most common element in the Earth's crust and the most common element by mass forming the earth as a whole. Iron is rarely found as a free element, since it tends to oxidize easily; it is usually found in minerals such as magnetite, hematite, goethite, limonite, or siderite.Elemental Iron Though pure iron is typically soft, the addition of carbon creates the alloy known as steel, which is significantly stronger.

Silicon

See more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental SiliconSilica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.

TODAY'S TOP DISCOVERY!

March 18, 2024
Los Angeles, CA
Each business day American Elements' scientists & engineers post their choice for the most exciting materials science news of the day
Enhancing CO Oxidation: The Impact of a Nanoscale Metal Oxide Layer on Gold and Platinum Nanoparticle Catalysts

Enhancing CO Oxidation: The Impact of a Nanoscale Metal Oxide Layer on Gold and Platinum Nanoparticle Catalysts