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Molybdenum Disilicide Sputtering Target

CAS #: 12136-78-6
Linear Formula:
MoSi2
MDL Number
MFCD00151535
EC No.:
235-231-8

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Molybdenum Disilicide Sputtering Target MO-SID2-02-ST SDS > Data Sheet >
(2N5) 99.5% Molybdenum Disilicide Sputtering Target MO-SID2-025-ST SDS > Data Sheet >
(3N) 99.9% Molybdenum Disilicide Sputtering Target MO-SID2-03-ST SDS > Data Sheet >
(3N5) 99.95% Molybdenum Disilicide Sputtering Target MO-SID2-035-ST SDS > Data Sheet >
(4N) 99.99% Molybdenum Disilicide Sputtering Target MO-SID2-04-ST SDS > Data Sheet >
(5N) 99.999% Molybdenum Disilicide Sputtering Target MO-SID2-05-ST SDS > Data Sheet >
WHOLESALE/SKU 0000-742-7867

Molybdenum Disilicide Sputtering Target Properties (Theoretical)

Compound Formula MoSi2
Molecular Weight 152.11
Appearance solid
Melting Point N/A
Boiling Point N/A
Density 6.31 g/cm3
Solubility in H2O N/A
Exact Mass 153.859261
Monoisotopic Mass 153.859261

Molybdenum Disilicide Sputtering Target Health & Safety Information

Signal Word Warning
Hazard Statements H302-H312-H332
Hazard Codes Xn
Risk Codes 20/21/22
Safety Statements 36
RTECS Number N/A
Transport Information N/A
WGK Germany 3

About Molybdenum Disilicide Sputtering Target

American Elements specializes in producing high purity Molybdenum Disilicide Sputtering Targets with the highest possible density High Purity (99.99%) Molybdenum Disilicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Molybdenum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Synonyms

Molybdenum Silicide Sputtering Target

Chemical Identifiers

Linear Formula MoSi2
Pubchem CID 6336985
MDL Number MFCD00151535
EC No. 235-231-8
IUPAC Name bis(λ2-silanylidene) molybdenum
Beilstein/Reaxys No. N/A
SMILES [Si]=[Mo]=[Si]
InchI Identifier InChI=1S/Mo.2Si
InchI Key YXTPWUNVHCYOSP-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Molybdenum products. Molybdenum (atomic symbol: Mo, atomic number: 42) is a Block D, Group 6, Period 5 element with an atomic weight of 95.96. Molybdenum Bohr ModelThe number of electrons in each of molybdenum's shells is [2, 8, 18, 13, 1] and its electron configuration is [Kr] 4d5 5s1. The molybdenum atom has a radius of 139 pm and a Van der Waals radius of 209 pm. In its elemental form, molybdenum has a gray metallic appearance. Molybdenum was discovered by Carl Wilhelm in 1778 and first isolated by Peter Jacob Hjelm in 1781. Molybdenum is the 54th most abundant element in the earth's crust. Elemental MolybdenumIt has the third highest melting point of any element, exceeded only by tungsten and tantalum. Molybdenum does not occur naturally as a free metal, it is found in various oxidation states in minerals. The primary commercial source of molybdenum is molybdenite, although it is also recovered as a byproduct of copper and tungsten mining. The origin of the name Molybdenum comes from the Greek word molubdos meaning lead.

See more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental SiliconSilica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.