Nickel Silicide Sputtering Target


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Product Code Product Request Quote
NI-SI-02-ST (2N) 99% Nickel Silicide Sputtering Target Request
NI-SI-025-ST (2N5) 99.5% Nickel Silicide Sputtering Target Request
NI-SI-03-ST (3N) 99.9% Nickel Silicide Sputtering Target Request
NI-SI-035-ST (3N5) 99.95% Nickel Silicide Sputtering Target Request
NI-SI-04-ST (4N) 99.99% Nickel Silicide Sputtering Target Request
NI-SI-05-ST (5N) 99.999% Nickel Silicide Sputtering Target Request


American Elements specializes in producing high purity Nickel Silicide Sputtering Targets with the highest possible density High Purity (99.99%) Nickel Silicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.



Chemical Identifiers

Formula Ni2Si
CAS 12059-14-2
Pubchem CID N/A
EC No. 235-033-1
Beilstein Registry No. N/A
SMILES [Ni]=[Si]=[Ni]
InchI Identifier InChI=1S/2Ni.Si


Compound Formula Ni2Si
Molecular Weight 145.47
Appearance N/A
Melting Point N/A
Boiling Point N/A
Density 7.40 g/cm3
Exact Mass N/A
Monoisotopic Mass 143.8480072
Charge N/A

Health & Safety Info  |  MSDS / SDS

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
Transport Information N/A
Globally Harmonized System of Classification and Labelling (GHS) N/A

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.

Related Products

NiSee more Nickel products. Nickel (atomic symbol: Ni, atomic number: 28) is a Block D, Group 4, Period 4 element with an atomic weight of 58.6934. The number of electrons in each of nickel's shells is [2, 8, 16, 2] and its electron configuration is [Ar]3d8 4s2. Nickel was first discovered by Alex Constedt in 1751. The nickel atom has a radius of 124 pm and a Van der Waals radius of 184 pm. In its elemental form, nickel has a lustrous metallic silver appearance. Nickel is a hard and ductile transition metal that is considered corrosion-resistant because of its slow rate of oxidation. It is one of four elements that are ferromagnetic and is used in the production of various type of magnets for commercial use. Nickel is sometimes found free in nature but is more commonly found in ores. The bulk of mined nickel comes from laterite and magmatic sulfide ores. The name originates from the German word kupfernickel, which means "false copper" from the illusory copper color of the ore.

SiSee more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. The number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Silica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.


Recent Research & Development for Silicon

  • Proposed high-speed micron-scale spatial light valve based on a silicon-graphene hybrid structure. Qiu C, Pan T, Gao W, Liu R, Su Y, Soref R. Opt Lett. 5-50-2015
  • Surface Coating Constraint Induced Self-Discharging of Silicon Nanoparticles as Anodes for Lithium Ion Batteries. Luo L, Zhao P, Yang H, Liu B, Zhang JG, Cui Y, Yu G, Zhang S, Wang CM. Nano Lett. 9/30/2015
  • Boron Doped Nanocrystalline Film with Improved Work Function as a Buffer Layer in Thin Film Silicon Solar Cells. Park J, Shin C, Park H, Jung J, Lee YJ, Bong S, Dao VA, Balaji N, Yi J. J Nanosci Nanotechnol. 9/30/2015
  • Robust postfabrication trimming of ultracompact resonators on silicon on insulator with relaxed requirements on resolution and alignment. Alipour P, Atabaki AH, Askari M, Adibi A, Eftekhar AA. Opt Lett. 9/30/2015
  • Optimizing pin-printed and hydrosilylated microarray spot density on porous silicon platforms. McCall DT, Zhang Y, Hook DJ, Bright FV. Langmuir. 9/29/2015
  • On the thermodynamically stable amorphous phase of polymer-derived silicon oxycarbide. Yu L, Raj R. Sci Rep. 9/28/2015
  • Magnetotransport Properties of Epitaxial Ge/AlAs Heterostructures Integrated on GaAs and Silicon. Hudait MK, Clavel MB, Goley PS, Xie Y, Heremans J. ACS Appl Mater Interfaces. 9/25/2015
  • Surface Morphology and Structural Modification Induced by Femtosecond Pulses in Hydrogenated Amorphous Silicon Films. Almeida GF, Cardoso MR, Aoki PH, Lima JJ Jr, Costa Lda F, Rodrigues CA, Constantino CJ, Mendoncal CR. J Nanosci Nanotechnol. 6/11/2015
  • Cell culture on hydrophilicity-controlled silicon nitride surfaces. Masuda Y, Inami W, Miyakawa A, Kawata Y. World J Microbiol Biotechnol. 6/7/2015
  • Neuron-like differentiation of mesenchymal stem cells on silicon nanowires. Kim H, Kim I, Choi HJ, Kim SY, Yang EG. Nanoscale. 8/30/2014

Recent Research & Development for Nickel

  • Modulation of the PI3K/Akt Pathway and Bcl-2 Family Proteins Involved in Chicken's Tubular Apoptosis Induced by Nickel Chloride (NiCl?). Guo H, Cui H, Peng X, Fang J, Zuo Z, Deng J, Wang X, Wu B, Chen K, Deng J. Int J Mol Sci. 11/1/2015
  • Mechanism of intramolecular transformations of nickel phosphanido hydride complexes. Latypov SK, Polyancev FM, Ganushevich YS, Miluykov VA, Sinyashin OG. Dalton Trans. 10/10/2015
  • Effect of nickel titanium file design on the root surface strain and apical microcracks. Jamleh A, Adorno CG, Ebihara A, Suda H. Aust Endod J. 9/30/2015
  • Bioleaching of gold, copper and nickel from waste cellular phone PCBs and computer goldfinger motherboards by two Aspergillus nigerstrains. Madrigal-Arias JE, Argumedo-Delira R, Alarcón A, Mendoza-López MR, García-Barradas O, Cruz-Sánchez JS, Ferrera-Cerrato R, Jiménez-Fernández M. Braz J Microbiol. 9/24/2015
  • State of Supported Nickel Nanoparticles during Catalysis in Aqueous Media. Chase ZA, Kasakov S, Shi H, Vjunov A, Fulton JL, Camaioni DM, Balasubramanian M, Zhao C, Wang Y, Lercher JA. Chemistry. 9/22/2015
  • Coordination-Induced Spin-State Switching with Nickel Chlorin and Nickel Isobacteriochlorin. Dommaschk M, Thoms V, Schütt C, Näther C, Puttreddy R, Rissanen K, Herges R. Inorg Chem. 9/17/2015
  • Layer-by-layer motif hybridization: nanoporous nickel oxide flakes wrapped into graphene oxide sheets toward enhanced oxygen reduction reaction. Zakaria MB, Malgras V, Takei T, Li C, Yamauchi Y. Chem Commun (Camb). 9/11/2015
  • A nickel-titanium shape memory alloy plate for contactless inverse dynamization after internal fixation in a sheep tibia fracture model: A pilot study. Decker S, Krämer M, Marten AK, Pfeifer R, Wesling V, Neunaber C, Hurschler C, Krettek C, Müller CW. Technol Health Care. 8/29/2015
  • Cyclic fatigue resistance of D-RaCe, ProTaper, and Mtwo nickel-titanium retreatment instruments after immersion in sodium hypochlorite. Topçuo?lu HS, Pala K, Akt? A, Düzgün S, Topçuo?lu G. Clin Oral Investig. 9/15/2014
  • Electrochemical imprinted polycrystalline nickel-nickel oxide half-nanotube-modified boron-doped diamond electrode for the detection of L-serine. Dai W, Li H, Li M, Li C, Wu X, Yang B. ACS Appl Mater Interfaces. 4/13/2014

Recent Research & Development for Silicides

  • Grown from lithium flux, the ErCo5Si(3.17) silicide is a combination of disordered derivatives of the UCo5Si3 and Yb6Co30P19 structure types. Stetskiv A, Rozdzynska-Kielbik B, Misztal R, Pavlyuk V. Acta Crystallogr C Struct Chem. 8-86-2015
  • Dynamic observation on the growth behaviors in manganese silicide/silicon nanowire heterostructures. Hsieh YH, Chiu CH, Huang CW, Chen JY, Lin WJ, Wu WW. Nanoscale. 11/1/2015
  • Effect of Elastic Strain Fluctuation on Atomic Layer Growth of Epitaxial Silicide in Si Nanowires by Point Contact Reactions. Chou YC, Tang W, Chiou CJ, Chen K, Minor AM, Tu KN. Nano Lett. 9/30/2015
  • Effect of silicide/silicon hetero-junction structure on thermal conductivity and Seebeck coefficient. Choi W, Park YS, Hyun Y, Zyung T, Kim J, Kim S, Jeon H, Shin M, Jang M. J Nanosci Nanotechnol. 9/30/2015
  • Lithium silicide nanocrystals: synthesis, chemical stability, thermal stability, and carbon encapsulation. Cloud JE, Wang Y, Li X, Yoder TS, Yang Y, Yang Y. Inorg Chem. 9/29/2015
  • Simultaneous nanocalorimetry and fast XRD measurements to study the silicide formation in Pd/a-Si bilayers. Molina-Ruiz M, Ferrando-Villalba P, Rodríguez-Tinoco C, Garcia G, Rodríguez-Viejo J, Peral I, Lopeandía AF. J Synchrotron Radiat. 9/28/2015
  • Defect-free erbium silicide formation using an ultrathin Ni interlayer. Choi J, Choi S, Kang YS, Na S, Lee HJ, Cho MH, Kim H. ACS Appl Mater Interfaces. 9/21/2015
  • Photocatalytic hydrogen evolution over ?-iron silicide under infrared-light irradiation. Yoshimizu M, Kobayashi R, Saegusa M, Takashima T, Funakubo H, Akiyama K, Matsumoto Y, Irie H. Chem Commun (Camb). 7/6/2015
  • Dry-air-stable lithium silicide-lithium oxide core-shell nanoparticles as high-capacity prelithiation reagents. Zhao J, Lu Z, Liu N, Lee HW, McDowell MT, Cui Y. Nat Commun. 6/7/2015
  • A Computational Study on the Ground and Excited States of Nickel Silicide. Schoendorff G, Morris AR, Hu ED, Wilson AK. J Phys Chem A. 11/22/2013

Free Test Sample Program

We recognize many of our customers are purchasing small quantities directly online as trial samples in anticipation of placing a larger future order or multiple orders as a raw material for production. Since our primary business is the production of industrial quantities and/or highly consistent batches which can be used for commercial production and purchased repeatedly in smaller quantity, American Elements offers trial samples at no charge on the following basis. Within 6 months of purchasing materials directly online from us, you have the option to refer back to that order and advise that it is the intention of your company, institution or lab to either purchase a larger quantity, purchase the material in regular intervals or purchase more on some other basis.

We will then evaluate your future needs and assuming the quantity or number of future purchases qualify, we will fully credit your purchase price with the next order. Because of the many variables in the quantity and number of orders you may place, it is impossible to evaluate whether your future order(s) will qualify for this program prior to your placing your next order. Please know American Elements strongly desires to make this free sample program available to you and will make every effort to do so once your next order is placed.