Nickel Silicide Sputtering Target



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Product Code Available Product Forms Request A Quote
NI-SI-02-ST (2N) 99% Nickel Silicide Sputtering Target Request
NI-SI-025-ST (2N5) 99.5% Nickel Silicide Sputtering Target Request
NI-SI-03-ST (3N) 99.9% Nickel Silicide Sputtering Target Request
NI-SI-035-ST (3N5) 99.95% Nickel Silicide Sputtering Target Request
NI-SI-04-ST (4N) 99.99% Nickel Silicide Sputtering Target Request
NI-SI-05-ST (5N) 99.999% Nickel Silicide Sputtering Target Request


Compound Formula Ni2Si
Molecular Weight 145.47
Appearance N/A
Melting Point N/A
Boiling Point N/A
Density 7.40 g/cm3
Exact Mass N/A
Monoisotopic Mass 143.8480072
Charge N/A

Health & Safety Info  |  MSDS / SDS

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
Transport Information N/A
Globally Harmonized System of Classification and Labelling (GHS) N/A


American Elements specializes in producing high purity Nickel Silicide Sputtering Targets with the highest possible density High Purity (99.99%) Nickel Silicide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.



Chemical Identifiers

Formula Ni2Si
CAS 12059-14-2
Pubchem CID N/A
EC No. 235-033-1
Beilstein Registry No. N/A
SMILES [Ni]=[Si]=[Ni]
InchI Identifier InChI=1S/2Ni.Si

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Material Safety Data Sheet (MSDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes.

Related Products & Element Information

See more Nickel products. Nickel (atomic symbol: Ni, atomic number: 28) is a Block D, Group 4, Period 4 element with an atomic weight of 58.6934. Nickel Bohr ModelThe number of electrons in each of nickel's shells is [2, 8, 16, 2] and its electron configuration is [Ar]3d8 4s2. Nickel was first discovered by Alex Constedt in 1751. The nickel atom has a radius of 124 pm and a Van der Waals radius of 184 pm. In its elemental form, nickel has a lustrous metallic silver appearance. Elemental NickelNickel is a hard and ductile transition metal that is considered corrosion-resistant because of its slow rate of oxidation. It is one of four elements that are ferromagnetic and is used in the production of various type of magnets for commercial use. Nickel is sometimes found free in nature but is more commonly found in ores. The bulk of mined nickel comes from laterite and magmatic sulfide ores. The name originates from the German word kupfernickel, which means "false copper" from the illusory copper color of the ore.

See more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental SiliconSilica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.