Investigation of the refractive index repeatability for tantalum pentoxide coatings, prepared by physical vapor film deposition techniques.
Title | Investigation of the refractive index repeatability for tantalum pentoxide coatings, prepared by physical vapor film deposition techniques. |
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Authors | Stenzel, O.; Wilbrandt, S.; Wolf, J.; Schürmann, M.; Kaiser, N.; Ristau, D.; Ehlers, H.; Carstens, F.; Schippel, S.; Mechold, L.; Rauhut, R.; Kennedy, M.; Bischoff, M.; Nowitzki, T.; Zöller, A.; Hagedorn, H.; Reus, H.; Hegemann, T.; Starke, K.; Harhausen, J.; Foest, R.; Schumacher, J. |
Journal | Appl Opt |
DOI | 10.1364/AO.56.00C193 |
Abstract |
Random effects in the repeatability of refractive index and absorption edge position of tantalum pentoxide layers prepared by plasma-ion-assisted electron-beam evaporation, ion beam sputtering, and magnetron sputtering are investigated and quantified. Standard deviations in refractive index between 4*10-4 and 4*10-3 have been obtained. Here, lowest standard deviations in refractive index close to our detection threshold could be achieved by both ion beam sputtering and plasma-ion-assisted deposition. In relation to the corresponding mean values, the standard deviations in band-edge position and refractive index are of similar order. |