Long-term time dependence of internal stress in lanthanum titanium oxide (H4) optical thin films.

Author(s) Takegami, M.; Nakano, R.; Murotani, H.
Journal Appl Opt
Date Published 2017 Feb 01
Abstract

The time variation in the internal stress of optical thin films composed of lanthanum titanium oxide (H4) deposited by ion-beam assisted deposition (IAD) and electron beam deposition was observed over a period of 10 years after deposition, and it was found that the internal stresses in the optical thin films can be controlled by optimizing the IAD conditions. Both tensile stress and compressive stress could be created by IAD, and the chemical bonding state of Ti may affect the stress behavior. The network size of the chemical bonds may affect the stress direction.

DOI 10.1364/AO.56.000C96
ISSN 1539-4522
Citation Appl Opt. 2017;56(4):C96C99.

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