Ovonic threshold switching in polycrystalline zinc telluride thin films deposited by RF sputtering.

Author(s) Kim, T.; Kim, Y.; Lee, I.; Lee, D.; Sohn, H.
Journal Nanotechnology
Date Published 2019 Mar 29
Abstract

Chalcogenide materials of the amorphous phase with low band gaps were reported to show Ovonic threshold switching (OTS), making them suitable for selection devices in cross-point memory arrays. Herein, we report that ZnTe films with polycrystalline structures show OTS behavior. Nearly stoichiometric ZnTe thin films were deposited by an RF sputtering method. X-ray diffraction analysis indicated that the films were polycrystalline. The optical band gaps of the ZnTe films were estimated as 2.2 eV from UV-visible spectroscopy transmittance measurements. Photoluminescence measurements indicated the existence of deep-level defects in the ZnTe thin films. Although these ZnTe films have a polycrystalline structure with a relatively high band gap, I-V profiles show OTS characteristics, with a selectivity of over 10, fast threshold switching time in the sub-10 ns scale, and thermal stability up to 400 °C. ZnTe also shows switching endurance for more than 10 cycles without Vth drift, maintaining its selectivity of 10. Thus, we improved the threshold switching characteristics by using a wide band-gap and polycrystalline-structured ZnTe-based chalcogenide material. Post-annealing experiments indicated that the thermal budget of the ZnTe thin film was sufficient for stacked cross-point array structures, thereby overcoming a previous limitation of chalcogenide switching materials. This material is promising for application in high-density cross-point memory arrays as the selection device.

DOI 10.1088/1361-6528/aafe13
ISSN 1361-6528
Citation Kim T, Kim Y, Lee I, Lee D, Sohn H. Ovonic threshold switching in polycrystalline zinc telluride thin films deposited by RF sputtering. Nanotechnology. 2019;30(13):13LT01.

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