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Silicon Rotatable Sputtering Target

CAS #: 7440-21-3
Linear Formula:
Si
MDL Number
MFCD00085311
EC No.:
231-130-8

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Silicon Rotatable Sputtering Target SI-E-02-STR SDS > Data Sheet >
(2N5) 99.5% Silicon Rotatable Sputtering Target SI-E-025-STR SDS > Data Sheet >
(3N) 99.9% Silicon Rotatable Sputtering Target SI-E-03-STR SDS > Data Sheet >
(3N5) 99.95% Silicon Rotatable Sputtering Target SI-E-035-STR SDS > Data Sheet >
(4N) 99.99% Silicon Rotatable Sputtering Target SI-E-04-STR SDS > Data Sheet >
(5N) 99.999% Silicon Rotatable Sputtering Target SI-E-05-STR SDS > Data Sheet >
WHOLESALE/SKU 0000-742-{{nid}}

Silicon Rotatable Sputtering Target Properties (Theoretical)

Molecular Weight 28.08
Appearance Silvery
Melting Point 1414 °C
Boiling Point 2900 °C
Density 2330 kg/m3
Solubility in H2O N/A
Poisson's Ratio 0.064 - 0.28
Young's Modulus 51-80 GPa
Vickers Hardness N/A
Tensile Strength N/A
Thermal Conductivity 1.49 W/cm/K @ 298.2 K
Thermal Expansion (25 °C) 2.6 µm·m-1·K-1
Electrical Resistivity 3-4 microhm-cm @ 0°C
Electronegativity 1.8 Paulings
Specific Heat 0.168 Cal/g/K @ 25°C
Heat of Vaporization 40.6 K-Cal/gm atom at 2355 °C

Silicon Rotatable Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Precautionary Statements P312
Flash Point Not applicable
Risk Codes N/A
Safety Statements N/A
RTECS Number VW0400000
Transport Information NONH
WGK Germany 2

About Silicon Rotatable Sputtering Target

Ultra High Purity Silicon Rotatable Sputtering TargetsAmerican Elements specializes in producing high purity Silicon rotatable sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube. Rotary Targets (Cylindrical Targets) are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes. We also produce Silicon as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Synonyms

N/A

Chemical Identifiers

Linear Formula Si
Pubchem CID 5461123
MDL Number MFCD00085311
EC No. 231-130-8
Beilstein/Reaxys No. N/A
SMILES [Si]
InchI Identifier InChI=1S/Si
InchI Key XUIMIQQOPSSXEZ-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Silicon products. Silicon (atomic symbol: Si, atomic number: 14) is a Block P, Group 14, Period 3 element with an atomic weight of 28.085. Silicon Bohr MoleculeThe number of electrons in each of Silicon's shells is 2, 8, 4 and its electron configuration is [Ne] 3s2 3p2. The silicon atom has a radius of 111 pm and a Van der Waals radius of 210 pm. Silicon was discovered and first isolated by Jöns Jacob Berzelius in 1823. Silicon makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, exceeded only by oxygen. The metalloid is rarely found in pure crystal form and is usually produced from the iron-silicon alloy ferrosilicon. Elemental SiliconSilica (or silicon dioxide), as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Ultra high purity silicon can be doped with boron, gallium, phosphorus, or arsenic to produce silicon for use in transistors, solar cells, rectifiers, and other solid-state devices which are used extensively in the electronics industry.The name Silicon originates from the Latin word silex which means flint or hard stone.