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Tantalum Carbide Sputtering Target

CAS #: 12070-06-3
Linear Formula:
TaC
MDL Number
MFCD00011255
EC No.:
235-118-3

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Tantalum Carbide Sputtering Target TA-C-02-ST SDS > Data Sheet >
(2N5) 99.5% Tantalum Carbide Sputtering Target TA-C-025-ST SDS > Data Sheet >
(3N) 99.9% Tantalum Carbide Sputtering Target TA-C-03-ST SDS > Data Sheet >
(3N5) 99.95% Tantalum Carbide Sputtering Target TA-C-035-ST SDS > Data Sheet >
(4N) 99.99% Tantalum Carbide Sputtering Target TA-C-04-ST SDS > Data Sheet >
(5N) 99.999% Tantalum Carbide Sputtering Target TA-C-05-ST SDS > Data Sheet >
WHOLESALE/SKU 0000-742-{{nid}}

Tantalum Carbide Sputtering Target Properties (Theoretical)

Compound Formula TaC
Molecular Weight 192.96
Appearance Brown to dark brown target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Exact Mass N/A
Monoisotopic Mass N/A
Charge N/A

Tantalum Carbide Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
Transport Information N/A

About Tantalum Carbide Sputtering Target

American Elements specializes in producing high purity Tantalum Carbide Sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes. We also produce Tantalum as rods, powder and plates. Other shapes are available by request.

Synonyms

Tantalum(IV) carbide, methylidynetantalum

Chemical Identifiers

Linear Formula TaC
Pubchem CID 46837398
MDL Number MFCD00011255
EC No. 235-118-3
IUPAC Name methanidylidynetantalum(1+)
Beilstein/Reaxys No.
SMILES [C-]#[Ta+]
InchI Identifier InChI=1S/C.Ta/q-1;+1
InchI Key DUMHRFXBHXIRTD-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Tantalum products. Tantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. Tantalum Bohr ModelThe number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. The tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. High Purity (99.999%) Tantalum (Ta) MetalTantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology.