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Tantalum Oxide Sputtering Target

CAS #: 1314-61-0
Linear Formula:
Ta2O5
MDL Number
MFCD00011254
EC No.:
215-238-2

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(3N) 99.9% Tantalum Oxide Sputtering Target TA-OX-03-ST SDS > Data Sheet >
(4N) 99.99% Tantalum Oxide Sputtering Target TA-OX-04-ST SDS > Data Sheet >
(5N) 99.999% Tantalum Oxide Sputtering Target TA-OX-05-ST SDS > Data Sheet >
(2N) 99% Tantalum Oxide Sputtering Target TA-OX-02-ST SDS > Data Sheet >
WHOLESALE/SKU 0000-742-6246

Tantalum Oxide Sputtering Target Properties (Theoretical)

Compound Formula O5Ta2
Molecular Weight 441.89
Appearance white target
Melting Point 1,872° C (3,402° F)
Boiling Point N/A
Density 8.2 g/cm3
Solubility in H2O N/A
Exact Mass 212.938 g/mol
Monoisotopic Mass 441.870573 Da

Tantalum Oxide Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Precautionary Statements N/A
Flash Point Not applicable
Risk Codes N/A
Safety Statements N/A
RTECS Number WW5855000
Transport Information NONH
WGK Germany nwg

About Tantalum Oxide Sputtering Target

Oxide IonAmerican Elements specializes in producing high purity Tantalum oxide sputtering targets with the highest possible density High Purity (99.909%) Tantalum Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Tantalum Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia) and follows applicable ASTM testing standards. Typical and custom packaging is available. Other shapes are available by request.

Synonyms

Tantalum pentoxide, Tantalic acid anhydride, Tantalum(V) oxide, Ditantalum pentaoxide, Ta<sub>2</sub>O<sub>x</sub>

Chemical Identifiers

Linear Formula Ta2O5
Pubchem CID 518712
MDL Number MFCD00011254
EC No. 215-238-2
IUPAC Name dioxotantaliooxy(dioxo)tantalum
Beilstein/Reaxys No. N/A
SMILES 441.870573Da
InchI Identifier InChI=1S/5O.2Ta/q5*-2;2*+5
InchI Key BPUBBGLMJRNUCC-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Tantalum products. Tantalum (atomic symbol: Ta, atomic number: 73) is a Block D, Group 5, Period 6 element with an atomic weight of 180.94788. Tantalum Bohr ModelThe number of electrons in each of tantalum's shells is [2, 8, 18, 32, 11, 2] and its electron configuration is [Xe] 4f14 5d3 6s2. The tantalum atom has a radius of 146 pm and a Van der Waals radius of 217 pm. High Purity (99.999%) Tantalum (Ta) MetalTantalum was first discovered by Anders G. Ekeberg in 1802 in Uppsala, Sweden however, it was not until 1844 when Heinrich Rose first recognized it as a distinct element. In its elemental form, tantalum has a grayish blue appearance. Tantalum is found in the minerals tantalite, microlite, wodginite, euxenite, and polycrase. Due to the close relation of tantalum to niobium in the periodic table, Tantalum's name originates from the Greek word Tantalos meaning Father of Niobe in Greek mythology.