Thallium Rotatable Sputtering Target

American Elements specializes in producing high purity Thallium Rotatable Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube. Rotary Targets (Cylindrical Targets) are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes. We also produce Thallium as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.