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Ferrosilicon |
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Si-Fe |
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Ferrosilicon is
a standard silicon source for ferrous industry applications, including steel and iron products. technical, research and safety (MSDS) information is available as is a Reference Calculator for converting relevant units of measurement.
Silicon is a Block P, Group 14, Period 3 element. The electronic configuration is [Ne] 3s2 3p2. In its elemental form silicon's CAS number is 7440-21-3. The silicon atom has a radius of 117.6.pm and it's Van der Waals radius is 210.pm. Silicon is one of man's most useful elements. It makes up 25.7% of the earth's crust, by weight, and is the second most abundant element, being exceeded only by oxygen. The Czochralski process is commonly used to produce single crystals of silicon used for solid-state or semiconductor devices. Silica, as sand, is a principal ingredient of glass, one of the most inexpensive of materials with excellent mechanical, optical, thermal, and electrical properties. Iron is a Block D, Group 8, Period 4 element. The electronic configuration is [Ar] 3d6 4s2. In its elemental form iron's CAS number is 7439-89-6. The iron atom has a radius of 124.1.pm and it's Van der Waals radius is 200.pm. Iron is the most commonly used metal for commercial applications due to its hardness, historical availability and low cost. Once used on its own, it is now alloyed with nickel and other elements to produce steel and other high strength, non-corrosive structural metals. Iron as a metal and as its many compounds has numerous uses. It is a primary colorant in glass and ceramics. It is a catalyst. It is the basis for low grade magnets and because of its magnetic properties is used extensively in memory tape. Recent applications for Iron nanoparticles include in water treatment of carbon tetrachloride in contaminated groundwater, magnetic data storage and resonance imaging (MRI) and in certain alloy and catalyst applications. Iron can also be introduced into processes using iron foil, pellets, rod and wire by thin film Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Organometallic and Chemical Vapor Deposition (MOCVD) for specific applications such as fuel cells and solar energy. |
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© 2001-2008. American Elements is a U.S. Registered Trademark. All rights reserved. This website and all pages, designs, concepts, logos, and color schemes herein are the copyrighted proprietary rights and intellectual property of American Elements. |
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