About Silicides

Tantalum Silicide

Silicides are binary compounds of silicon with other more electropositive elements. Chemical bonds in silicides may exhibit primarily covalent or primarily ionic characteristics, depending on the electronegativity of participating elements.

Silicides of many transition metals and all non-transition metals except beryllium have been described; mercury, thallium, bismuth, and lead are nonmiscible with liquid silicon. Transition metal silicides are usually inert to all aqueous solutions with the exception of hydrofluoric acid, but they can react with more aggressive agents such as potassium hydroxide or halogen gases when subjected to extremely high temperatures.

Silicides play important roles in the field of advanced technology. Thin films of metal silicides are integral to the integrated circuits of semiconductor and microelectronics devices, the most common including CoSi2, NiSi2, WSi2, MoSi2, TaSi2, TiSi2., and PtSi, a superconductor and Schottky barrier used in infrared detection and Schottky contacts. These materials are typically synthesized via sputtering deposition of the metal onto a high purity silicon wafer. Alkali metal silicides like sodium silicide generate pure hydrogen when reacted with water or water-based solutions, making them a potentially viableas a clean, sustainable source of hydrogen for fuel cells. Niobium silicide was used to create the first functional printed diode that worked up to the GHz range, and a novel lithium borosilicide (LiBSi2) has been investigated as a promising anode material for lithium-ion batteries that could increase cell capacity.

Silicides Products

Barium Silicide Boron Silicide Calcium Silicide
Cerium Silicide Chromium Disilicide Sputtering Target Chromium(II) Silicide
Chromium(II) Silicide Cr3Si2 Chromium(III) Silicide Cr3Si Chromium(III) Silicide Sputtering Target
Cobalt Silicide Cobalt Silicide Sputtering Target Copper Silicide
Dysprosium(II) Silicide Erbium Silicide Europium Silicide Granules
Europium(II) Silicide Gadolinium(II) Silicide Germanium Silicide
Hafnium Silicide Hafnium Silicide Sputtering Target Holmium Silicide
Iridium Silicide Iron Disilicide Iron Silicide
Iron Silicide Sputtering Target Lanthanum Silicide Lithium Silicon Alloy
Lutetium Silicide Magnesium Silicide Magnesium Silicide Sputtering Target
Manganese Silicide Molybdenum Disilicide Molybdenum Disilicide Heating Elements
Molybdenum Disilicide Sputtering Target Molybdenum Silicide (Mo5Si3) Molybdenum Silicide (MoSi2)
Neodymium Silicide Nickel Silicide Nickel Silicide NiSi2
Nickel Silicide Sputtering Target Niobium Silicide Nb5Si3 Niobium Silicide NbSi2
Niobium Silicide Sputtering Target Palladium Silicide Platinum Silicide
Praseodymium Silicide Rhenium Silicide Samarium Silicide
Sodium Silicide Strontium Silicide Tantalum Disilicide
Tantalum Silicide Tantalum Silicide Sputtering Target Terbium(VI) Silicide
Thorium(IV) Silicide Thulium Silicide Titanium Disilicide
Titanium Disilicide Sputtering Target Titanium Silicide (Ti5Si3) Tungsten Disilicide
Tungsten Disilicide Sputtering Target Tungsten Silicide Tungsten Silicide Sputtering Target
Uranium Silicide Vanadium Silicide Vanadium(II) Silicide
Ytterbium Silicide Ytterbium Silicide YbSi2 Yttrium Silicide
Zirconium(IV) Silicide Zirconium(IV) Silicide Sputtering Target

American Elements manufactures multiple forms of silicide compounds including solutions, nanopowders, submicron, and -325 mesh powders, and high surface area materials with particle distribution and particle size controlled and certified. We also produce larger -40 mesh, -100 mesh, -200 mesh range sizes and <0.5 mm, 2 mm, 5 mm and other sizes of shot, granules, lump, flake and pieces. Purities include 99%, 99.9%, 99.99%, 99.999% and 99.9999% (2N, 3N, 4N, 5N and 6N).

American Elements maintains industrial scale production for all its silicides products and will execute Non-Disclosure or Confidentiality Agreements to protect customer know-how.