American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antennas” which found that the new material “enhanced frequency stability” leading to further miniaturization.
Below is merely a selection of the full catalog of Electronics products that American Elements manufactures. If you do not see a material you're looking for listed, please search the website or contact customerservice@americanelements.com.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (5N) 99.999% Aluminum Oxide Powder (5N) 99.999% Boron Oxide (5N) 99.999% Germanium(IV) Sulfide
(5N) 99.999% Indium(I) Iodide Powder (5N) 99.999% Silicon Oxide (6N) 99.9999% Bismuth Metal (6N) 99.9999% Copper Metal
(6N) 99.9999% Selenium Metal (6N) 99.9999% Tellurium Metal (6N) 99.9999% Tin Metal (6N5) 99.99995% Aluminum Metal
(7N) 99.99999% Cadmium Metal (7N5) 99.999995% Arsenic Metal (8N) 99.999999% Gallium Ingot (8N) 99.999999% Mercury Liquid
(t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink 6-(Ferrocenyl)hexanethiol
Aluminium Gallium Indium Phosphide Aluminum Alloy 1350 Aluminum Copper Silicon Sputtering Target Aluminum Gallium Nitride (AlGaN)
Aluminum Ink Aluminum Magnesium Boride Aluminum Nitride Sputtering Target Aluminum Nitride Wafer
Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate Aluminum Oxide Sputtering Target Aluminum Paste
Aluminum Silicate Aluminum Silicon Alloy Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target
Aluminum Silver Alloy Aluminum Silver Foil Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Ferrite
Barium Hydroxide Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride
Beryllium Nickel Alloy Bis(10-hydroxybenzo[h]quinolinato)beryllium Bis(8-hydroxy-2-methylquinoline)-(4-phenylphenoxy)aluminum Bis(diethylamino)silane
Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bis(t-butylamino)silane Bismuth Hexafluoroacetylacetonate Bismuth Telluride
Bismuth Tin Nanoparticles / Nanopowder Bismuth Zinc Niobate Sputtering Target Bis[2-(4,6-difluorophenyl)pyridinato-C2,N](picolinato)iridium(III) Black Phosphorus
Boron Arsenide Boron Nitride Cadmium Selenide Cadmium Sulfide
Cadmium Telluride Calcium Cyclohexanebutyrate Carbon Aerogel Carbon Graphite Ink
Carbon Nanotube Arrays Carbon Nanotube Ink Carbon Nanotubes Carbonyl Iron Powder
Cerium(IV) Silicate Chromium-coated Tungsten Wire Cobalt Palladium Alloy Copper Aluminum Sputtering Target
Copper Cadmium Alloy Copper Cadmium Tin Alloy Copper Conductor Paste Copper Gallium Selenide
Copper Gallium Selenide Sputtering Target Copper Gallium Telluride Copper Germanium Selenide Copper Ink
Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target Copper Sulfate Solution
Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer Copper(II) Oxide Nanoparticle Dispersion
Cyclopentadienylindium(I) Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride
Double-Walled Carbon Nanotubes Fused Quartz Sputtering Target Gadolinium Nickel Oxide Sputtering Target Gallium Antimonide Single Crystal Substrate
Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate Gallium Arsenide Wafer Gallium Indium Eutectic
Gallium Indium Tin Alloy Gallium Nitride Wafer Gallium Phosphide Nanodispersion Gallium Phosphide Single Crystal Substrate
Gallium Tin Alloy Germanium Antimonide Germanium Antimony Selenide Germanium Antimony Telluride
Germanium Silicide Germanium Single Crystal Germanium Wafer Germanium(II) Selenide
Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy Gold Copper Sputtering Target
Gold Germanium Nickel Sputtering Target Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles
Gold Nickel Palladium Alloy Gold Palladium Sputtering Target Gold Platinum Alloy Gold Platinum Foil
Gold Platinum Sputtering Target Gold Silicon Sputtering Target Gold Silver Palladium Alloy Gold Sputtering Target
Gold Tin Alloy Gold Tin Sputtering Target Gold Wafer Gold-Coated Silicon Wafer
Gold-coated Tungsten Wire Graphene Graphene Dispersion Hafnium Carbonitride
Indium Arsenide Indium Arsenide Sputtering Target Indium Arsenide Wafer Indium Bismuth Tin Alloy
Indium Bismuth Tin Powder Indium Gallium Zinc Oxide Indium Oxide/Tin Oxide Indium Phosphide Wafer
Indium Single Crystal Indium Tin Oxide (ITO) Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target
Indium Wafer Indium Zinc Oxide (IZO) Indium Zinc Oxide Sputtering Target InPb
Iron Germanium Alloy Kovar Alloy Kovar Powder Lanthanum Aluminum Oxide Single Crystal Substrate
Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide Lead Magnesium Niobate Lead Selenide Telluride
Lead Telluride Lithium Niobate Wafer Lithium Tantalate Wafer LSAT Single Crystal Substrate
Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer Magnesium Single Crystal
Magnesium Wafer Mercury Cadmium Telluride Wafer Mercury Liquid Methyltrichlorosilane
Molybdenum Copper Wafers Molybdenum Diselenide Crystal Molybdenum Selenide Flakes Molybdenum Sulfide
Molybdenum Telluride Molybdenum Telluride Crystal Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes
Neodymium Nickel Oxide Sputtering Target Nickel Cermet Nickel Copper Sputtering Target Nickel Ink
Nickel Paste Nickel Silicide Nickel Silicide NiSi2 Nickel Tungsten Sputtering Target
Nickel(II) Sulfamate Hydrate Niobium Powder Palladium Nickel Alloy Palladium Nickel Gauze
Palladium Nickel Powder Palladium Single Crystal Pentakis(dimethylamino)niobium(V) Phosphor Bronze
Phosphor Bronze Powder Phosphorus Pentasulfide Phosphorus(III) Chloride Platinum Coated Silicon Wafer
Platinum Conductor Paste Platinum Gold Crucible Platinum/Gold Conductor Paste Polycrystalline Silicon
PZT (Lead Zirconate Titanate) Reduced Graphene Oxide Rhenium Disulfide Crystal Sapphire Wafer
Silicon Aluminum Oxide Sputtering Target Silicon Aluminum Rotatable Sputtering Target Silicon Carbide Silicon Carbide Wafer
Silicon Chips Silicon Germanium Indium Arsenic Selenide Sputtering Target Silicon Germanium Sputtering Target Silicon Metal
Silicon Nitride Foil Silicon Nitride Nanofiber Silicon Oxide Foil Silicon Oxide Wafer
Silicon Phosphide Silicon Phosphide Sputtering Target Silicon Sputtering Target Silicon Wafer, Boron-doped
Silicon-Germanium Alloy Silver Acetate Silver Aluminum Sputtering Target Silver Cadmium Oxide
Silver Carbon Paste Silver Carbonate Silver Chloride Ink Silver Coated Copper Powder
Silver Copper Alloy Silver Copper Ink Silver Copper Sputtering Target Silver Ink
Silver Nanoparticle Ink Silver Nanoparticles Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder
Silver Rhenium Alloy Silver Sputtering Target Silver Tin Sputtering Target Silver-Coated Silicon Wafer
Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Aluminum Niobium Oxide Strontium Aluminum Tantalum Oxide
Strontium Bismuth Tantalate Strontium Titanate Single Crystal Substrate Tantalum Powder Tantalum Silicide Sputtering Target
Tetrabutyl Orthosilicate Tetrakis(diethylamino)zirconium Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet
Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder Tin Copper Alloy Tin Silver Copper Alloy
Tin Silver Copper Nanoparticles Tin Sputtering Target Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct
Titanium Dioxide Paste Titanium Disulfide Crystal Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium
Triethylindium Triisopropylgallium Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin
Trimethylaluminum Trimethylgallium Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V)
Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V) Tris[2-(4-n-hexylphenyl)quinoline)]iridium(III) Tungsten Nitride (WN)
Tungsten Oxide Nanoparticle Ink Tungsten Sulfide Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine
Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine Vitreous Carbon Foam Zinc Oxide Nanoparticle Ink
Zirconium Oxide Paste Zirconium Oxide Powder