American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating

The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antenna” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink
Aluminium Gallium Indium Phosphide Aluminum Copper Silicon Sputtering Target Aluminum Ink Aluminum Magnesium Boride
Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate
Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate Aluminum Silicon Alloy
Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Hydroxide
Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride Bis(diethylamino)silane
Bismuth Hexafluoroacetylacetonate Bismuth Telluride Black Phosphorus Boron Arsenide
Boron Nitride Cadmium Selenide Cadmium Telluride Calcium Cyclohexanebutyrate
Carbon Aerogel Carbon Graphite Ink Carbon Nanotube Ink Carbon Nanotubes
Cobalt Palladium Alloy Copper Aluminum Sputtering Target Copper Conductor Paste Copper Gallium Selenide
Copper Gallium Selenide Sputtering Target Copper Gallium Telluride Copper Germanium Selenide Copper Ink
Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target Copper Sulfate Solution
Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer Diammineplatinum(II) Nitrite Solution
Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride Discovery of earth-abundant nitride semiconductors by computational screening and high-pressure synthesis Double-Walled Carbon Nanotubes
EAMTA 2015, 10th School of Micro and Nanoelectronics FCMN 2015, Frontiers of Characterization and Metrology for Nanoelectronics Conference 2015, Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate
Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate Gallium Arsenide Wafer Gallium Indium Eutectic
Gallium Nitride Wafer Gallium Phosphide Single Crystal Substrate Germanium Antimonide Germanium Antimony Telluride
Germanium Single Crystal Germanium Wafer Germanium(IV) Sulfide Gold Antimony Sputtering Target
Gold Copper Palladium Alloy Gold Copper Sputtering Target Gold Germanium Sputtering Target Gold Nanoparticle Dispersion
Gold Nanoparticles Gold Nickel Palladium Alloy Gold Palladium Sputtering Target Gold Platinum Sputtering Target
Gold Silicon Sputtering Target Gold Silver Palladium Alloy Gold Sputtering Target Gold Tin Sputtering Target
Gold Wafer Gold-Coated Silicon Wafer Graphene Graphene Dispersion
Hafnium Carbonitride IMAPS 2015, 48th International Symposium on Microelectronics Indium Arsenide Wafer Indium Bismuth Tin Alloy
Indium Bismuth Tin Powder Indium Gallium Zinc Oxide Indium Oxide/Tin Oxide Indium Phosphide Wafer
Indium Single Crystal Indium Tin Oxide (ITO) Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target
Indium Wafer Indium Zinc Oxide (IZO) Indium Zinc Oxide Sputtering Target Iron Germanium Alloy
Kovar Alloy Kovar Powder Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium
Lanthanum Iron Oxide Lead Magnesium Niobate Lead Selenide Telluride Lead Telluride
Lithium Niobate Wafer Lithium Tantalate Wafer LSAT Single Crystal Substrate Magnesium Aluminate Single Crystal Substrate
Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer Magnesium Single Crystal Magnesium Wafer
MEMS 2017, 30th IEEE International Methyltrichlorosilane Molybdenum Copper Wafers Molybdenum Diselenide Crystal
Molybdenum Sulfide Molybdenum Telluride Molybdenum Telluride Crystal Molybdenum(IV) Selenide
Multi-Walled Carbon Nanotubes Nickel Beryllium Alloy Nickel Cermet Nickel Copper Sputtering Target
Nickel Ink Nickel Paste Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate
Niobium Powder Palladium Nickel Alloy Palladium Nickel Gauze Palladium Nickel Powder
Palladium Single Crystal PEC 2015, Physical Electronics Conference, 75th Annual Rutgers PEC 2016, Physical Electronics Conference, 76th Annual Rutgers Pentakis(dimethylamino)niobium(V)
Phosphor Bronze Phosphor Bronze Powder Phosphorus Pentasulfide Phosphorus(III) Chloride
Platinum Conductor Paste Platinum Gold Crucible Platinum/Gold Conductor Paste Polycrystalline Silicon
PZT (Lead Zirconate Titanate) Reduced Graphene Oxide Rhenium Disulfide Crystal Sapphire Wafer
Silicon Aluminum Oxide Rotatable Sputtering Target Silicon Aluminum Rotatable Sputtering Target Silicon Carbide Silicon Carbide Wafer
Silicon Metal Silicon Nitride Foil Silicon Nitride Nanofiber Silicon Oxide Foil
Silicon Oxide Wafer Silicon Sputtering Target Silver Acetate Silver Aluminum Sputtering Target
Silver Cadmium Oxide Silver Carbon Paste Silver Carbonate Silver Chloride Ink
Silver Copper Alloy Silver Copper Sputtering Target Silver Ink Silver Nanoparticle Ink
Silver Nanoparticles Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy
Silver Sputtering Target Silver Tin Sputtering Target Silver-Coated Copper Ink Silver-Zinc Oxide
Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Titanate Single Crystal Substrate Tantalum Powder Tantalum Silicide Sputtering Target
Tetrabutyl orthosilicate Tetrakis(diethylamino)zirconium Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet
Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder Tin Copper Alloy Tin Silver Copper Alloy
Tin Silver Copper Nanoparticles Tin Sputtering Target Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct
Titanium Dioxide Paste Titanium Disulfide Crystal Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium
Triethylindium Triisopropylgallium Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin
Trimethylaluminum Trimethylgallium Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V)
Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V) Tungsten Nitride (WN) Tungsten Oxide Nanoparticle Ink
Tungsten Sulfide Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine
Vanadyl Phthalocyanine Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste Zirconium Oxide Powder

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