American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antenna” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink
Aluminium Gallium Indium Phosphide Aluminum Copper Silicon Sputtering Target Aluminum Ink Aluminum Magnesium Boride
Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate
Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate Aluminum Silicon Alloy
Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Hydroxide
Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride Bis(diethylamino)silane
Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bismuth Hexafluoroacetylacetonate Bismuth Telluride Black Phosphorus
Boron Arsenide Boron Nitride Cadmium Selenide Cadmium Telluride
Calcium Cyclohexanebutyrate Carbon Aerogel Carbon Graphite Ink Carbon Nanotube Ink
Carbon Nanotubes Cobalt Palladium Alloy Copper Aluminum Sputtering Target Copper Conductor Paste
Copper Gallium Selenide Copper Gallium Selenide Sputtering Target Copper Gallium Telluride Copper Germanium Selenide
Copper Ink Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target
Copper Sulfate Solution Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer
Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride Double-Walled Carbon Nanotubes
Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate
Gallium Arsenide Wafer Gallium Indium Eutectic Gallium Nitride Wafer Gallium Phosphide Single Crystal Substrate
Germanium Antimonide Germanium Antimony Telluride Germanium Single Crystal Germanium Wafer
Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy Gold Copper Sputtering Target
Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles Gold Nickel Palladium Alloy
Gold Palladium Sputtering Target Gold Platinum Sputtering Target Gold Silicon Sputtering Target Gold Silver Palladium Alloy
Gold Sputtering Target Gold Tin Alloy Gold Tin Sputtering Target Gold Wafer
Gold-Coated Silicon Wafer Graphene Graphene Dispersion Hafnium Carbonitride
Indium Arsenide Wafer Indium Bismuth Tin Alloy Indium Bismuth Tin Powder Indium Gallium Zinc Oxide
Indium Oxide/Tin Oxide Indium Phosphide Wafer Indium Single Crystal Indium Tin Oxide (ITO)
Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target Indium Wafer Indium Zinc Oxide (IZO)
Indium Zinc Oxide Sputtering Target Iron Germanium Alloy Kovar Alloy Kovar Powder
Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide Lead Magnesium Niobate
Lead Selenide Telluride Lead Telluride Lithium Niobate Wafer Lithium Tantalate Wafer
LSAT Single Crystal Substrate Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer
Magnesium Single Crystal Magnesium Wafer Methyltrichlorosilane Molybdenum Copper Wafers
Molybdenum Diselenide Crystal Molybdenum Sulfide Molybdenum Telluride Molybdenum Telluride Crystal
Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes Nickel Beryllium Alloy Nickel Cermet
Nickel Copper Sputtering Target Nickel Ink Nickel Paste Nickel Tungsten Sputtering Target
Nickel(II) Sulfamate Hydrate Niobium Powder Palladium Nickel Alloy Palladium Nickel Gauze
Palladium Nickel Powder Palladium Single Crystal Pentakis(dimethylamino)niobium(V) Phosphor Bronze
Phosphor Bronze Powder Phosphorus Pentasulfide Phosphorus(III) Chloride Platinum Conductor Paste
Platinum Gold Crucible Platinum/Gold Conductor Paste Polycrystalline Silicon PZT (Lead Zirconate Titanate)
Reduced Graphene Oxide Rhenium Disulfide Crystal Sapphire Wafer Silicon Aluminum Oxide Rotatable Sputtering Target
Silicon Aluminum Rotatable Sputtering Target Silicon Carbide Silicon Carbide Wafer Silicon Metal
Silicon Nitride Foil Silicon Nitride Nanofiber Silicon Oxide Foil Silicon Oxide Wafer
Silicon Sputtering Target Silver Acetate Silver Aluminum Sputtering Target Silver Cadmium Oxide
Silver Carbon Paste Silver Carbonate Silver Chloride Ink Silver Copper Alloy
Silver Copper Sputtering Target Silver Ink Silver Nanoparticle Ink Silver Nanoparticles
Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy Silver Sputtering Target
Silver Tin Sputtering Target Silver-Coated Copper Ink Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion
Strontium Titanate Single Crystal Substrate Tantalum Powder Tantalum Silicide Sputtering Target Tetrabutyl orthosilicate
Tetrakis(diethylamino)zirconium Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet Tin Bismuth Zinc Alloy
Tin Bismuth Zinc Powder Tin Copper Alloy Tin Silver Copper Alloy Tin Silver Copper Nanoparticles
Tin Sputtering Target Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste
Titanium Disulfide Crystal Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium Triethylindium
Triisopropylgallium Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin Trimethylaluminum
Trimethylgallium Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III)
Tris(ethylmethylamido)(tert-butylimido)tantalum(V) Tungsten Nitride (WN) Tungsten Oxide Nanoparticle Ink Tungsten Sulfide
Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine
Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste Zirconium Oxide Powder