American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antennas” which found that the new material “enhanced frequency stability” leading to further miniaturization.
Below is merely a selection of the full catalog of Electronics products that American Elements manufactures. If you do not see a material you're looking for listed, please search the website or contact customerservice@americanelements.com.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (5N) 99.999% Aluminum Oxide Powder (5N) 99.999% Boron Oxide (5N) 99.999% Germanium(IV) Sulfide
(5N) 99.999% Indium(I) Iodide Powder (5N) 99.999% Silicon Oxide (6N) 99.9999% Bismuth Metal (6N) 99.9999% Copper Metal
(6N) 99.9999% Selenium Metal (6N) 99.9999% Tellurium Metal (6N) 99.9999% Tin Metal (6N5) 99.99995% Aluminum Metal
(7N) 99.99999% Cadmium Metal (7N5) 99.999995% Arsenic Metal (8N) 99.999999% Gallium Ingot (8N) 99.999999% Mercury Liquid
(t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink 6-(Ferrocenyl)hexanethiol
Aluminium Gallium Indium Phosphide Aluminum Alloy 1350 Aluminum Copper Silicon Sputtering Target Aluminum Gallium Nitride (AlGaN)
Aluminum Ink Aluminum Magnesium Boride Aluminum Nitride Sputtering Target Aluminum Nitride Wafer
Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate Aluminum Oxide Sputtering Target Aluminum Paste
Aluminum Silicate Aluminum Silicon Alloy Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target
Aluminum Silver Alloy Aluminum Silver Foil Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Ferrite
Barium Hydroxide Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride
Beryllium Nickel Alloy Bis(10-hydroxybenzo[h]quinolinato)beryllium Bis(8-hydroxy-2-methylquinoline)-(4-phenylphenoxy)aluminum Bis(diethylamino)silane
Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bis(t-butylamino)silane Bismuth Hexafluoroacetylacetonate Bismuth Telluride
Bismuth Telluride Nanoparticles / Nanopowder Bismuth Tin Nanoparticles / Nanopowder Bismuth Zinc Niobate Sputtering Target Bis[2-(4,6-difluorophenyl)pyridinato-C2,N](picolinato)iridium(III)
Black Phosphorus Boron Arsenide Boron Nitride Cadmium Selenide
Cadmium Sulfide Cadmium Sulfide Nanoparticles / Nanopowder Cadmium Telluride Calcium Cyclohexanebutyrate
Carbon Aerogel Carbon Graphite Ink Carbon Nanotube Arrays Carbon Nanotube Ink
Carbon Nanotubes Carbonyl Iron Powder Cerium(IV) Silicate Chromium-coated Tungsten Wire
Cobalt Palladium Alloy Copper Aluminum Sputtering Target Copper Cadmium Alloy Copper Cadmium Tin Alloy
Copper Conductor Paste Copper Gallium Selenide Copper Gallium Selenide Sputtering Target Copper Gallium Telluride
Copper Germanium Selenide Copper Indium Sulfide Granules Copper Indium Sulfide Nanoparticles Copper Indium Sulfide Sputtering Target
Copper Ink Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target
Copper Sulfate Solution Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer
Copper(II) Oxide Nanoparticle Dispersion Cyclopentadienylindium(I) Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I)
Diisopropyl Telluride Double-Walled Carbon Nanotubes Fused Quartz Sputtering Target Gadolinium Nickel Oxide Sputtering Target
Gallium Antimonide Single Crystal Substrate Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate Gallium Arsenide Wafer
Gallium Indium Eutectic Gallium Indium Tin Alloy Gallium Nitride Wafer Gallium Phosphide Nanodispersion
Gallium Phosphide Single Crystal Substrate Gallium Tin Alloy Germanium Antimonide Germanium Antimony Selenide
Germanium Antimony Telluride Germanium Silicide Germanium Single Crystal Germanium Sulfide Ge2S3
Germanium Wafer Germanium(II) Selenide Germanium(IV) Sulfide Gold Antimony Sputtering Target
Gold Copper Palladium Alloy Gold Copper Sputtering Target Gold Germanium Nickel Sputtering Target Gold Germanium Sputtering Target
Gold Nanoparticle Dispersion Gold Nanoparticles Gold Nickel Palladium Alloy Gold Palladium Sputtering Target
Gold Platinum Alloy Gold Platinum Foil Gold Platinum Sputtering Target Gold Silicon Sputtering Target
Gold Silver Palladium Alloy Gold Sputtering Target Gold Tin Alloy Gold Tin Sputtering Target
Gold Wafer Gold-Coated Silicon Wafer Gold-coated Tungsten Wire Graphene
Graphene Dispersion Hafnium Carbonitride Indium Arsenide Indium Arsenide Sputtering Target
Indium Arsenide Wafer Indium Bismuth Tin Alloy Indium Bismuth Tin Powder Indium Gallium Zinc Oxide
Indium Oxide/Tin Oxide Indium Phosphide Wafer Indium Single Crystal Indium Tin Oxide (ITO)
Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target Indium Wafer Indium Zinc Oxide (IZO)
Indium Zinc Oxide Sputtering Target InPb Iron Germanium Alloy Kovar Alloy
Kovar Powder Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide
Lead Magnesium Niobate Lead Selenide Telluride Lead Telluride Lithium Niobate Wafer
Lithium Tantalate Wafer LSAT Single Crystal Substrate Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate
Magnesium Oxide Wafer Magnesium Single Crystal Magnesium Wafer Mercury Cadmium Telluride Wafer
Mercury Liquid Methyltrichlorosilane Molybdenum Copper Wafers Molybdenum Diselenide Crystal
Molybdenum Selenide Flakes Molybdenum Sulfide Molybdenum Telluride Molybdenum Telluride Crystal
Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes Neodymium Nickel Oxide Sputtering Target Nickel Cermet
Nickel Copper Sputtering Target Nickel Ink Nickel Paste Nickel Silicide
Nickel Silicide NiSi2 Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate Niobium Powder
Palladium Nickel Alloy Palladium Nickel Gauze Palladium Nickel Powder Palladium Single Crystal
Pentakis(dimethylamino)niobium(V) Phosphor Bronze Phosphor Bronze Powder Phosphorus Pentasulfide
Phosphorus(III) Chloride Platinum Coated Silicon Wafer Platinum Conductor Paste Platinum Gold Crucible
Platinum/Gold Conductor Paste Polycrystalline Silicon PZT (Lead Zirconate Titanate) Reduced Graphene Oxide
Rhenium Disulfide Crystal Sapphire Wafer Silicon Aluminum Oxide Sputtering Target Silicon Aluminum Rotatable Sputtering Target
Silicon Carbide Silicon Carbide Wafer Silicon Chips Silicon Germanium Indium Arsenic Selenide Sputtering Target
Silicon Germanium Sputtering Target Silicon Metal Silicon Nitride Foil Silicon Nitride Nanofiber
Silicon Oxide Foil Silicon Oxide Wafer Silicon Phosphide Silicon Phosphide Sputtering Target
Silicon Sputtering Target Silicon Wafer, Boron-doped Silicon-Germanium Alloy Silver Acetate
Silver Aluminum Sputtering Target Silver Cadmium Oxide Silver Carbon Paste Silver Carbonate
Silver Chloride Ink Silver Coated Copper Powder Silver Copper Alloy Silver Copper Ink
Silver Copper Sputtering Target Silver Ink Silver Nanoparticle Ink Silver Nanoparticles
Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy Silver Sputtering Target
Silver Tin Sputtering Target Silver-Coated Silicon Wafer Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion
Strontium Aluminum Niobium Oxide Strontium Aluminum Tantalum Oxide Strontium Bismuth Tantalate Strontium Titanate Single Crystal Substrate
Tantalum Powder Tantalum Silicide Sputtering Target Tetrabutyl Orthosilicate Tetrakis(diethylamino)zirconium
Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder
Tin Copper Alloy Tin Silver Copper Alloy Tin Silver Copper Nanoparticles Tin Sputtering Target
Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste Titanium Disulfide Crystal
Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium Triethylindium Triisopropylgallium
Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin Trimethylaluminum Trimethylgallium
Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V)
Tris[2-(4-n-hexylphenyl)quinoline)]iridium(III) Tungsten Nitride (WN) Tungsten Oxide Nanoparticle Ink Tungsten Sulfide
Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine
Vitreous Carbon Foam Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste Zirconium Oxide Powder