American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antenna” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink
Aluminium Gallium Indium Phosphide Aluminum Alloy 1350 Aluminum Copper Silicon Sputtering Target Aluminum Ink
Aluminum Magnesium Boride Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste
Aluminum Oxide Single Crystal Substrate Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate
Aluminum Silicon Alloy Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Sputtering Target
Aluminum Single Crystal Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer
Aluminum-doped Zinc Oxide Nanoparticle Ink Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target
Barium Ferrite Barium Hydroxide Barium Titanate(IV) Barium Zirconate Titanate (BZT)
Beryllium Fluoride Bis(diethylamino)silane Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bis(t-butylamino)silane
Bismuth Hexafluoroacetylacetonate Bismuth Telluride Black Phosphorus Boron Arsenide
Boron Nitride Cadmium Selenide Cadmium Sulfide Cadmium Telluride
Calcium Cyclohexanebutyrate Carbon Aerogel Carbon Graphite Ink Carbon Nanotube Ink
Carbon Nanotubes Carbonyl Iron Powder Chromium-coated Tungsten Wire Cobalt Palladium Alloy
Copper Aluminum Sputtering Target Copper Cadmium Alloy Copper Cadmium Tin Alloy Copper Conductor Paste
Copper Gallium Selenide Copper Gallium Selenide Sputtering Target Copper Gallium Telluride Copper Germanium Selenide
Copper Ink Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target
Copper Sulfate Solution Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer
Copper(II) Oxide Nanoparticle Dispersion Cyclopentadienylindium(I) Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I)
Diisopropyl Telluride Double-Walled Carbon Nanotubes Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate
Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate Gallium Arsenide Wafer Gallium Indium Eutectic
Gallium Nitride Wafer Gallium Phosphide Nanodispersion Gallium Phosphide Single Crystal Substrate Gallium Tin Alloy
Germanium Antimonide Germanium Antimony Telluride Germanium Silicide Germanium Single Crystal
Germanium Wafer Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy
Gold Copper Sputtering Target Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles
Gold Nickel Palladium Alloy Gold Palladium Sputtering Target Gold Platinum Sputtering Target Gold Silicon Sputtering Target
Gold Silver Palladium Alloy Gold Sputtering Target Gold Tin Alloy Gold Tin Sputtering Target
Gold Wafer Gold-Coated Silicon Wafer Gold-coated Tungsten Wire Graphene
Graphene Dispersion Hafnium Carbonitride Indium Arsenide Wafer Indium Bismuth Tin Alloy
Indium Bismuth Tin Powder Indium Gallium Zinc Oxide Indium Oxide/Tin Oxide Indium Phosphide Wafer
Indium Single Crystal Indium Tin Oxide (ITO) Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target
Indium Wafer Indium Zinc Oxide (IZO) Indium Zinc Oxide Sputtering Target InPb
Iron Germanium Alloy Kovar Alloy Kovar Powder Lanthanum Aluminum Oxide Single Crystal Substrate
Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide Lead Magnesium Niobate Lead Selenide Telluride
Lead Telluride Lithium Niobate Wafer Lithium Tantalate Wafer LSAT Single Crystal Substrate
Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer Magnesium Single Crystal
Magnesium Wafer Mercury Liquid Methyltrichlorosilane Molybdenum Copper Wafers
Molybdenum Diselenide Crystal Molybdenum Sulfide Molybdenum Telluride Molybdenum Telluride Crystal
Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes Nickel Beryllium Alloy Nickel Cermet
Nickel Copper Sputtering Target Nickel Ink Nickel Paste Nickel Silicide
Nickel Silicide NiSi2 Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate Niobium Powder
Palladium Nickel Alloy Palladium Nickel Gauze Palladium Nickel Powder Palladium Single Crystal
Pentakis(dimethylamino)niobium(V) Phosphor Bronze Phosphor Bronze Powder Phosphorus Pentasulfide
Phosphorus(III) Chloride Platinum Conductor Paste Platinum Gold Crucible Platinum/Gold Conductor Paste
Polycrystalline Silicon PZT (Lead Zirconate Titanate) Reduced Graphene Oxide Rhenium Disulfide Crystal
Sapphire Wafer Silicon Aluminum Oxide Rotatable Sputtering Target Silicon Aluminum Rotatable Sputtering Target Silicon Carbide
Silicon Carbide Wafer Silicon Chips Silicon Metal Silicon Nitride Foil
Silicon Nitride Nanofiber Silicon Oxide Foil Silicon Oxide Wafer Silicon Sputtering Target
Silicon Wafer, Boron-doped Silicon-Germanium Alloy Silver Acetate Silver Aluminum Sputtering Target
Silver Cadmium Oxide Silver Carbon Paste Silver Carbonate Silver Chloride Ink
Silver Coated Copper Powder Silver Copper Alloy Silver Copper Sputtering Target Silver Ink
Silver Nanoparticle Ink Silver Nanoparticles Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder
Silver Rhenium Alloy Silver Sputtering Target Silver Tin Sputtering Target Silver-Coated Copper Ink
Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Titanate Single Crystal Substrate Tantalum Powder
Tantalum Silicide Sputtering Target Tetrabutyl orthosilicate Tetrakis(diethylamino)zirconium Thallium(I) Hexafluoroacetylacetonate
Thulium Iron Garnet Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder Tin Copper Alloy
Tin Silver Copper Alloy Tin Silver Copper Nanoparticles Tin Sputtering Target Tin(IV) Isopropoxide
Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste Titanium Disulfide Crystal Titanium(IV) Oxide, Rutile Single Crystal Substrate
Tri-tert-butylgallium Triethylindium Triisopropylgallium Trimethyl(phenyl)tin
Trimethyl(phenylethynyl)tin Trimethylaluminum Trimethylgallium Trimethylindium
Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V) Tungsten Nitride (WN)
Tungsten Oxide Nanoparticle Ink Tungsten Sulfide Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine
Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste
Zirconium Oxide Powder