American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.


The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.


The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antenna” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink
Aluminium Gallium Indium Phosphide Aluminum Copper Silicon Sputtering Target Aluminum Ink Aluminum Magnesium Boride
Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate
Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate Aluminum Silicon Alloy
Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Hydroxide
Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride Bis(diethylamino)silane
Bismuth Hexafluoroacetylacetonate Bismuth Telluride Black Phosphorus Boron Arsenide
Boron Nitride Cadmium Selenide Cadmium Telluride Carbon Aerogel
Carbon Graphite Ink Carbon Nanotube Ink Carbon Nanotubes Cobalt Palladium Alloy
Copper Aluminum Sputtering Target Copper Conductor Paste Copper Gallium Selenide Copper Gallium Selenide Sputtering Target
Copper Gallium Telluride Copper Germanium Selenide Copper Ink Copper Oxide Nanoparticle Ink
Copper Sputtering Target Copper Sulfate Solution Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy
Copper Wafer Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride
Discovery of earth-abundant nitride semiconductors by computational screening and high-pressure synthesis Double-Walled Carbon Nanotubes EAMTA 2015, 10th School of Micro and Nanoelectronics FCMN 2015, Frontiers of Characterization and Metrology for Nanoelectronics Conference 2015,
Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate
Gallium Arsenide Wafer Gallium Indium Eutectic Gallium Nitride Wafer Gallium Phosphide Single Crystal Substrate
Germanium Antimonide Germanium Antimony Telluride Germanium Single Crystal Germanium Wafer
Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy Gold Copper Sputtering Target
Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles Gold Nickel Palladium Alloy
Gold Palladium Sputtering Target Gold Platinum Sputtering Target Gold Silicon Sputtering Target Gold Silver Palladium Alloy
Gold Sputtering Target Gold Tin Sputtering Target Gold Wafer Gold-Coated Silicon Wafer
Graphene Graphene Dispersion Hafnium Carbonitride IMAPS 2015, 48th International Symposium on Microelectronics
Indium Arsenide Wafer Indium Bismuth Tin Alloy Indium Bismuth Tin Powder Indium Gallium Zinc Oxide
Indium Oxide/Tin Oxide Indium Phosphide Wafer Indium Single Crystal Indium Tin Oxide (ITO)
Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target Indium Wafer Indium Zinc Oxide (IZO)
Indium Zinc Oxide Sputtering Target Iron Germanium Alloy Kovar Alloy Kovar Powder
Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide Lead Magnesium Niobate
Lead Telluride Lithium Niobate Wafer Lithium Tantalate Wafer LSAT Single Crystal Substrate
Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer Magnesium Single Crystal
Magnesium Wafer Methyltrichlorosilane Molybdenum Copper Wafers Molybdenum Diselenide Crystal
Molybdenum Sulfide Molybdenum Telluride Molybdenum Telluride Crystal Molybdenum(IV) Selenide
Multi-Walled Carbon Nanotubes Nickel Cermet Nickel Copper Sputtering Target Nickel Ink
Nickel Paste Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate Niobium Powder
Palladium Nickel Alloy Palladium Nickel Powder Palladium Single Crystal PEC 2015, Physical Electronics Conference, 75th Annual Rutgers
PEC 2016, Physical Electronics Conference, 76th Annual Rutgers Pentakis(dimethylamino)niobium(V) Phosphor Bronze Phosphor Bronze Powder
Phosphorus Pentasulfide Phosphorus(III) Chloride Platinum Conductor Paste Platinum Gold Crucible
Platinum/Gold Conductor Paste Polycrystalline Silicon PZT (Lead Zirconate Titanate) Reduced Graphene Oxide
Rhenium Disulfide Crystal Sapphire Wafer Silicon Aluminum Oxide Rotatable Sputtering Target Silicon Aluminum Rotatable Sputtering Target
Silicon Carbide Silicon Carbide Wafer Silicon Metal Silicon Nitride Foil
Silicon Nitride Nanofiber Silicon Oxide Foil Silicon Oxide Wafer Silicon Sputtering Target
Silver Acetate Silver Aluminum Sputtering Target Silver Cadmium Oxide Silver Carbon Paste
Silver Carbonate Silver Chloride Ink Silver Copper Alloy Silver Copper Sputtering Target
Silver Ink Silver Nanoparticle Ink Silver Nanoparticles Silver Palladium Ink
Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy Silver Sputtering Target Silver Tin Sputtering Target
Silver-Coated Copper Ink Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Titanate Single Crystal Substrate
Tantalum Powder Tantalum Silicide Sputtering Target Tetrabutyl orthosilicate Tetrakis(diethylamino)zirconium
Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder
Tin Copper Alloy Tin Silver Copper Alloy Tin Silver Copper Nanoparticles Tin Sputtering Target
Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste Titanium Disulfide Crystal
Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium Triisopropylgallium Trimethyl(phenyl)tin
Trimethyl(phenylethynyl)tin Trimethylaluminum Trimethylgallium Trimethylindium
Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V) Tungsten Nitride (WN)
Tungsten Oxide Nanoparticle Ink Tungsten Sulfide Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine
Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste
Zirconium Oxide Powder