American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antenna” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink
Aluminium Gallium Indium Phosphide Aluminum Copper Silicon Sputtering Target Aluminum Ink Aluminum Magnesium Boride
Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate
Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate Aluminum Silicon Alloy
Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Sputtering Target Aluminum Single Crystal
Aluminum Sputtering Target Aluminum Tantalum Sputtering Target Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink
Amorphous Silicon Arsenic Monophosphide ATO Sputtering Target Barium Hydroxide
Barium Titanate(IV) Barium Zirconate Titanate (BZT) Beryllium Fluoride Bis(diethylamino)silane
Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bismuth Hexafluoroacetylacetonate Bismuth Telluride Black Phosphorus
Boron Arsenide Boron Nitride Cadmium Selenide Cadmium Telluride
Calcium Cyclohexanebutyrate Carbon Aerogel Carbon Graphite Ink Carbon Nanotube Ink
Carbon Nanotubes Cobalt Palladium Alloy Copper Aluminum Sputtering Target Copper Conductor Paste
Copper Gallium Selenide Copper Gallium Selenide Sputtering Target Copper Gallium Telluride Copper Germanium Selenide
Copper Ink Copper Nickel Tin Alloy Copper Oxide Nanoparticle Ink Copper Sputtering Target
Copper Sulfate Solution Copper Tin Alloy Spherical Powder Copper Tin Silver Alloy Copper Wafer
Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride Double-Walled Carbon Nanotubes
Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate
Gallium Arsenide Wafer Gallium Indium Eutectic Gallium Nitride Wafer Gallium Phosphide Single Crystal Substrate
Gallium Tin Alloy Germanium Antimonide Germanium Antimony Telluride Germanium Single Crystal
Germanium Wafer Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy
Gold Copper Sputtering Target Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles
Gold Nickel Palladium Alloy Gold Palladium Sputtering Target Gold Platinum Sputtering Target Gold Silicon Sputtering Target
Gold Silver Palladium Alloy Gold Sputtering Target Gold Tin Alloy Gold Tin Sputtering Target
Gold Wafer Gold-Coated Silicon Wafer Graphene Graphene Dispersion
Hafnium Carbonitride Indium Arsenide Wafer Indium Bismuth Tin Alloy Indium Bismuth Tin Powder
Indium Gallium Zinc Oxide Indium Oxide/Tin Oxide Indium Phosphide Wafer Indium Single Crystal
Indium Tin Oxide (ITO) Indium Tin Oxide Sputtering Target Indium Tin Sputtering Target Indium Wafer
Indium Zinc Oxide (IZO) Indium Zinc Oxide Sputtering Target InPb Iron Germanium Alloy
Kovar Alloy Kovar Powder Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium
Lanthanum Iron Oxide Lead Magnesium Niobate Lead Selenide Telluride Lead Telluride
Lithium Niobate Wafer Lithium Tantalate Wafer LSAT Single Crystal Substrate Magnesium Aluminate Single Crystal Substrate
Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer Magnesium Single Crystal Magnesium Wafer
Methyltrichlorosilane Molybdenum Copper Wafers Molybdenum Diselenide Crystal Molybdenum Sulfide
Molybdenum Telluride Molybdenum Telluride Crystal Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes
Nickel Beryllium Alloy Nickel Cermet Nickel Copper Sputtering Target Nickel Ink
Nickel Paste Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate Niobium Powder
Palladium Nickel Alloy Palladium Nickel Gauze Palladium Nickel Powder Palladium Single Crystal
Pentakis(dimethylamino)niobium(V) Phosphor Bronze Phosphor Bronze Powder Phosphorus Pentasulfide
Phosphorus(III) Chloride Platinum Conductor Paste Platinum Gold Crucible Platinum/Gold Conductor Paste
Polycrystalline Silicon PZT (Lead Zirconate Titanate) Reduced Graphene Oxide Rhenium Disulfide Crystal
Sapphire Wafer Silicon Aluminum Oxide Rotatable Sputtering Target Silicon Aluminum Rotatable Sputtering Target Silicon Carbide
Silicon Carbide Wafer Silicon Metal Silicon Nitride Foil Silicon Nitride Nanofiber
Silicon Oxide Foil Silicon Oxide Wafer Silicon Sputtering Target Silver Acetate
Silver Aluminum Sputtering Target Silver Cadmium Oxide Silver Carbon Paste Silver Carbonate
Silver Chloride Ink Silver Coated Copper Powder Silver Copper Alloy Silver Copper Sputtering Target
Silver Ink Silver Nanoparticle Ink Silver Nanoparticles Silver Palladium Ink
Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy Silver Sputtering Target Silver Tin Sputtering Target
Silver-Coated Copper Ink Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Titanate Single Crystal Substrate
Tantalum Powder Tantalum Silicide Sputtering Target Tetrabutyl orthosilicate Tetrakis(diethylamino)zirconium
Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder
Tin Copper Alloy Tin Silver Copper Alloy Tin Silver Copper Nanoparticles Tin Sputtering Target
Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste Titanium Disulfide Crystal
Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium Triethylindium Triisopropylgallium
Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin Trimethylaluminum Trimethylgallium
Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V)
Tungsten Nitride (WN) Tungsten Oxide Nanoparticle Ink Tungsten Sulfide Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine
Vanadyl 2,3-naphthalocyanine Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine Zinc Oxide Nanoparticle Ink
Zirconium Oxide Paste Zirconium Oxide Powder