American Elements supplies a comprehensive range of materials to the electronics industry, including deposition materials, optical and semiconductor materials, rare earth elements and compounds, nanostructured materials, and ultra high purity/MBE-grade metals, alloys, and compounds. We can provide raw, refined, and precursor forms of almost any material used in electronics manufacturing, including dielectrics (including specialized high-k and low-k materials), metals, semiconductors, transparent conductive oxides, and protective coatings.

With years of experience meeting the needs of electronics manufacturers and designers, American Elements is sensitive to the special concerns unique to this industry. Our ISO 9001 certified production facilities guarantee quality and lot-to-lot consistency.

Innovation Case Study #8: American Elements Aids Intel in Creating a Novel Dielectric Coating

#8: American Elements Aids Intel in Creating a Novel Dielectric Coating


The Challenge

Intel researchers were exploring ways to further miniaturize the antennas used in mobile devices. One barrier to further minimization is the dielectric coating's ability to shorten the wavelength.

The Innovation

Intel turned to American Elements to produce an oxide-passivated cobalt nanoparticle that could be dispersed in an epoxy and coated on the antenna.

The Result

The results were reported in 2014 in the Journal of Electronic Materials in an article entitled “Cobalt-Polymer Nanocomposites for Miniaturized Antennas” which found that the new material “enhanced frequency stability” leading to further miniaturization.

Selected Products Supplied to the Electronics Industry

(3,3-Dimethyl-1-butyne)dicobalt Hexacarbonyl (5N) 99.999% Aluminum Oxide Powder (5N) 99.999% Boron Oxide (5N) 99.999% Indium(I) Iodide Powder
(5N) 99.999% Silicon Oxide (6N) 99.9999% Bismuth Metal (6N) 99.9999% Copper Metal (6N) 99.9999% Selenium Metal
(6N) 99.9999% Tin Metal (6N5) 99.99995% Aluminum Metal (7N) 99.99999% Cadmium Metal (7N5) 99.999995% Arsenic
(t-Butylimido)tris(diethylamino)niobium(V) 3-Aminopropyltriethoxysilane 3D Printing Graphene Ink Aluminium Gallium Indium Phosphide
Aluminum Alloy 1350 Aluminum Copper Silicon Sputtering Target Aluminum Ink Aluminum Magnesium Boride
Aluminum Nitride Sputtering Target Aluminum Nitride Wafer Aluminum Oxide Paste Aluminum Oxide Single Crystal Substrate
Aluminum Oxide Sputtering Target Aluminum Paste Aluminum Silicate Aluminum Silicon Alloy
Aluminum Silicon Copper Sputtering Target Aluminum Silicon Sputtering Target Aluminum Silver Alloy Aluminum Silver Foil
Aluminum Silver Sputtering Target Aluminum Single Crystal Aluminum Sputtering Target Aluminum Tantalum Sputtering Target
Aluminum Wafer Aluminum-doped Zinc Oxide Nanoparticle Ink Amorphous Silicon Arsenic Monophosphide
ATO Sputtering Target Barium Ferrite Barium Hydroxide Barium Titanate(IV)
Barium Zirconate Titanate (BZT) Beryllium Fluoride Beryllium Nickel Alloy Bis(diethylamino)silane
Bis(N,N'-di-i-propylacetamidinato)cobalt(II) Bis(t-butylamino)silane Bismuth Hexafluoroacetylacetonate Bismuth Telluride
Black Phosphorus Boron Arsenide Boron Nitride Cadmium Selenide
Cadmium Sulfide Cadmium Telluride Calcium Cyclohexanebutyrate Carbon Aerogel
Carbon Graphite Ink Carbon Nanotube Ink Carbon Nanotubes Carbonyl Iron Powder
Chromium-coated Tungsten Wire Cobalt Palladium Alloy Copper Aluminum Sputtering Target Copper Cadmium Alloy
Copper Cadmium Tin Alloy Copper Conductor Paste Copper Gallium Selenide Copper Gallium Selenide Sputtering Target
Copper Gallium Telluride Copper Germanium Selenide Copper Ink Copper Nickel Tin Alloy
Copper Oxide Nanoparticle Ink Copper Sputtering Target Copper Sulfate Solution Copper Tin Alloy Spherical Powder
Copper Tin Silver Alloy Copper Wafer Copper(II) Oxide Nanoparticle Dispersion Cyclopentadienylindium(I)
Diammineplatinum(II) Nitrite Solution Dicarbonylcyclopentadienyl Cobalt(I) Diisopropyl Telluride Double-Walled Carbon Nanotubes
Fused Quartz Sputtering Target Gallium Antimonide Single Crystal Substrate Gallium Antimonide Wafer Gallium Arsenide Single Crystal Substrate
Gallium Arsenide Wafer Gallium Indium Eutectic Gallium Nitride Wafer Gallium Phosphide Nanodispersion
Gallium Phosphide Single Crystal Substrate Gallium Tin Alloy Germanium Antimonide Germanium Antimony Telluride
Germanium Silicide Germanium Single Crystal Germanium Wafer Germanium(II) Selenide
Germanium(IV) Sulfide Gold Antimony Sputtering Target Gold Copper Palladium Alloy Gold Copper Sputtering Target
Gold Germanium Sputtering Target Gold Nanoparticle Dispersion Gold Nanoparticles Gold Nickel Palladium Alloy
Gold Palladium Sputtering Target Gold Platinum Alloy Gold Platinum Foil Gold Platinum Sputtering Target
Gold Silicon Sputtering Target Gold Silver Palladium Alloy Gold Sputtering Target Gold Tin Alloy
Gold Tin Sputtering Target Gold Wafer Gold-Coated Silicon Wafer Gold-coated Tungsten Wire
Graphene Graphene Dispersion Hafnium Carbonitride Indium Arsenide Wafer
Indium Bismuth Tin Alloy Indium Bismuth Tin Powder Indium Gallium Zinc Oxide Indium Oxide/Tin Oxide
Indium Phosphide Wafer Indium Single Crystal Indium Tin Oxide (ITO) Indium Tin Oxide Sputtering Target
Indium Tin Sputtering Target Indium Wafer Indium Zinc Oxide (IZO) Indium Zinc Oxide Sputtering Target
InPb Iron Germanium Alloy Kovar Alloy Kovar Powder
Lanthanum Aluminum Oxide Single Crystal Substrate Lanthanum Bromide Doped with Cerium Lanthanum Iron Oxide Lead Magnesium Niobate
Lead Selenide Telluride Lead Telluride Lithium Niobate Wafer Lithium Tantalate Wafer
LSAT Single Crystal Substrate Magnesium Aluminate Single Crystal Substrate Magnesium Oxide Single Crystal Substrate Magnesium Oxide Wafer
Magnesium Single Crystal Magnesium Wafer Mercury Cadmium Telluride Wafer Mercury Liquid
Methyltrichlorosilane Molybdenum Copper Wafers Molybdenum Diselenide Crystal Molybdenum Sulfide
Molybdenum Telluride Molybdenum Telluride Crystal Molybdenum(IV) Selenide Multi-Walled Carbon Nanotubes
Nickel Cermet Nickel Copper Sputtering Target Nickel Ink Nickel Paste
Nickel Silicide Nickel Silicide NiSi2 Nickel Tungsten Sputtering Target Nickel(II) Sulfamate Hydrate
Niobium Powder Palladium Nickel Alloy Palladium Nickel Gauze Palladium Nickel Powder
Palladium Single Crystal Pentakis(dimethylamino)niobium(V) Phosphor Bronze Phosphor Bronze Powder
Phosphorus Pentasulfide Phosphorus(III) Chloride Platinum Conductor Paste Platinum Gold Crucible
Platinum/Gold Conductor Paste Polycrystalline Silicon PZT (Lead Zirconate Titanate) Reduced Graphene Oxide
Rhenium Disulfide Crystal Sapphire Wafer Silicon Aluminum Oxide Sputtering Target Silicon Aluminum Rotatable Sputtering Target
Silicon Carbide Silicon Carbide Wafer Silicon Chips Silicon Metal
Silicon Nitride Foil Silicon Nitride Nanofiber Silicon Oxide Foil Silicon Oxide Wafer
Silicon Sputtering Target Silicon Wafer, Boron-doped Silicon-Germanium Alloy Silver Acetate
Silver Aluminum Sputtering Target Silver Cadmium Oxide Silver Carbon Paste Silver Carbonate
Silver Chloride Ink Silver Coated Copper Powder Silver Copper Alloy Silver Copper Ink
Silver Copper Sputtering Target Silver Ink Silver Nanoparticle Ink Silver Nanoparticles
Silver Palladium Ink Silver Platinum Nanoparticles / Nanopowder Silver Rhenium Alloy Silver Sputtering Target
Silver Tin Sputtering Target Silver-Zinc Oxide Single-walled Carbon Nanotube (SWCNT) Dispersion Strontium Titanate Single Crystal Substrate
Tantalum Powder Tantalum Silicide Sputtering Target Tetrabutyl Orthosilicate Tetrakis(diethylamino)zirconium
Thallium(I) Hexafluoroacetylacetonate Thulium Iron Garnet Tin Bismuth Zinc Alloy Tin Bismuth Zinc Powder
Tin Copper Alloy Tin Silver Copper Alloy Tin Silver Copper Nanoparticles Tin Sputtering Target
Tin(IV) Isopropoxide Tin(IV) Isopropoxide Isopropanol Adduct Titanium Dioxide Paste Titanium Disulfide Crystal
Titanium(IV) Oxide, Rutile Single Crystal Substrate Tri-tert-butylgallium Triethylindium Triisopropylgallium
Trimethyl(phenyl)tin Trimethyl(phenylethynyl)tin Trimethylaluminum Trimethylgallium
Trimethylindium Tris(diethylamido)(tert-butylimido)tantalum(V) Tris(dimethylamido)antimony(III) Tris(ethylmethylamido)(tert-butylimido)tantalum(V)
Tris[2-(4-n-hexylphenyl)quinoline)]iridium(III) Tungsten Nitride (WN) Tungsten Oxide Nanoparticle Ink Tungsten Sulfide
Vanadyl 2,11,20,29-tetra-tert-butyl-2,3-naphthalocyanine Vanadyl 2,3-naphthalocyanine Vanadyl 3,10,17,24-tetra-tert-butyl-1,8,15,22-tetrakis(dimethylamino)-29H,31H-phthalocyanine Vanadyl Phthalocyanine
Vitreous Carbon Foam Zinc Oxide Nanoparticle Ink Zirconium Oxide Paste Zirconium Oxide Powder