Strontium Sputtering Target
High Purity Sr
Sputtering Target
7440-24-6
| Product | Product Code |
Order or Specifications |
99% Strontium Sputtering Target |
SR-M-02-ST
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99.9% Strontium Sputtering Target |
SR-M-03-ST
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99.99% Strontium Sputtering Target |
SR-M-04-ST |
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99.999% Strontium Sputtering Target |
SR-M-05-ST
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See research below. American Elements specializes in producing high purity Strontium sputtering targets with the highest possible density 
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Strontium as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Strontium as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
Strontium is a Block S, Group 2, Period 5 element. The electronic configuration is [Kr] 5s2. In its elemental form strontium's CAS number is 7440-24-6. The strontium atom has a radius of 215.1.pm and it's Van der Waals radius is 200.pm. Strontium has low tech applications as an additive to flares and pyrotechnics because of the bright crimson flame produced by its salts. Strontium is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. It also has many high technology applications because of its high refractive index as a titanate in glass, as a "getter" in electron tubes and as a dopant for numerous perovskite formulations to produce cathodes for oxygen generation or solid oxide fuel cells.
| Formula | CAS No. | Appearance | Molecular Weight | Density | Melting Point | Boiling Point |
| Sr | 7440-24-6 | silvery white | 87.62 | N/A | N/A | N/A |
| PRODUCT CATALOG | Submicron & Nanopowder | Tolling | Ultra High Purity | Sputtering Target | Crystal Growth | Rod, Plate, Powder, etc. |
© 2001-2008. American Elements is a U.S. Registered Trademark. All rights reserved.
This website and all pages, designs, concepts, logos, and color schemes herein are
the copyrighted proprietary rights and intellectual property of American Elements.
This website and all pages, designs, concepts, logos, and color schemes herein are
the copyrighted proprietary rights and intellectual property of American Elements.
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Recent Research & Development for Strontium
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