Skip to main content

Boron Nitride Sputtering Target

CAS #: 10043-11-5
Linear Formula:
BN
MDL Number
MFCD00011317
EC No.:
233-136-6

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Boron Nitride Sputtering Target BO-N-02-ST SDS > Data Sheet >
(2N5) 99.5% Boron Nitride Sputtering Target BO-N-025-ST SDS > Data Sheet >
(3N) 99.9% Boron Nitride Sputtering Target BO-N-03-ST SDS > Data Sheet >
(3N5) 99.95% Boron Nitride Sputtering Target BO-N-035-ST SDS > Data Sheet >
(4N) 99.99% Boron Nitride Sputtering Target BO-N-04-ST SDS > Data Sheet >
(5N) 99.999% Boron Nitride Sputtering Target BO-N-05-ST SDS > Data Sheet >
WHOLESALE/SKU 0000-742-14203

Boron Nitride Sputtering Target Properties (Theoretical)

Compound Formula BN
Molecular Weight 24.82
Appearance solid
Melting Point N/A
Boiling Point N/A
Density 1.9 to 2.1 g/cm3
Solubility in H2O N/A
Exact Mass 25.0124
Monoisotopic Mass 25.0124
Poisson's Ratio 0.11
Young's Modulus 14 to 60 GPa
Thermal Conductivity 29 to 96 W/m-K
Thermal Expansion 0.54 to 18 µm/m-K
Electrical Resistivity 13 to 15 10x Ω-m
Specific Heat 840 to 1610 J/kg-K

Boron Nitride Sputtering Target Health & Safety Information

Signal Word Warning
Hazard Statements H319-H335
Hazard Codes Xi
Risk Codes 36/37
Safety Statements 26-36
RTECS Number ED7800000
Transport Information N/A
WGK Germany 3

About Boron Nitride Sputtering Target

Nitride IonAmerican Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards. American Elements specializes in producing high purity Boron Nitride Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and High Purity (99.999%) Boron Nitride Sputtering TargetInductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solidsubstrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Boron as powder, ingot, pieces, pellets, disc, rods, and granules. Other shapes are available by request.

Synonyms

N/A

Chemical Identifiers

Linear Formula BN
Pubchem CID 66227
MDL Number MFCD00011317
EC No. 233-136-6
IUPAC Name azanylidyneborane
Beilstein/Reaxys No. N/A
SMILES B#N
InchI Identifier InChI=1S/BN/c1-2
InchI Key PZNSFCLAULLKQX-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Boron products. Boron Bohr ModelBoron (atomic symbol: B, atomic number: 5) is a Block P, Group 13, Period 2 element with an atomic weight of 10.81. The number of electrons in each of boron's shells is 2, 3 and its electron configuration is [He] 2s2 2p1. The boron atom has a radius of 90 pm and a Van der Waals radius of 192 pm. Boron was discovered by Joseph Louis Gay-Lussac and Louis Jacques Thénard in 1808 and was first isolated by Humphry Davy later that year. Boron is classified as a metalloid is not found naturally on earth. Elemental BoronAlong with carbon and nitrogen, boron is one of the few elements in the periodic table known to form stable compounds featuring triple bonds. Boron has an energy band gap of 1.50 to 1.56 eV, which is higher than that of either silicon or germanium. Boron is found in borates, borax, boric acid, colemanite, kernite, and ulexite.The name Boron originates from a combination of carbon and the Arabic word buraqu meaning borax.

See more Nitrogen products. Nitrogen is a Block P, Group 15, Period 2 element. Its electron configuration is [He]2s22p3. Nitrogen is an odorless, tasteless, colorless and mostly inert gas. It is the seventh most abundant element in the universe and it constitutes 78.09% (by volume) of Earth's atmosphere. Nitrogen was discovered by Daniel Rutherford in 1772.