SINGLE CRYSTAL, POLYCRYSTAL, TARGET, PHYSICAL AND CHEMICAL VAPOR DEPOSITION, DISK, SUBSTRATE, AND POWDER
Specializing in Single and Poly Crystal Target, Substrate and Powder and Chemical and Physical Vapor Deposition (CVD and PVD) Evaporation Material, American Elements is a manufacturer of crystalline and polycrystalline high purity and pre-melted materials for optic, electronic and other high technology applications.
32.4 (A)/00.012
American Elements' crystal growth production emphasizes ultra high
purity elemental and compound materials produced in the form of single crystal, polycrystalline pieces, boule, crackle and shaped charge and rod. We are recognized specialists in custom grown single and polycrystalline materials of any of the III-V and II-VI compounds when special orientations, purities or dopants are required. Unlike many other producers, our facilities are also set up to produce small or pilot scale lots cost effectively. All production materials are analyzed and certified prior to shipping. American Elements grows certified single phase structures for use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD) for use in applications including fuel cells and solar energy. Starting metallic compounds include ultra high purity metallic oxides and fluorides. See also Nanoparticles and Nanotechnology and deposition materials for other ionic delivery systems.
(click on an element to view our products)
A partial list of such products is set forth below. Besides these standard products, American Elements will also custom synthesis crystalline structures to meet customer proprietary requirements.
American Elements produces custom layer substrates for both commercial and research applications and can deposit layers on selected substrates. For example, we can produce many custom variations of metallic nitride layers on various aluminum oxide composition substrates. We provide metallization for these materials and our other products.
Contact us to discuss your particular requirements and specifications.
American Element's crystal synthesis facility is equipped to synthesis crystalline structures using a variety of established technologies, including:
- Crystal "pulling" by the Czochaiski method for production of semiconductor materials
- Flux growth and gradient freeze
- Directional solidification of fluorites using both the Bridgman-Stockbarger and float zoning techniques
Partial list of Crystal, Substrate, Single Crystal, Wafer, Boule, Crackle Products:
- Antimony
- Antimony Selenide
- Antimony Telluride
- Bismuth
- Bismuth Selenide
- Bismuth Telluride
- Cadmium
- Cadmium Telluride
- Gallium
- Gallium Antimonide
- Gallium Arsenide
- Gallium Indium Antimonide
- Gallium Indium Arsenide
- Gallium Phosphide
- Gallium(II) Telluride
- Gallium(III) Telluride
- Germanium
- Germanium Telluride
- Gold
- Indium
- Indium Antimonide
- Indium Arsenide
- Indium Phosphide
- Indium Phosphide Arsenide
- Indium Selenide
- Indium Sulfide
- Indium Telluride
- Silicon
- Silicon Arsenide
- Silicon Phosphide
- Tellurium
- Tin
- Tin Arsenide
- Tin Selenide
- Tin Telluride
- Zinc
- Zinc Telluride
