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Hafnium Telluride Sputtering Target

CAS #:

Linear Formula:

HfTe2

MDL Number:

MFCD00049947

EC No.:

254-280-6

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Hafnium Telluride Sputtering Target
HF-TE-02-ST-13
Pricing > SDS > Data Sheet >
(3N) 99.9% Hafnium Telluride Sputtering Target
HF-TE-03-ST-13
Pricing > SDS > Data Sheet >
(4N) 99.99% Hafnium Telluride Sputtering Target
HF-TE-04-ST-13
Pricing > SDS > Data Sheet >
(5N) 99.999% Hafnium Telluride Sputtering Target
HF-TE-05-ST-13
Pricing > SDS > Data Sheet >

Hafnium Telluride Sputtering Target Properties (Theoretical)

Compound Formula HfTe2
Molecular Weight 433.69
Appearance Gray
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Exact Mass 433.690002 Da
Monoisotopic Mass 439.759003 Da
Charge N/A

Hafnium Telluride Sputtering Target Health & Safety Information

Signal Word Warning
Hazard Statements H301-H332
Hazard Codes Xn
Risk Codes 20/22
Safety Statements 13394
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
MSDS / SDS

About Hafnium Telluride Sputtering Target

Telluride IonAmerican Elements specializes in producing high purity Hafnium Telluride Sputtering targets with the highest possible density High Purity (99.99%) Hafnium Telluride Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes. We also produce Hafnium as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Hafnium Telluride Sputtering Target Synonyms

N/A

Chemical Identifiers

Linear Formula HfTe2
MDL Number MFCD00049947
EC No. 254-280-6
Beilstein Registry No. N/A
Pubchem CID N/A
IUPAC Name N/A
SMILES [Hf+4].[TeH2-2].[TeH2-2]
InchI Identifier InChI=1S/Hf.2Te/q+4;2*-2
InchI Key XMUNOAWAWDJDBC-UHFFFAOYSA-N

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Hafnium products. Hafnium (atomic symbol: Hf, atomic number: 72) is a Block D, Group 4, Period 6 element with an atomic weight of 178.49. Hafnium Bohr ModelThe number of electrons in each of Hafnium's shells is 2, 8, 18, 32, 10, 2 and its electron configuration is [Xe] 4f14 5d2 6s2. The hafnium atom has a radius of 159 pm and a Van der Waals radius of 212 pm. Hafnium was predicted by Dmitri Mendeleev in 1869 but it was not until 1922 that it was first isolated Dirk Coster and George de Hevesy. In its elemental form, hafnium has a lustrous silvery-gray appearance. Elemental HafniumHafnium does not exist as a free element in nature. It is found in zirconium compounds such as zircon. Hafnium is often a component of superalloys and circuits used in semiconductor device fabrication. Its name is derived from the Latin word Hafnia, meaning Copenhagen, where it was discovered.

See more Tellurium products. Tellurium (atomic symbol: Te, atomic number: 52) is a Block P, Group 16, Period 5 element with an atomic radius of 127.60. Tellurium Bohr ModelThe number of electrons in each of tellurium's shells is 2, 8, 18, 18, 6 and its electron configuration is [Kr] 4d10 5s2 5p4. Tellurium was discovered by Franz Muller von Reichenstein in 1782 and first isolated by Martin Heinrich Klaproth in 1798. In its elemental form, tellurium has a silvery lustrous gray appearance. The tellurium atom has a radius of 140 pm and a Van der Waals radius of 206 pm. Elemental TelluriumTellurium is most commonly sourced from the anode sludges produced as a byproduct of copper refining. The name Tellurium originates from the Greek word Tellus, meaning Earth.

Recent Research

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June 26, 2019
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