American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopeia/British Pharmacopeia) and follows applicable ASTM testing standards.See safety data and research below and pricing/lead time above. American Elements specializes in producing high purity Arsenic Telluride Sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Arsenic as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
Arsenic is a Block P, Group 15, Period 4 element. The number of electrons in each of Arsenic's shells is 2, 8, 18, 5 and its electronic configuration is [Ar] 3d10 4s2 4p3. In its elemental form arsenic's CAS number is 1327-53-3. The arsenic atom has a radius of 124.5.pm and it's Van der Waals radius is 185.pm. Arsenic in the organic form is not harmful but in the inorganic form it is extremely toxic even in very small amounts. Arsenic has numerous applications as a semiconductor and other electronic applications as Indium arsenide, silicon arsenide and tin arsenidea. Arsenic is finding increasing uses as a doping agent in solid-state devices such as transistors. Gallium arsenide is used as a laser material to convert electricity directly into coherent light. Arsenic is used in bronzing and for hardening and improving the sphericity of shot. Due to its toxicity, arsenic compounds are used in insecticides and wood preservation.Arsenic is available as metal and compounds with purities from 99% to 99.9999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. Arsenic information, including Technical Data, Safety Data and its High Purity properties, research, applications and other useful facts are discussed here. Scientific facts such as the atomic structure, ionization energy, abundance on Earth, conductivity and thermal properties are included.
Tellurium is a Block P, Group 16, Period 5 element. The number of electrons in each of Tellurium's shells is 2, 8, 18, 18, 6 and its electronic configuration is [Kr] 4d10 5s2 5p4. In its elemental form tellurium's CAS number is 13494-80-9. Tellurium is very toxic and can cause birth defects. The tellurium atom has a radius of 143.2.pm and it's Van der Waals radius is 206.pm. Tellurium is a p-type semiconductor, and shows greater conductivity in certain directions, depending on alignment of the atoms. It is grown in crystalline form with other elements such as indium telluride. Its conductivity increases slightly with exposure to light which makes many tellurides candidates for solar energyapplications. Tellurium improves the machinability of copper and stainless steel, and its addition to lead decreases the corrosive action of sulfuric acid on lead and improves its strength and hardness. Tellurium is used as a basic ingredient in blasting caps, and is added to cast iron for chill control. Tellurium is used in ceramics. Bismuth telluride has been used in thermoelectric devices. Iron is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. Tellurium was first discovered by Franz Muller von Reichenstein in 1782. The name Tellurium originates from the Greek word 'Tellus' meaning Earth. See Tellurium research below.
Arsenic Exposure Perturbs Epithelial-Mesenchymal Cell Transition (EMT) and Gene Expression In a Collagen Gel Assay. Lencinas A, Broka DM, Konieczka JH, Klewer SE, Antin PB, Camenisch TD, Runyan RB. Toxicol Sci. 2010 Mar 22. [Epub ahead of print] PMID: 20308225 [PubMed - as supplied by publisher]
Adsorption of arsenic ions on Brazilian sepiolite: Effect of contact time, pH, concentration, and calorimetric investigation. Guerra DL, Batista AC, Corrêa da Costa PC, Viana RR, Airoldi C. J Colloid Interface Sci. 2010 Feb 21. [Epub ahead of print] PMID: 20307889 [PubMed - as supplied by publisher]
Toxicity of chromated copper arsenate: A study in mice. Matos RC, Vieira C, Morais S, Pereira ML, Pedrosa J. Environ Res. 2010 Mar 20. [Epub ahead of print] PMID: 20307876 [PubMed - as supplied by publisher]
.Acute promyelocytic leukemia: a paradigm for differentiation therapy. Grimwade D, Mistry AR, Solomon E, Guidez F. Cancer Treat Res. 2009;145:219-35. PMID: 20306254 [PubMed - in process]
Genotoxicity surveillance programme in workers dismantling World War I chemical ammunition. Mateuca RA, Carton C, Roelants M, Roesems S, Lison D, Kirsch-Volders M. Int Arch Occup Environ Health. 2010 Mar 20. [Epub ahead of print] PMID: 20306073 [PubMed - as supplied by publisher]
Arsenic-resistant bacteria associated with roots of the wild Cirsium arvense (L.) plant from an arsenic polluted soil, and screening of potential plant growth-promoting characteristics. Cavalca L, Zanchi R, Corsini A, Colombo M, Romagnoli C, Canzi E, Andreoni V. Syst Appl Microbiol. 2010 Mar 18. [Epub ahead of print] PMID: 20303688 [PubMed - as supplied by publisher]
Analysis of heavy metal contents in gray and white MTA and 2 kinds of Portland cement: a preliminary study. Chang SW, Shon WJ, Lee W, Kum KY, Baek SH, Bae KS. Oral Surg Oral Med Oral Pathol Oral Radiol Endod. 2010 Apr;109(4):642-646. PMID: 20303061 [PubMed - as supplied by publisher]
Differential role of cathepsins B and L in autophagy-associated cell death induced by arsenic trioxide in U87 human glioblastoma cells. Pucer A, Castino R, Mirkovic B, Falnoga I, Slejkovec Z, Isidoro C, Lah TT. Biol Chem. 2010 Mar 20. [Epub ahead of print] PMID: 20302512 [PubMed - as supplied by publisher]
Heavy metal concentrations in groundwaters and soils of Thane Region of Maharashtra, India. Bhagure GR, Mirgane SR. Environ Monit Assess. 2010 Mar 19. [Epub ahead of print] PMID: 20300835 [PubMed - as supplied by publisher]
Arsenic inhibits myogenic differentiation and muscle regeneration. Yen YP, Tsai KS, Chen YW, Huang CF, Yang RS, Liu SH. Environ Health Perspect. 2010 Mar 18. [Epub ahead of print] PMID: 20299303 [PubMed - as supplied by publisher]
Successful imatinib and arsenic trioxide combination therapy for sudden onset promyelocytic crisis with t(15;17) in chronic myeloid leukemia. Kashimura M, Ohyashiki K. Leuk Res. 2010 Mar 16. [Epub ahead of print] No abstract available. PMID: 20299093 [PubMed - as supplied by publisher]
Dyspnea reproducibility in a rural Bangladesh population. Pesola GR, Parvez F, Jasmin S, Hasan AK, Ahsan H. Clin Respir J. 2009 Oct 1;3(4):222-8. PMID: 20298408 [PubMed - in process]
Arsenic and trace metals in river water and sediments from the southeast portion of the Iron Quadrangle, Brazil. Varejão EV, Bellato CR, Fontes MP, Mello JW. Environ Monit Assess. 2010 Mar 18. [Epub ahead of print] PMID: 20238242 [PubMed - as supplied by publisher]
Bioavailability of arsenic in soil: Pilot study results and design considerations. Stanek EJ 3rd, Calabrese EJ, Barnes RM, Danku JM, Zhou Y, Kostecki PT, Zillioux E. Hum Exp Toxicol. 2010 Mar 17. [Epub ahead of print] PMID: 20237175 [PubMed - as supplied by publisher]
Contrasting Influence of Geology on E. coli and Arsenic in Aquifers of Bangladesh. Leber J, Rahman MM, Ahmed KM, Mailloux B, Geen AV. Ground Water. 2010 Mar 4. [Epub ahead of print] PMID: 20236332 [PubMed - as supplied by publisher]
Mutational and gene expression analysis of mtrDEF, omcA and mtrCAB during arsenate and iron reduction in Shewanella sp. ANA-3. Reyes C, Murphy JN, Saltikov CW. Environ Microbiol. 2010 Mar 7. [Epub ahead of print] PMID: 20236164 [PubMed - as supplied by publisher]
Arsenic Accumulation in a Paddy Field in Bangladesh: Seasonal Dynamics and Trends over a Three-Year Monitoring Period. Dittmar J, Voegelin A, Roberts LC, Hug SJ, Saha GC, Ali MA, Badruzzaman AB, Kretzschmar R. Environ Sci Technol. 2010 Mar 17. [Epub ahead of print] PMID: 20235529 [PubMed - as supplied by publisher]
A redox-linked novel pathway for arsenic-mediated RET tyrosine kinase activation. Kato M, Takeda K, Hossain K, Thang ND, Kaneko Y, Kumasaka M, Yamanoshita O, Uemura N, Takahashi M, Ohgami N, Kawamoto Y. J Cell Biochem. 2010 Mar 16. [Epub ahead of print] PMID: 20235151 [PubMed - as supplied by publisher]
Curcumin and turmeric attenuate arsenic-induced angiogenesis in ovo. Pantazis P, Varman A, Simpson-Durand C, Thorpe J, Ramalingam S, Subramaniam D, Houchen C, Ihnat M, Anant S, Ramanujam RP. Altern Ther Health Med. 2010 Mar-Apr;16(2):12-4. PMID: 20232614 [PubMed - in process]
Leachability and leaching patterns from aluminium-based water treatment residual used as media in laboratory-scale engineered wetlands. Babatunde AO, Zhao YQ. Environ Sci Pollut Res Int. 2010 Mar 16. [Epub ahead of print] PMID: 20232166 [PubMed - as supplied by publisher]
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and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Arsenic as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
Arsenic is a Block P, Group 15, Period 4 element. The number of electrons in each of Arsenic's shells is 2, 8, 18, 5 and its electronic configuration is [Ar] 3d10 4s2 4p3. In its elemental form arsenic's CAS number is 1327-53-3. The arsenic atom has a radius of 124.5.pm and it's Van der Waals radius is 185.pm. Arsenic in the organic form is not harmful but in the inorganic form it is extremely toxic even in very small amounts. Arsenic has numerous applications as a semiconductor and other electronic applications as Indium arsenide, silicon arsenide and tin arsenidea. Arsenic is finding increasing uses as a doping agent in solid-state devices such as transistors. Gallium arsenide is used as a laser material to convert electricity directly into coherent light. Arsenic is used in bronzing and for hardening and improving the sphericity of shot. Due to its toxicity, arsenic compounds are used in insecticides and wood preservation.Arsenic is available as metal and compounds with purities from 99% to 99.9999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. Arsenic information, including Technical Data, Safety Data and its High Purity properties, research, applications and other useful facts are discussed here. Scientific facts such as the atomic structure, ionization energy, abundance on Earth, conductivity and thermal properties are included. 
Tellurium is a Block P, Group 16, Period 5 element. The number of electrons in each of Tellurium's shells is 2, 8, 18, 18, 6 and its electronic configuration is [Kr] 4d10 5s2 5p4. In its elemental form tellurium's CAS number is 13494-80-9. Tellurium is very toxic and can cause birth defects. The tellurium atom has a radius of 143.2.pm and it's Van der Waals radius is 206.pm. Tellurium is a p-type semiconductor, and shows greater conductivity in certain directions, depending on alignment of the atoms. It is grown in crystalline form with other elements such as indium telluride. Its conductivity increases slightly with exposure to light which makes many tellurides candidates for solar energyapplications. Tellurium improves the machinability of copper and stainless steel, and its addition to lead decreases the corrosive action of sulfuric acid on lead and improves its strength and hardness. Tellurium is used as 
a basic ingredient in blasting caps, and is added to cast iron for chill control. Tellurium is used in ceramics. Bismuth telluride has been used in thermoelectric devices. Iron is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder. Tellurium was first discovered by Franz Muller von Reichenstein in 1782. The name Tellurium originates from the Greek word 'Tellus' meaning Earth. See Tellurium research below. 
