American Elements: Tin Oxide Sputtering Target Supplier & Tech Info

American Elements specializes in producing high purity Tin oxide sputtering targets with the highest possible density High Purity (99.99%) Metallic Sputtering Target

High Purity (99.99%) Metallic Sputtering Target

and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Tin Oxide as pellets, pieces, tablets and powder. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. See research below. Other shapes are available by request.

Tin is a Block P, Group 14, Period 5 element. The electronic configuration is [Kr] 4d¹⁰ 5s² 5p². In its elemental form tin's CAS number is 7440-31-5. The tin atom has a radius of 140.5.pm and it's Van der Waals radius is 217.pm. Tin compounds sprayed onto glass are used to produce electrically conductive coatings. These have been used for panel lighting and for frost-free windshields. Most window glass is now made by floating molten glass on molten tin (float glass) to produce a flat surface. Crystalline tin-niobium alloy is superconductive at very low temperatures. This promises to be important in the construction of superconductive magnets that generate enormous field strengths but use practically no power. Tin is the basis for many eutectic alloys and the discovery by early man that copper could be better formed and crafted if tin were added producing the first bronze and launching what we refer to as the "Bronze Age" and the first Neolithic metal tools, cooking utensils, and jewelry produced from rudimentary bronze.