Bismuth Ferrite Sputtering Target

CAS #:

Linear Formula:

BiFeO3

ORDER

PRODUCT Product Code ORDER SAFETY DATA TECHNICAL DATA
(2N) 99% Bismuth Ferrite Sputtering Target
BI-FEIT-02-ST
Pricing > SDS > Data Sheet >
(3N) 99.9% Bismuth Ferrite Sputtering Target
BI-FEIT-03-ST
Pricing > SDS > Data Sheet >
(4N) 99.99% Bismuth Ferrite Sputtering Target
BI-FEIT-04-ST
Pricing > SDS > Data Sheet >
(5N) 99.999% Bismuth Ferrite
BI-FEIT-05-P
Pricing > SDS > Data Sheet >

Bismuth Ferrite Sputtering Target Properties (Theoretical)

Compound Formula BiFeO3
Molecular Weight 312.82
Appearance Target
Melting Point N/A
Boiling Point N/A
Density N/A
Solubility in H2O N/A
Crystal Phase / Structure perovskite

Bismuth Ferrite Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
RTECS Number N/A
Transport Information N/A
MSDS / SDS

About Bismuth Ferrite Sputtering Target

High Purity (99.99%) Bismuth Ferrite Sputtering TargetAmerican Elements specializes in producing high purity Bismuth Ferrite Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Please contact us for information on lead time and pricing above.

Bismuth Ferrite Sputtering Target Synonyms

BFO target, Bismuth Iron Oxide Sputtering Target

Chemical Identifiers

Linear Formula BiFeO3
MDL Number N/A
EC No. N/A

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Payment Methods

American Elements accepts checks, wire transfers, ACH, most major credit and debit cards (Visa, MasterCard, AMEX, Discover) and Paypal.

For the convenience of our international customers, American Elements offers the following additional payment methods:

SOFORT bank tranfer payment for Austria, Belgium, Germany and SwitzerlandJCB cards for Japan and WorldwideBoleto Bancario for BraziliDeal payments for the Netherlands, Germany, Austria, Belgium, Italy, Poland, Spain, Switzerland, and the United KingdomGiroPay for GermanyDankort cards for DenmarkElo cards for BrazileNETS for SingaporeCartaSi for ItalyCarte-Bleue cards for FranceChina UnionPayHipercard cards for BrazilTROY cards for TurkeyBC cards for South KoreaRuPay for India

Related Elements

Bismuth

See more Bismuth products. Bismuth (atomic symbol: Bi, atomic number: 83) is a Block P, Group 15, Period 6 element with an atomic radius of 208.98040. The number of electrons in each of Bismuth's shells is 2, 8, 18, 32, 18, 5 and its electron configuration is [Xe] 4f14 5d10 6s2 6p3. Bismuth Bohr ModelThe bismuth atom has a radius of 156 pm and a Van der Waals radius of 207 pm. In its elemental form, bismuth is a silvery white brittle metal. Bismuth is the most diamagnetic of all metals and, with the exception of mercury, its thermal conductivity is lower than any other metal. Elemental BismuthBismuth has a high electrical resistance, and has the highest Hall Effect of any metal (i.e., greatest increase in electrical resistance when placed in a magnetic field). Bismuth is found in bismuthinite and bismite. It is also produced as a byproduct of lead, copper, tin, molybdenum and tungsten extraction. Bismuth was first discovered by Early Man. The name Bismuth originates from the German word 'wissmuth,' meaning white mass.

Iron

See more Iron products. Iron (atomic symbol: Fe, atomic number: 26) is a Block D, Group 8, Period 4 element with an atomic weight of 55.845. The number of electrons in each of Iron's shells is 2, 8, 14, 2 and its electron configuration is [Ar] 3d6 4s2. Iron Bohr ModelThe iron atom has a radius of 126 pm and a Van der Waals radius of 194 pm. Iron was discovered by humans before 5000 BC. In its elemental form, iron has a lustrous grayish metallic appearance. Iron is the fourth most common element in the Earth's crust and the most common element by mass forming the earth as a whole. Iron is rarely found as a free element, since it tends to oxidize easily; it is usually found in minerals such as magnetite, hematite, goethite, limonite, or siderite.Elemental Iron Though pure iron is typically soft, the addition of carbon creates the alloy known as steel, which is significantly stronger.

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