American Elements Logo and U.S. Registered Trademark
 

 
Products
Barium Hafnium Oxide
Bis(cyclopentadienyl)hafnium(IV) Dichloride
Bis(ethylcyclopentadienyl)hafnium(IV) Dichloride
Bis(indenyl)halfnium(IV) Dichloride
Bis(isopropylcyclopentadienyl)hafnium(IV) Dichloride
Bis(methyl-?5-cyclopentadienyl)methoxymethylhafnium
Bis(methyl-n5-cyclopentadienyl)dimethylhafnium
Bis(tert-butoxy)bis(1-methoxy-2-methyl-2-propoxy)hafnium
Bis(tert-butylcyclopentadienyl)dimethylhafnium(IV)
Bis(tert-butylcyclopentadienyl)hafnium(IV) Dichloride
Bis(trimethylsilyl)amidohafnium(IV) Chloride
Cobalt Hafnium Niobium
Cyclopentadienylhafnium(IV) Trichloride
Dimethylbis(cyclopentadienyl)hafnium(IV)
Hafnium 2-Ethylhexanoate
Hafnium Acetate Solution
Hafnium Acetylacetonate
Hafnium Balls
Hafnium Bands
Hafnium Bars
Hafnium Bits
Hafnium Board
Hafnium Boats
Hafnium Briquette
Hafnium Bromide
Hafnium Capsules
Hafnium Carbide
Hafnium Carbide Foam
Hafnium Carbide Disc
Hafnium Carbide Granules
Hafnium Carbide Honeycomb
Hafnium Carbide Ingot
Hafnium Carbide Pellets
Hafnium Carbide Pieces
Hafnium Carbide Powder
Hafnium Carbide Rod
Hafnium Carbide Sponge
Hafnium Carbide Sputtering Target
Hafnium Carbide Wool
Hafnium Chloride
Hafnium Chloride Solution
Hafnium Circle
Hafnium Coil
Hafnium Coin
Hafnium Concentrate
Hafnium Crucibles
Hafnium Cylinder
Hafnium Diboride
Hafnium Disc
Hafnium Dust
Hafnium Ethoxide
Hafnium Flake
Hafnium Flanges
Hafnium Fluoride
Hafnium Foil
Hafnium Fragments
Hafnium Grain
Hafnium Granules
Hafnium Hydride
Hafnium Ingot
Hafnium(III) Iodide
Hafnium(IV) Iodide
Hafnium(IV) Iodide, Ultra Dry
Hafnium Iron Sputtering Target
Hafnium Isopropoxide Isopropanol Adduct
Hafnium Lump
Hafnium Mesh
Hafnium Metal
Hafnium Microfoil
Hafnium Microleaf
Hafnium Nanoprisms
Hafnium Nanorods
Hafnium Nitrate
Hafnium Nitrate Solution
Hafnium Nitride
Hafnium Nugget
Hafnium Oxide
Hafnium Oxide Nanopowder
Hafnium Oxide Particles
Hafnium Oxide Pellets
Hafnium Oxide Pieces
Hafnium Oxide Powder
Hafnium Oxide Rotatable Sputtering Target
Hafnium Oxide Shot
Hafnium Oxide Sputtering Target
Hafnium Oxide Tablets
Hafnium Oxychloride
Hafnium Oxynitrate Dihydrate
Hafnium Particles
Hafnium Parts
Hafnium Pebbles
Hafnium Pellets
Hafnium Phosphide
Hafnium Phosphide Sputtering Target
Hafnium Pieces
Hafnium Pills
Hafnium Plates
Hafnium Powder
Hafnium Precipitate
Hafnium Prism
Hafnium Puck
Hafnium Residue
Hafnium Ribbon
Hafnium Rings
Hafnium Rocks
Hafnium Rod
Hafnium Rotatable Sputtering Target
Hafnium Samples
Hafnium Scraps
Hafnium Segments
Hafnium Selenide
Hafnium Selenide Sputtering Target
Hafnium Shaving
Hafnium Sheets
Hafnium Shot
Hafnium Sleeves
Hafnium Slugs
Hafnium Specimens
Hafnium Spheres
Hafnium Spring
Hafnium Sputtering Target
Hafnium Strip
Hafnium Sulfate
Hafnium Sulfate Solution
Hafnium Sulfide
Hafnium Tape
Hafnium Telluride
Hafnium Telluride Sputtering Target
Hafnium Tetrachloride
Hafnium Titanate
Hafnium Trifluoromethanesulfonate
Hafnium Tube
Hafnium Turnings
Hafnium Wafer
Hafnium Wire
Hafnium Yttrium Sputtering Target
Hafnium(IV) Chloride Tetrahydrofuran Complex
Hafnium(IV) n-butoxide
Hafnium(IV) Oxychloride Hydrate
Hafnium(IV) tert-butoxide
Hafnium-180 Oxide Isotope
Indenylhafnium(IV) Trichloride
Iron Hafnium Sputtering Target
Pentamethylcyclopentadienylhafnium(IV) Trichloride
Tantalum Hafnium Carbide
Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV)
Tetrakis(diethylamido)hafnium(IV)
Tetrakis(dimethylamido)hafnium(IV)
Tetrakis(dimethylamino)hafnium
Tetrakis(ethylmethylamido)hafnium(IV)
Tetrakis(ethylmethylamino)hafnium
Tetrakis(tert-butoxy)hafnium
Hafnium information, including Technical Data, Safety Data and its high purity properties, research, applications and other useful facts are discussed below. Scientific facts such as the atomic structure, ionization energy, abundance on Earth, conductivity and thermal properties are included.

Hafnium Bohr ModelHafnium is one of the Group IV transition elements that is refined from various zirconic mineral deposits. Hafnium is available as metal and compounds with purities from 99% to 99.999% (ACS grade to ultra-high purity); metals in the form of foil, sputtering target, and rod, and compounds as submicron and nanopowder.

It's primary uses are due to its ability as a nuclear "getter" or absorber of neutrons. It is a primary component in nuclear control rods for this purpose. It also finds uses as a dopant in the alloy of steel and titanium. It is also used in the production of mantles for high intensity incandescent lamps.

Hafnium is replacing polysilicon as the principle gate or electrode material in metal oxide semiconductor field effect transistors (MOSFETs) which are the basis for all modern semiconductors. As semiconductors have gotten smaller, the limiting factor in further size reduction has been the ability of the silicon oxide gate to perform below 10 angstroms where leakage occurs. Recent research has been devoted to the development of High-k materials which can function as a di-electric barrier or gate with lower leakage. Using hafnium based alloys as this di-electric gate has allowed for the development of MOSFET gates smaller than 10 angstroms. This allows for further size reduction, reduced switching power requirements and improved performance.

  Hydrogen                                 Helium
  Lithium Beryllium                     Boron Carbon Nitrogen Oxygen Fluorine Neon
  Sodium Magnesium                     Aluminum Silicon Phosphorus Sulfur Chlorine Argon
  Potassium Calcium Scandium Titanium Vanadium Chromium Manganese Iron Cobalt Hydrogen Copper Zinc Gallium Germanium Arsenic Selenium Bromine Krypton
  Rubidium Strontium Yttrium Zirconium Niobium Molybdenum Technetium Ruthenium Rhodium Palladium Silver Cadmium Indium Tin Antimony Tellurium Iodine Xenon
  Cesium Barium Cerium Hafnium Tantalum Tungsten Rhenium Osmium Iridium Platinum Gold Mercury Thallium Lead Bismuth Polonium Astatine Radon
  Francium Radium Actinium Rutherfordium Dubnium Seaborgium Bohrium Hassium Meitnerium Darmstadtium Roentgenium Copernicium Ununtrium Ununquadium Ununpentium Ununhexium Ununseptium Ununoctium
                                     
      Cerium Praseodymium Neodymium Promethium Samarium Europium Gadolinium Terbium Dysprosium Holmium Erbium Thulium Ytterbium Lutetium    
      Thorium Protactinium Uranium Neptunium Plutonium Americium Curium Berkelium Californium Einsteinium Fermium Mendelevium Nobelium Lawerencium    


(click on an element)

Hafnium facts, including appearance, CAS #, and molecular formula and safety data, research and properties are available for many specific states, forms and shapes on the product pages listed to the left. Elemental or metallic forms include pellets, rod, wire and granules for evaporation source material purposes. Nanoparticles and nanopowders provide ultra high surface area which nanotechnology research and recent experiments demonstrate function to create new and unique properties and benefits.

High Purity (99.999%) Hafnium Oxide (HfO2) PowderOxides are available in forms including powders and dense pellets for such uses as optical coating and thin film applications. Oxides tend to be insoluble. Fluorides are another insoluble form for uses in which oxygen is undesirable such as metallurgy, chemical and physical vapor deposition and in some optical coatings. Hafnium is available in soluble forms including chlorides, nitrates and acetates. These compounds are also manufactured as solutions at specified stoichiometries.

Hafnium is a Block D, Group 4, Period 6 element. The number of electrons in each of Hafnium's shells is 2, 8, 18, 32, 10, 2 and its electronic configuration is [Xe] 4f14 5d2 6s2. In its elemental form hafnium's CAS number is 7440-58-6.The hafnium atom has a radius of 156.4.pm and it's Van der Waals radius is 200.pm. Hafnium is not toxic.

All elemental metals, compounds and solutions may be synthesized in ultra high purity (e.g. 99.999%) for laboratory standards, advanced electronic, thin fillm deposition using sputtering targetsHigh Purity (99.999%)Hafnium (Hf) Sputtering Target and evaporation materials, metallurgy and optical materials and other high technology applications. Information is provided for stable (non-radioactive) isotopes. Organo-Metallic Hafnium compounds are soluble in organic or non-aqueous solvents. See Analytical Services for information on available certified chemical and physical analysis techniques including MS-ICP, X-Ray Diffraction, PSD and Surface Area (BET) analysis.

Hafnium was first discovered by Dirk Coster in 1923.
French hafnium German Hafnium Italian afnio Portuguese Háfnio Spanish hafnio Swedish Hafnium


Abundance. The following table shows the abundance of hafnium and each of its naturally occurring isotopes on Earth along with the atomic mass for each isotope.
Isotope Atomic Mass % Abundance on Earth
Hf-174 173.940040 0.162
Hf-176 175.941402 5.206
Hf-177 176.943220 18.606
Hf-178 177.943698 27.297
Hf-179 178.945815 13.629
Hf-180 179.946549 35.100


The following table shows the abundance of Hafnium present in the human body and in the universe scaled to parts per billion (ppb) by weight and by atom:
  Typical Human Body Universe
by Weight no data 0.7 ppb
by Atom no data 0.005 ppb


Safety Data and Biological Role. The safety data for hafnium metal, nanoparticles and its compounds can vary widely depending on the form. For potential hazard information, toxicity, and road, sea and air transportation limitations, such as DOT Hazard Class, DOT Number, EU Number, NFPA Health rating and RTECS Class, please see the specific material or compound referenced in the left margin. Hafnium compounds have no biological role.

Ionization Energy. The ionization energy for hafnium (the least required energy to release a single electron from the atom in it's ground state in the gas phase) is stated in the following table:
1st Ionization Energy 658.52 kJ mol-1
2nd Ionization Energy 1437.64 kJ mol-1
3rd Ionization Energy 2248.12 kJ mol-1


Conductivity. As to hafnium's electrical and thermal conductivity, the electrical conductivity measured as to electrical resistivity @ 20 ºC is 33.08 μΩcm and its electronegativities (or its ability to draw electrons relative to other elements) is 1.3. The thermal conductivity of hafnium is 23 W m-1 K-1.

Thermal Properties. The melting point and boiling point for hafnium are stated below. The following chart sets forth the heat of fusion, heat of vaporization and heat of atomization.
Heat of Fusion 25.5 kJ mol-1
Heat of Vaporization 570.7 kJ mol-1
Heat of Atomization 618.9 kJ mol-1


Recent Research & Development for Hafnium
  • Characterization of the SnO2 based thin film transistors with Ga, In and Hf doping. Shin SY, Moon YK, Kim WS, Lee SH, Park JW. J Nanosci Nanotechnol. 2012 Jul;12(7):5459-63. PMID: 22966590 [PubMed - in process]

  • Zirconium((IV)) and Hafnium((IV)) Porphyrin and Phthalocyanine Complexes as New Dyes for Solar Cell Devices. Radivojevic I, Bazzan G, Burton-Pye BP, Ithisuphalap K, Saleh R, Durstock MF, Francesconi LC, Drain CM. J Phys Chem C Nanomater Interfaces. 2012 Aug 2;116(30):15867-15877. Epub 2012 Jun 26. PMID: 22962625 [PubMed]

  • Ring opening polymerization of rac-lactide by group 4 tetracarbamato complexes: activation, propagation and role of the metal. Marchetti F, Pampaloni G, Pinzino C, Renili F, Repo T, Vuorinen S. Dalton Trans. 2012 Sep 7. [Epub ahead of print] PMID: 22960935 [PubMed - as supplied by publisher]

  • Density of States-Based Design of Metal Oxide Thin-Film Transistors for High Mobility and Superior Photostability. Kim HS, Park JS, Jeong HK, Son KS, Kim TS, Seon JB, Lee E, Chung JG, Kim DH, Ryu M, Lee SY. ACS Appl Mater Interfaces. 2012 Sep 19. [Epub ahead of print] PMID: 22957907 [PubMed - as supplied by publisher]

  • Immobilization Mechanisms of Deoxyribonucleic Acid (DNA) to Hafnium Dioxide (HfO(2)) Surfaces for Biosensing Applications. Fahrenkopf NM, Rice PZ, Bergkvist M, Deskins NA, Cady NC. ACS Appl Mater Interfaces. 2012 Sep 21. [Epub ahead of print] PMID: 22947770 [PubMed - as supplied by publisher]

  • O-vacancies in (i) nano-crystalline HfO2 and (i) non-crystalline SiO2 and Si3N4 studied by X-ray absorption spectroscopy. Lucovsky G, Miotti L, Bastos KP. J Nanosci Nanotechnol. 2012 Jun;12(6):4811-9. PMID: 22905534 [PubMed - indexed for MEDLINE]

  • Nano-hardness, wear resistance and pseudoelasticity of hafnium implanted NiTi shape memory alloy. Zhao T, Li Y, Liu Y, Zhao X. J Mech Behav Biomed Mater. 2012 Apr 25;13C:174-184. [Epub ahead of print] PMID: 22902997 [PubMed - as supplied by publisher]

  • Zirconia implant abutments: microstructural analysis. Vaquero-Aguilar C, Jimenez-Melendo M, Torres-Lagares D, Llena-Blasco O, Bruguera A, Llena-Blasco J, Garcia-Calderon M, Velazquez-Cayon R, Gutierrez-Perez JL. Int J Oral Maxillofac Implants. 2012 Jul;27(4):785-91. PMID: 22848879 [PubMed - in process]

  • Insight into the electronic structure, optical properties, and redox behavior of the hybrid phthalocyaninoclathrochelates from experimental and density functional theory approaches. Sabin JR, Varzatskii OA, Voloshin YZ, Starikova ZA, Novikov VV, Nemykin VN. Inorg Chem. 2012 Aug 6;51(15):8362-72. Epub 2012 Jul 16. PMID: 22800298 [PubMed - in process]

  • Multifunctional phosphonic acid self-assembled monolayers on metal oxides as dielectrics, interface modification layers and semiconductors for low-voltage high-performance organic field-effect transistors. Ma H, Acton O, Hutchins DO, Cernetic N, Jen AK. Phys Chem Chem Phys. 2012 Jul 6. [Epub ahead of print] PMID: 22767209 [PubMed - as supplied by publisher]

  • Silicon nanowires with high-k hafnium oxide dielectrics for sensitive detection of small nucleic acid oligomers. Dorvel BR, Reddy B Jr, Go J, Duarte Guevara C, Salm E, Alam MA, Bashir R. ACS Nano. 2012 Jul 24;6(7):6150-64. Epub 2012 Jun 22. PMID: 22695179 [PubMed - in process]

  • Synthesis and structure of amido- and imido(pentafluorophenyl)borane zirconocene and hafnocene complexes: N-H and B-H activation. Jacobs EA, Fuller A, Coles SJ, Jones GA, Tizzard GJ, Wright JA, Lancaster SJ. Chemistry. 2012 Jul 9;18(28):8647-58. doi: 10.1002/chem.201200704. Epub 2012 Jun 12. PMID: 22692881 [PubMed - in process]

  • Hafnium isotope evidence for a transition in the dynamics of continental growth 3.2 Gyr ago. Næraa T, Scherstén A, Rosing MT, Kemp AI, Hoffmann JE, Kokfelt TF, Whitehouse MJ. Nature. 2012 May 30;485(7400):627-30. doi: 10.1038/nature11140. PMID: 22660324 [PubMed]

  • Synthesis, characterization, and lactide polymerization activity of group 4 metal complexes containing two bis(phenolate) ligands. Sauer A, Buffet JC, Spaniol TP, Nagae H, Mashima K, Okuda J. Inorg Chem. 2012 May 21;51(10):5764-70. Epub 2012 May 9. PMID: 22571415 [PubMed - indexed for MEDLINE]

  • Characterization of multi-principal-element (TiZrNbHfTa)N and (TiZrNbHfTa)C coatings for biomedical applications. Braic V, Balaceanu M, Braic M, Vladescu A, Panseri S, Russo A. J Mech Behav Biomed Mater. 2012 Jun;10:197-205. Epub 2012 Mar 3. PMID: 22520431 [PubMed - indexed for MEDLINE]

  • Photoelectron spectroscopy of the molecular anions, ZrO-, HfO-, HfHO-, and HfO2H-. Li X, Zheng W, Buonaugurio A, Buytendyk A, Bowen K, Balasubramanian K. J Chem Phys. 2012 Apr 21;136(15):154306. PMID: 22519325 [PubMed]

  • Low-voltage bendable pentacene thin-film transistor with stainless steel substrate and polystyrene-coated hafnium silicate dielectric. Yun DJ, Lee S, Yong K, Rhee SW. ACS Appl Mater Interfaces. 2012 Apr;4(4):2025-32. Epub 2012 Apr 10. PMID: 22462593 [PubMed - in process]

  • Quantum cascade laser-based measurement of metal alkylamide density during atomic layer deposition. Maslar JE, Kimes WA, Sperling BA. Appl Spectrosc. 2012 Mar;66(3):324-33. PMID: 22449311 [PubMed]

  • A change in the geodynamics of continental growth 3 billion years ago. Dhuime B, Hawkesworth CJ, Cawood PA, Storey CD. Science. 2012 Mar 16;335(6074):1334-6. PMID: 22422979 [PubMed]

  • Hf(IV)-catalyzed enantioselective epoxidation of N-alkenyl sulfonamides and N-tosyl imines. Olivares-Romero JL, Li Z, Yamamoto H. J Am Chem Soc. 2012 Mar 28;134(12):5440-3. Epub 2012 Mar 20. PMID: 22420598 [PubMed - indexed for MEDLINE]
  •  
    Formula Atomic Number Molecular Weight Electronegativity (Pauling) Density Melting Point Boiling Point Vanderwaals radius Ionic radius Energy of first ionization
    Hf 72 178.49 g.mol -1 1.3 13.07 g.cm-3 at 20 °C 2200 °C 5200 °C 200.pm 0.075 nm (+4) 658.52 kJ.mol-1

    PRODUCT CATALOG U.S. Operations News Submicron & Nanopowder Tolling Ultra High Purity Sputtering Target Crystal Growth Rod, Plate, Powder, etc. Foil Home



    German   Korean   French   Japanese   Spanish   Chinese (Simplified)   Portuguese   Russian   Chinese (Taiwan)   Italian   Turkish   Polish   Dutch   Czech   Swedish   Hungarian   Danish   Hebrew

    Production Catalog Available in 36 Countries & Languages

      Print this Page Twitter
    Periodic table of the elements science and academic information, elements and advanced materials data, scientific presentations and all pages, designs, concepts, logos, and color schemes herein are the copyrighted proprietary rights and intellectual property of American Elements. American Elements is a U.S. Registered Trademark. © 1998-2013 American Elements. All rights reserved.
    Learn Six Sigma


    American Elements® is a copyrighted U.S. Trademark. All rights reserved.