American Elements Logo and U.S. Registered Trademark

 

SPUTTERING TARGET, THIN FILM, FOIL, DEPOSITION MATERIAL, EVAPORATION MATERIAL, ROD, WIRE, BAR, SHEET, INGOT, PLATE

American Elements specializes in high purity metal shapes and Evaporation and Pre-Melted Material (Oxide and Fluoride) with the highest density and smallest grain sizes for use in chemical vapor deposition (CVD) and physical vapor deposition (PVD) for thin film, optic and electronic applications.

32.4 (A)/00.0013

   

American Elements is a world leader in Sputtering Target, Foil, Rod, Wire, Bar, Sheet, Plate and < 0.5 mm Thin Film from rare earth and other electronic and optic materials.  American Elements produces high purity metals and compounds with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical deposition and physical vapor deposition (PVD) display and optical applications. We also produce the rare earths and most advanced metals as cast rods and plates.99.999% Gold Foil for chemical vapor deposition


Materials are produced using crystallization, solid state and other ultra high purification processes. American Elements specializes in producing custom compositions for research and new proprietary technologies.

Indium Sputtering Target

 

Sputtering Targets. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. Other shapes are available by request.

Rotatable Targets. For large area thin film deposition, American Elements produces rotatable sputtering targets by plasma deposition onto a tubular substrate and by casting. Rotatable sputtering targets are available up to 1,000 mm in length and can be produced from a number of metallic, oxide and alloy sources for use in many applications where large film areas are required, such as photovoltaic and other coatings.

All machined pieces are produced by casting oversized blanks, and machining down to required specifications. They are usually machined to tolerances of +0.010"/-0" on diameter, length or width, and +/-0.005" on thickness. Larger targets are also finished to a flatness within 0.015". We can accommodate tighter tolerances upon request.


Foils. American Elements produces rolled foils and sheets in various thicknesses and sizes. Most foils are produced from cast ingots for use in coating and thin film Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Organometallic and Chemical Vapor Deposition (MOCVD) for specific applications such as fuel cells and solar energy. Scandium foils are produced from distilled scandium that does not contain tantalum. Thickness can range from 0.003" to approximately 2mm for all metals. Some metals can also be rolled down as thin as 0.001". Piece sizes are available up to approximately 7" maximum width. Maximum lengths of about 20" can be obtained with a nominal thickness between about 0.005" and 0.020".

99.999% Copper Foil 99.999% Dysprosium Foil 99.999% Gold Foil

Rods and Plates. American Elements casts any of the rare earth metals and most other advanced material into rod, bar or plate form, as well as other machined shapes. All as-cast rods, bars and plates are produced from either the pure metal ingots or sublimed metals. We have a variety of standard sized rod molds, from a minimum of 1/4" diameter up to 3" diameter for most rod needs. Plates are also offered in standard thicknesses, from 1/4" thick to 1" thick. Maximum rod lengths and maximum plate sizes are dependent on melt capacity and furnace room. Small diameter rods may have only a 4"-6" maximum cast length, whereas larger diameter rods may be cast up to about 16" long. Plate sizes can be cast up to a size of 24" x 16". As-cast rods or plates are saw-cut to length or final dimensions, and the metal surface may have visible flow marks.

Round Metallic Tubes--Selected DimensionsTubing. AE produces a complete line of fully characterized round, oval, rectangular and square seamless tubing in diameters from 0.2 to 6.0 inches and wall thicknesses from 0.003 to 0.500 inches produced from advanced and high purity metals for use in industrial and research applications in the fields of electronics, energy, medical devices and aerospace among many others. Tubing can be further processed at the customer's request to rings, washers, sleeves and sheaths. Tubing is produced from most metals including: Aluminum, Bismuth, Carbon, Cerium (as well as most other rare earths), Chromium, Cobalt, Copper, Erbium, Germanium, Gold, Indium, Iron, Magnesium, Manganese, Molybdenum, Neodymium, Nickel, Niobium, Ruthenium, Silicon, Silver, Tin, Titanium, Tungsten, Vanadium, Yttrium, Zinc, and Zirconium.


American Elements manufactures the following sputtering targets for thin film commercial, industrial and research applications, including solar energy and fuel cell applications:

Aluminum Chromium Sputtering Target
Aluminum Copper Silicon Sputtering Target
Aluminum Copper Sputtering Target
Aluminum Copper Sputtering Target
Aluminum Dysprosium Sputtering Target
Aluminum Erbium Sputtering Target
Aluminum Fluoride Sputtering Target
Aluminum Gadolinium Sputtering Target
Aluminum Magnesium Silicon Sputtering Target
Aluminum Magnesium Sputtering Target
Aluminum Molybdenum Sputtering Target
Aluminum Neodymium Sputtering Target
Aluminum Oxide Rotatable Sputtering Target
Aluminum Oxide Sputtering Target
Aluminum Rotatable Sputtering Target
Aluminum Samarium Sputtering Target
Aluminum Samarium Sputtering Target
Aluminum Scandium Sputtering Target
Aluminum Silicon Copper Sputtering Target
Aluminum Silicon Sputtering Target
Aluminum Silicon Sputtering Target
Aluminum Silver Sputtering Target
Aluminum Sputtering Target
Aluminum Tantalum Sputtering Target
Aluminum Titanium Sputtering Target
Aluminum Vanadium Sputtering Target
Aluminum Ytterbium Sputtering Target
Aluminum Yttrium Sputtering Target
Antimony Oxide Rotatable Sputtering Target
Antimony Oxide Sputtering Target
Antimony Rotatable Sputtering Target
Antimony Sputtering Target
Antimony Telluride Sputtering Target
Arsenic Oxide Rotatable Sputtering Target
Arsenic Oxide Sputtering Target
Arsenic Rotatable Sputtering Target
Arsenic Sputtering Target
Barium Fluoride Sputtering Target
Barium Oxide Rotatable Sputtering Target
Barium Oxide Sputtering Target
Barium Rotatable Sputtering Target
Barium Sputtering Target
Beryllium Oxide Rotatable Sputtering Target
Beryllium Oxide Sputtering Target
Beryllium Rotatable Sputtering Target
Beryllium Sputtering Target
Bismuth Fluoride Sputtering Target
Bismuth Oxide Rotatable Sputtering Target
Bismuth Oxide Sputtering Target
Bismuth Rotatable Sputtering Target
Bismuth Sputtering Target
Boron Carbide Sputtering Target
Boron Oxide Rotatable Sputtering Target
Boron Oxide Sputtering Target
Boron Rotatable Sputtering Target
Boron Sputtering Target
Cadmium Fluoride Sputtering Target
Cadmium Oxide Rotatable Sputtering Target
Cadmium Oxide Sputtering Target
Cadmium Rotatable Sputtering Target
Cadmium Sputtering Target
Cadmium Tin Sputtering Target
Calcium Fluoride Sputtering Target
Calcium Oxide Rotatable Sputtering Target
Calcium Oxide Sputtering Target
Calcium Rotatable Sputtering Target
Calcium Sputtering Target
Cerium Copper Sputtering Target
Cerium Fluoride Sputtering Target
Cerium Gadolinium Sputtering Target
Cerium Oxide Rotatable Sputtering Target
Cerium Oxide Sputtering Target
Cerium Rotatable Sputtering Target
Cerium Samarium Sputtering Target
Cerium Silver Sputtering Target
Cerium Sputtering Target
Cerium Titanium Sputtering Target
Cesium Oxide Rotatable Sputtering Target
Cesium Oxide Sputtering Target
Cesium Rotatable Sputtering Target
Cesium Sputtering Target
Chromium Aluminum Sputtering Target
Chromium Boron Sputtering Target
Chromium Copper Sputtering Target
Chromium Magnesium Sputtering Target
Chromium Nickel Sputtering Target
Chromium Oxide Rotatable Sputtering Target
Chromium Oxide Rotatable Sputtering Target
Chromium Oxide Sputtering Target
Chromium Rotatable Sputtering Target
Chromium Rotatable Sputtering Target
Chromium Silicon Sputtering Target
Chromium Sputtering Target Chromium Sputtering Target
Chromium Sputtering Target
Chromium Vanadium Sputtering Target
Cobalt Aluminum Sputtering Target
Cobalt Boron Sputtering Target
Cobalt Chromium Aluminum Sputtering Target
Cobalt Chromium Iron Sputtering Target
Cobalt Chromium Sputtering Target
Cobalt Gadolinium Sputtering Target
Cobalt Iron Boron Sputtering Target
Cobalt Iron Gadolinium Sputtering Target
Cobalt Iron Sputtering Target
Cobalt Nickel Chromium Sputtering Target
Cobalt Nickel Sputtering Target
Cobalt Oxide Rotatable Sputtering Target
Cobalt Oxide Sputtering Target
Cobalt Rotatable Sputtering Target
Cobalt Sputtering Target
Cobalt Terbium Sputtering Target
Cobalt Vanadium Sputtering Target
Cobalt Zr Sputtering Target
Copper Aluminum Sputtering Target
Copper Chrome Sputtering Target
Copper Fluoride Sputtering Target
Copper Gallium Selenide Sputtering Target
Copper Gallium Sputtering Target
Copper Germanium Sputtering Target
Copper Indium Selenide Sputtering Target
Copper Indium Sputtering Target
Copper Nickel Sputtering Target
Copper Nickel Sputtering Target
Copper Oxide Rotatable Sputtering Target
Copper Oxide Sputtering Target
Copper Rotatable Sputtering Target
Copper Selenide Sputtering Target
Copper Sputtering Target
Copper Sputtering Target
Copper Zinc Sputtering Target
Dysprosium Cobalt Sputtering Target
Dysprosium Fluoride Sputtering Target
Dysprosium Iron Cobalt Sputtering Target
Dysprosium Iron Sputtering Target
Dysprosium Oxide Rotatable Sputtering Target
Dysprosium Oxide Sputtering Target
Dysprosium Rotatable Sputtering Target
Dysprosium Sputtering Target
Erbium Fluoride Sputtering Target
Erbium Oxide Rotatable Sputtering Target
Erbium Oxide Sputtering Target
Erbium Rotatable Sputtering Target
Erbium Sputtering Target
Europium Fluoride Sputtering Target
Europium Oxide Rotatable Sputtering Target
Europium Oxide Sputtering Target
Europium Rotatable Sputtering Target
Europium Sputtering Target
Gadolinium doped Ceria Sputtering Target
Gadolinium Fluoride Sputtering Target
Gadolinium Oxide Rotatable Sputtering Target
Gadolinium Oxide Rotatable Sputtering Target
Gadolinium Oxide Sputtering Target
Gadolinium Rotatable Sputtering Target
Gadolinium Rotatable Sputtering Target
Gadolinium Sputtering Target
Gallium Fluoride Sputtering Target
Gallium Oxide Rotatable Sputtering Target
Gallium Oxide Sputtering Target
Gallium Rotatable Sputtering Target
Gallium Selenide Sputtering Target
Gallium Sputtering Target
Germanium Antimony Sputtering Target
Germanium Oxide Rotatable Sputtering Target
Germanium Oxide Sputtering Target
Germanium Rotatable Sputtering Target
Germanium Sputtering Target
Gold Antimony Sputtering Target
Gold Copper Sputtering Target
Gold germanium Sputtering Target
Gold Oxide Rotatable Sputtering Target
Gold Rotatable Sputtering Target
Gold Silicon Sputtering Target
Gold Sputtering Target
Gold tin Sputtering Target
Hafnium Carbide Sputtering Target
Hafnium Oxide Rotatable Sputtering Target
Hafnium Oxide Sputtering Target
Hafnium Rotatable Sputtering Target
Hafnium Sputtering Target
Holmium Fluoride Sputtering Target
Holmium Oxide Rotatable Sputtering Target
Holmium Oxide Sputtering Target
Holmium Rotatable Sputtering Target
Holmium Sputtering Target
Indium Fluoride Sputtering Target
Indium Oxide Rotatable Sputtering Target
Indium Oxide Sputtering Target
Indium Rotatable Sputtering Target
Indium Selenide Sputtering Target
Indium Sputtering Target
Indium Tin oxide (ITO) Sputtering Target
Iridium Oxide Rotatable Sputtering Target
Iridium Oxide Sputtering Target
Iridium Rotatable Sputtering Target
Iridium Sputtering Target
Iron Fluoride Sputtering Target
Iron Oxide Rotatable Sputtering Target
Iron Oxide Sputtering Target
Iron Rotatable Sputtering Target
Iron Sputtering Target
Lanthanum Oxide Rotatable Sputtering Target
Lanthanum Rotatable Sputtering Target
Lanthanum Strontium Chromite (LSC) Sputtering Target
Lanthanum Strontium Cobaltite Ferrite (LSCF) Sputtering Target
Lanthanum Strontium Ferrite (LSF) Sputtering Target
Lanthanum Strontium Gallate Magnesite (LSGM) Sputtering Target
Lanthanum Strontium Manganite (LSM) Sputtering Target
Lead Oxide Rotatable Sputtering Target
Lead Oxide Sputtering Target
Lead Rotatable Sputtering Target
Lead Sputtering Target
Lithium Oxide Rotatable Sputtering Target
Lithium Oxide Sputtering Target
Lithium Rotatable Sputtering Target
Lutetium Fluoride Sputtering Target
Lutetium Oxide Rotatable Sputtering Target
Lutetium Oxide Sputtering Target
Lutetium Rotatable Sputtering Target
Lutetium Sputtering Target
Magnesium Fluoride Sputtering Target
Magnesium Oxide Rotatable Sputtering Target
Magnesium Oxide Sputtering Target
Magnesium Rotatable Sputtering Target
Magnesium Sputtering Target
Molybdenum Oxide Rotatable Sputtering Target
Molybdenum Oxide Sputtering Target
Molybdenum Rotatable Sputtering Target
Molybdenum Sputtering Target
Neodymium Fluoride Sputtering Target
Neodymium Iron Boron Sputtering Target
Neodymium Oxide Rotatable Sputtering Target
Neodymium Oxide Sputtering Target
Neodymium Rotatable Sputtering Target
Neodymium Sputtering Target
Nickel Aluminum Sputtering Target
Nickel Chrome Sputtering Target
Nickel Copper Sputtering Target
Nickel Oxide Rotatable Sputtering Target
Nickel Oxide Sputtering Target
Nickel Platinum Sputtering Target
Nickel Rotatable Sputtering Target
Nickel Sputtering Target
Nickel Vanadium Sputtering Target
Niobium Oxide Rotatable Sputtering Target
Niobium Oxide Sputtering Target
Niobium Rotatable Sputtering Target
Niobium Sputtering Target
Osmium Oxide Rotatable Sputtering Target
Osmium Oxide Sputtering Target
Osmium Rotatable Sputtering Target
Osmium Sputtering Target
Palladium Oxide Rotatable Sputtering Target
Palladium Oxide Sputtering Target
Palladium Rotatable Sputtering Target
Palladium Sputtering Target
Platinum Oxide Rotatable Sputtering Target
Platinum Oxide Sputtering Target
Platinum Rotatable Sputtering Target
Platinum Sputtering Target
Potassium Oxide Rotatable Sputtering Target
Potassium Oxide Sputtering Target
Potassium Rotatable Sputtering Target
Praseodymium Fluoride Sputtering Target
Praseodymium Oxide Rotatable Sputtering Target
Praseodymium Oxide Sputtering Target
Praseodymium Rotatable Sputtering Target
Praseodymium Sputtering Target
Rhenium Oxide Rotatable Sputtering Target
Rhenium Oxide Sputtering Target
Rhenium Rotatable Sputtering Target
Rhenium Sputtering Target
Rhodium Oxide Rotatable Sputtering Target
Rhodium Oxide Sputtering Target
Rhodium Rotatable Sputtering Target
Rhodium Sputtering Target
Rubidium Oxide Rotatable Sputtering Target
Rubidium Oxide Sputtering Target
Rubidium Rotatable Sputtering Target
Ruthenium Oxide Rotatable Sputtering Target
Ruthenium Oxide Sputtering Target
Ruthenium Rotatable Sputtering Target
Ruthenium Sputtering Target
Samarium Cobalt Sputtering Target
Samarium doped Ceria Sputtering Target
Samarium Oxide Rotatable Sputtering Target
Samarium Oxide Sputtering Target
Samarium Rotatable Sputtering Target
Samarium Sputtering Target
Scandium Fluoride Sputtering Target
Scandium Oxide Rotatable Sputtering Target
Scandium Oxide Sputtering Target
Scandium Rotatable Sputtering Target
Scandium Sputtering Target
SCZ (Scandium doped Zirconia) Sputtering Target
Selenium Oxide Rotatable Sputtering Target
Selenium Oxide Sputtering Target
Selenium Rotatable Sputtering Target
Selenium Sputtering Target
Silicon Oxide Rotatable Sputtering Target
Silicon Oxide Sputtering Target
Silicon Rotatable Sputtering Target
Silicon Sputtering Target
Silver Aluminum Sputtering Target
Silver Copper Sputtering Target
Silver Fluoride Sputtering Target
Silver Lanthanum Sputtering Target
Silver Lutetium Sputtering Target
Silver Magnesium Sputtering Target
Silver Oxide Rotatable Sputtering Target
Silver Oxide Sputtering Target
Silver Rotatable Sputtering Target
Silver Tin Sputtering Target
Sodium Oxide Sputtering Target
Strontium Fluoride Sputtering Target
Strontium Oxide Rotatable Sputtering Target
Strontium Oxide Sputtering Target
Strontium Rotatable Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Sputtering Target
Tellurium Oxide Rotatable Sputtering Target
Tellurium Oxide Sputtering Target
Tellurium Rotatable Sputtering Target
Tellurium Sputtering Target
Terbium Fluoride Sputtering Target
Terbium Oxide Rotatable Sputtering Target
Terbium Oxide Sputtering Target
Terbium Rotatable Sputtering Target
Terbium Sputtering Target
Thallium Oxide Rotatable Sputtering Target
Thallium Oxide Sputtering Target
Thallium Rotatable Sputtering Target
Thorium Oxide Rotatable Sputtering Target
Thorium Oxide Sputtering Target
Thorium Rotatable Sputtering Target
Thorium Sputtering Target
Thulium Fluoride Sputtering Target
Thulium Oxide Rotatable Sputtering Target
Thulium Oxide Sputtering Target
Thulium Rotatable Sputtering Target
Thulium Sputtering Target
Tim Oxide Rotatable Sputtering Target
Tin Oxide Sputtering Target
Tin Rotatable Sputtering Target
Tin Sputtering Target
Titanium Carbide Sputtering Target
Titanium Oxide Rotatable Sputtering Target
Titanium Oxide Sputtering Target
Titanium Rotatable Sputtering Target
Titanium Sputtering Target
Titanium Tungsten Sputtering Target
Tungsten Carbide Sputtering Target
Tungsten Oxide Rotatable Sputtering Target
Tungsten Oxide Sputtering Target
Tungsten Rotatable Sputtering Target
Tungsten Sputtering Target
Uranium Oxide Sputtering Target
Vanadium Oxide Rotatable Sputtering Target
Vanadium Oxide Sputtering Target
Vanadium Sputtering Target
Vandium Rotatable Sputtering Target
YSZ Sputtering Target
Ytterbium Fluoride Sputtering Target
Ytterbium Oxide Rotatable Sputtering Target
Ytterbium Oxide Sputtering Target
Ytterbium Rotatable Sputtering Target
Ytterbium Sputtering Target
Yttrium Aluminum Oxide Sputtering Target
Yttrium doped Ceria Sputtering Target
Yttrium Fluoride Sputtering Target
Yttrium Oxide Rotatable Sputtering Target
Yttrium Oxide Sputtering Target Yttrium Rotatable Sputtering Target
Yttrium Sputtering Target
Zinc Fluoride Sputtering Target
Zinc Oxide Rotatable Sputtering Target
Zinc Oxide Sputtering Target
Zinc Rotatable Sputtering Target
Zinc Sputtering Target
Zinc Telluride Sputtering Target
Zirconium Oxide Rotatable Sputtering Target
Zirconium Oxide Sputtering Target
Zirconium Sputtering Target
Zirconium Rotatable Sputtering Target
PRODUCT CATALOG Price Quote Tolling Ultra High Purity Sputtering Target Crystal Growth Advanced Materials Information Center
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This website, the Periodic Table of the Elements information, Element and Materials
Science presentations and all pages, designs, concepts, logos, and color schemes herein
are the copyrighted proprietary rights and intellectual property of American Elements.

 

Recent Research & Development for Sputtering Targets

  • Studies on the oxygenation of human blood by photocatalytic action. Artif Organs. 2007 Nov;31(11):819-25.

  • Chemical energy release and radical formation in cluster-induced sputtering of diatomic molecular targets: a molecular-dynamics model study. Phys Rev Lett. 2007 Jul 13;99(2):027602. Epub 2007 Jul 13.

  • Oxygenation of human blood using photocatalytic reaction. ASAIO J. 2007 Jul-Aug;53(4):434-7.

  • The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition. J Mater Sci Mater Med. 2007 Jun;18(6):1061-9. Epub 2007 Feb 1.

  • Plasma-controlled nanocrystallinity and phase composition of TiO2: a smart way to enhance biomimetic response. J Biomed Mater Res A. 2007 May;81(2):453-64.

  • Direct comparison of Au(3)(+) and C(60)(+) cluster projectiles in SIMS molecular depth profiling. J Am Soc Mass Spectrom. 2007 Mar;18(3):406-12. Epub 2006 Nov 21.

  • Electronic sputtering produced by fission fragments on condensed CO and CO2. J Am Soc Mass Spectrom. 2006 Aug;17(8):1120-8. Epub 2006 Jun 2.

  • Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials. Appl Opt. 2006 May 20;45(15):3510-5.

  • Nonlinear ripple dynamics on amorphous surfaces patterned by ion beam sputtering. Phys Rev Lett. 2006 Mar 3;96(8):086101. Epub 2006 Feb 27.

  • Multifunctional Ti-(Ca,Zr)-(C,N,O,P) films for load-bearing implants. Biomaterials. 2006 Jul;27(19):3519-31. Epub 2006 Mar 13.

  • Radioactive sputter cathodes for 32P plasma-based ion implantation. Appl Radiat Isot. 2006 May;64(5):556-62. Epub 2006 Jan 6.

  • Experimental apparatus for investigation of sputtering and secondary ion emission induced by energetic ion beams. Rapid Commun Mass Spectrom. 2006;20(2):298-302.

  • Experimental and theoretical evidence for long-lived molecular hydrogen anions H2- and D2-. Phys Rev Lett. 2005 Jun 10;94(22):223003. Epub 2005 Jun 10.

  • Self-organized ordering of nanostructures produced by ion-beam sputtering. Phys Rev Lett. 2005 Jan 14;94(1):016102. Epub 2005 Jan 3.

  • Design, characterization and testing of Ti-based multicomponent coatings for load-bearing medical applications. Biomaterials. 2005 Jun;26(16):2909-24.

  • FePt-Ag nanocomposite thin films with longitudinal magnetic anisotropy. J Nanosci Nanotechnol. 2004 Sep;4(7):704-7.

  • The contribution of collision cascades to sputtering and radiation damage. Philos Transact A Math Phys Eng Sci. 2004 Jan 15;362(1814):5-28.

  • Influence of the composition of BCN films deposited by reactive magnetron sputtering on their properties. Anal Bioanal Chem. 2002 Oct;374(4):709-11. Epub 2002 Sep 5.

  • Design and manufacture of spectrally selective reflecting coatings for the use with laser display projection screens. Appl Opt. 2002 Jun 1;41(16):3097-106.

  • Functionally graded calcium phosphate coatings produced by ion beam sputtering/mixing deposition. Biomaterials. 2001 Jun;22(12):1619-26.

 

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