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SPUTTERING TARGET & DEPOSITION MATERIALS
INFORMATION CENTER


Deposition Materials  •  Evaporation Materials  •  Sputtering Targets  •  Rotatable Sputtering Targets
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Ultra High Purity Rotatable Sputtering Targets
Ultra High Purity Sputtering Target
American Elements specializes in evaporation and pre-melted materials
(oxide and fluoride) and high purity metal shapes with the highest density
and smallest grain sizes for use in chemical vapor deposition (CVD) and
physical vapor deposition (PVD) for thin film, optic, and electronic applications.

  Hydrogen                                 Helium
  Lithium Beryllium                     Boron Carbon Nitrogen Oxygen Fluorine Neon
  Sodium Magnesium                     Aluminum Silicon Phosphorus Sulfur Chlorine Argon
  Potassium Calcium Scandium Titanium Vanadium Chromium Manganese Iron Cobalt Nickel Copper Zinc Gallium Germanium Arsenic Selenium Bromine Krypton
  Rubidium Strontium Yttrium Zirconium Niobium Molybdenum Technetium Ruthenium Rhodium Palladium Silver Cadmium Indium Tin Antimony Tellurium Iodine Xenon
  Cesium Barium Lanthanum Hafnium Tantalum Tungsten Rhenium Osmium Iridium Platinum Gold Mercury Thallium Lead Bismuth Polonium Astatine Radon
  Francium Radium Actinium Rutherfordium Dubnium Seaborgium Bohrium Hassium Meitnerium Darmstadtium Roentgenium Copernicium Ununtrium Flerovium Ununpentium Livermorium Ununseptium Ununoctium
                                     
      Cerium Praseodymium Neodymium Promethium Samarium Europium Gadolinium Terbium Dysprosium Holmium Erbium Thulium Ytterbium Lutetium    
      Thorium Protactinium Uranium Neptunium Plutonium Americium Curium Berkelium Californium Einsteinium Fermium Mendelevium Nobelium Lawerencium    

American Elements is a global manufacturer of Sputtering Targets, Foil, Rods, Wires, Bars, Sheets, Plates and <0.5 mm Thin Films from the rare earth elements and other electronic and optic materials. American Elements produces high purity metals and compounds with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical and physical vapor deposition (PVD) display and optical applications. We also produce the rare earths and most advanced metals as cast rods and plates.99.999% Gold Foil for chemical vapor deposition


Materials are produced using crystallization, solid state and other ultra high purification processes. American Elements specializes in producing custom compositions for research and new proprietary technologies.

Indium Sputtering Target

Sputtering Targets.

Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval-shaped target. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes such as nanoparticles and Quantum Dots (see Nanotechnology for more information on applications of nanomaterials) and in forms such as solutions and organometallics. Other shapes are available by request.

Rotatable Targets.

For large area thin film deposition, American Elements produces rotatable sputtering targets via casting or plasma deposition onto a tubular substrate. Rotatable sputtering targets are available up to 1,000 mm in length and can be produced from a number of metallic, oxide and alloy sources for use in many applications where large film areas are required, such as photovoltaic and other coatings.

All machined pieces are produced by casting oversized blanks, and machining down to required specifications. They are usually machined to tolerances of +0.010"/-0" on diameter, length or width, and +/-0.005" on thickness. Larger targets are also finished to a flatness within 0.015". We can accommodate tighter tolerances upon request.



SPUTTERING DEPOSITION

Sputtering deposition uses a plasma, which is usually formed from a non-reactive gas, to bombard the target material for the thin film and knock the atoms of the target material out of its bulk. The ejected atoms then land on the substrate and form a thin film. Since the target does not need to be heated, the technique is very flexible for a wide range of applications. Targets can be composed of pure elements as well as compounds or mixtures.



USES & APPLICATIONS FOR SPUTTERING TARGETS AND EVAPORATION MATERIALS

Electronics and Semiconductors. The first commercial use for the sputtering target was in semiconductors and electronics for front end and back end packaging, diffusion barriers, compounds, phase change memory, IC interconnects, micro contacts, and in sensors, MEMs and LEDs. Sputtering targets and evaporation materials composed of copper and copper alloys, including copper-nickel and copper-chromium, as well as nickel and nickel alloys such as nickel-aluminum, nickel-vanadium, nickel-platinum, nickel-copper and nickel-chromium, are manufactured for packaging and other applications. Additional materials include aluminum (both in its elemental form and alloyed with copper and silicon as aluminum-copper, aluminum-silicon, and aluminum-copper-silicon), titanium as element and titanium-tungsten alloy. The conductive and solder wetting properties of gold make it an important deposition material, including gold alloys such as gold-tin, gold-antimony, gold-silicon, gold-copper, and gold-germanium. Phase Change Alloys such as germanium-antimony alloyed with tellurium, silver, indium and platinum and transparent conductive oxides (TCO) for light emitting applications such as sensors and light emitting diodes (LED). These include indium-tin oxide (ITO) and zinc oxide doped with aluminum and other elements. American Elements also produces ultra high purity sputtering targets and other evaporation materials for electronic applications composed of hafnium, molybdenum, silver, iridium, rhodium and ruthenium.

Anti-Abrasive Coatings for Wear Protection. Electroplating active surfaces of tools and dies to protect against wear and extend life has given way in recent years to the deposition of these coating materials as a more cost effective alternative. Typical protective materials using sputtering targets and other evaporation materials include titanium, titanium carbide, silicon carbide, boron carbide, aluminum, nickel, chromium and tungsten carbide.

Magnetic Materials. The use of high strength magnets have found application in numerous industries including automotive, aerospace, biomedical imaging and auditory engineering. Sputtering targets and other evaporation materials of these advanced magnetic materials are manufactured by American Elements from samarium cobalt and neodymium iron boron alloy.

Optical and Architectural Glass. The ability of certain elements to selectively absorb and emit highly specific wave length ranges and reduce glare due to their high refractive index when deposited on a glass substrate resulted in the development of sputtering and evaporation materials of elemental rare earths, such as neodymium and dysprosium and many other optically active and anti-reflective (AR) materials. Architectural glass for residential, commercial and office building applications has also benefited from the availability of these types of coatings.

Photovoltaic Solar Energy Panels. The three primary solar energy technologies (silicon based, Copper Indium Selenide (CIS) and Copper Indium Gallium Selenide (CIGS)) are layered structures that require sputtering targets and other evaporation materials at several stages including certain transparent conductive oxides (TCO) such as indium tin oxide (ITO) and doped zinc oxide as the top electrode, molybdenum as the back plate, and antimony telluride and zinc telluride in CIS and CIG photovoltaic cells.

Solid Oxide Fuel Cells. Typical solid oxide fuel cell (SOFC) designs contain an electronically conductive low density cathode, a high density, ionically conductive electrolyte, and an electronically conductive open air electrode. Sputtering targets are produced by American Elements to meet the needs of each of these layers including Perovskite cathode materials including Lanthanum Strontium Manganite (LSM), Lanthanum Strontium Ferrite (LSF), Lanthanum Strontium Cobaltite Ferrite (LSCF), Lanthanum Strontium Chromite (LSC), and Lanthanum Strontium Gallate Magnesite (LSGM) with doping levels and other parameters to customer specifications and ionically conductive electrolytes including YSZ (Yttria stabilized Zirconia), SCZ (Scandium doped Zirconia), Samarium doped Ceria, Gadolinium doped Ceria and Yttrium doped Ceria. These fuel cells materials are marketed under the trademark AE Fuel Cells™.

Data Storage. Sputtering targets and other evaporation materials are now essential to the coating and manufacturing of optical storage devices such as CDs and DVDs to provide both wear protection and reflectivity.


American Elements manufactures the following sputtering targets for thin film commercial,
industrial, and research applications, including solar energy and fuel cell applications:


ELEMENTAL SPUTTERING TARGETS

Aluminum Rotatable Sputtering Target
Aluminum Sputtering Target
Antimony Rotatable Sputtering Target
Antimony Sputtering Target
Arsenic Rotatable Sputtering Target
Arsenic Sputtering Target
Barium Rotatable Sputtering Target
Barium Sputtering Target
Beryllium Rotatable Sputtering Target
Beryllium Sputtering Target
Bismuth Rotatable Sputtering Target
Bismuth Sputtering Target
Boron Rotatable Sputtering Target
Boron Sputtering Target
Cadmium Rotatable Sputtering Target
Cadmium Sputtering Target
Carbon (Graphite) Sputtering Target
Carbon (Graphite) Rotatable Sputtering Target
Calcium Rotatable Sputtering Target
Calcium Sputtering Target
Cerium Rotatable Sputtering Target
Cerium Sputtering Target
Cesium Rotatable Sputtering Target
Chromium Rotatable Sputtering Target
Chromium Sputtering Target
Cobalt Rotatable Sputtering Target
Cobalt Sputtering Target
Copper Rotatable Sputtering Target
Copper Sputtering Target
Dysprosium Rotatable Sputtering Target
Dysprosium Sputtering Target
Erbium Sputtering Target
Erbium Rotatable Sputtering Target
Europium Rotatable Sputtering Target
Europium Sputtering Target
Gadolinium Rotatable Sputtering Target
Gadolinium Sputtering Target
Gallium Rotatable Sputtering Target
Gallium Sputtering Target
Germanium Rotatable Sputtering Target
Germanium Sputtering Target
Gold Rotatable Sputtering Target
Gold Sputtering Target
Hafnium Rotatable Sputtering Target
Hafnium Sputtering Target
Holmium Rotatable Sputtering Target
Holmium Sputtering Target
Indium Rotatable Sputtering Target
Indium Sputtering Target
Iridium Rotatable Sputtering Target
Iridium Sputtering Target
Iron Rotatable Sputtering Target
Iron Sputtering Target
Lanthanum Rotatable Sputtering Target
Lanthanum Sputtering Target
Lead Rotatable Sputtering Target
Lead Sputtering Target
Lithium Rotatable Sputtering Target
Lithium Sputtering Target
Lutetium Rotatable Sputtering Target
Lutetium Sputtering Target
Magnesium Rotatable Sputtering Targets
Magnesium Sputtering Target
Manganese Rotatable Sputtering Targets

Manganese Sputtering Target
Molybdenum Rotatable Sputtering Target
Molybdenum Sputtering Target
Neodymium Rotatable Sputtering Target
Neodymium Sputtering Target
Nickel Rotatable Sputtering Target
Nickel Sputtering Target
Niobium Rotatable Sputtering Target
Niobium Sputtering Target
Osmium Rotatable Sputtering Target
Osmium Sputtering Target
Palladium Sputtering Target
Platinum Rotatable Sputtering Target
Platinum Sputtering Target
Praseodymium Rotatable Sputtering Target
Praseodymium Sputtering Target
Potassium Sputtering Target
Rhenium Rotatable Sputtering Target
Rhenium Sputtering Target
Rhodium Rotatable Sputtering Targets
Rhodium Sputtering Target
Ruthenium Rotatable Sputtering Target
Ruthenium Sputtering Target
Ruthenium Vacuum Melted Target
Samarium Rotatable Sputtering Targets
Samarium Sputtering Target
Scandium Rotatable Sputtering Targets
Scandium Sputtering Target
Selenium Rotatable Sputtering Target
Selenium Sputtering Target
Silicon Rotatable Sputtering Target
Silicon Sputtering Target
Silver Rotatable Sputtering Target
Silver Sputtering Target

Strontium Rotatable Sputtering Target
Strontium Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Sputtering Target
Tellurium Rotatable Sputtering Targets
Tellurium Sputtering Target
Terbium Rotatable Sputtering Targets
Terbium Sputtering Target
Thallium Rotatable Sputtering Target
Thallium Sputtering Target
Thorium Rotatable Sputtering Target
Thorium Sputtering Target
Thulium Rotatable Sputtering Target
Thulium Sputtering Target
Tin Rotatable Sputtering Target
Tin Sputtering Target
Titanium Rotatable Sputtering Target
Titanium Sputtering Target
Tungsten Rotatable Sputtering Target
Tungsten Sputtering Target
Vanadium Rotatable Sputtering Targets
Vanadium Sputtering Target
Ytterbium Rotatable Sputtering Targets
Ytterbium Sputtering Target
Yttrium Rotatable Sputtering Target
Yttrium Sputtering Target
Zinc Rotatable Sputtering Target
Zinc Sputtering Target
Zirconium Rotatable Sputtering Target
Zirconium Sputtering Target



OXIDE SPUTTERING TARGETS

Aluminum Oxide Sputtering Target
Aluminum Oxide Rotatable Sputtering Target
Antimony Oxide Sputtering Target
Antimony Oxide Rotatable Sputtering Target
Arsenic Oxide Sputtering Target
Arsenic Oxide Rotatable Sputtering Target
ATO Sputtering Target
AZO Sputtering Target
AZO Rotatable Sputtering Target
Barium Oxide Sputtering Target
Barium Oxide Rotatable Sputtering Target
Beryllium Oxide Sputtering Target
Beryllium Oxide Rotatable Sputtering Target
Bismuth Oxide Sputtering Target
Bismuth Oxide Rotatable Sputtering Target
Bismuth Lanthanum Titanium Oxide Sputtering Target
Black Iron Oxide Sputtering Target
Boron Oxide Sputtering Target
Boron Oxide Rotatable Sputtering Target
Cadmium Oxide Sputtering Target
Cadmium Oxide Rotatable Sputtering Target
Calcium Oxide Sputtering Target
Calcium Oxide Rotatable Sputtering Target
Cerium Oxide Sputtering Target
Cerium Oxide Rotatable Sputtering Target
Cesium Oxide Sputtering Target
Cesium Oxide Rotatable Sputtering Target
Chromium Oxide Sputtering Target
Chromium Oxide Rotatable Sputtering Target
Chromium Trioxide Sputtering Target
Cobalt Oxide Sputtering Target
Cobalt Oxide Rotatable Sputtering Target
Copper Aluminum Oxide Sputtering Target
Copper Oxide Sputtering Target
Copper Oxide Rotatable Sputtering Target
Dysprosium Oxide Sputtering Target
Dysprosium Oxide Rotatable Sputtering Target
Erbium Oxide Sputtering Target
Erbium Oxide Rotatable Sputtering Target
Europium Oxide Sputtering Target
Europium Oxide Rotatable Sputtering Target
Gadolinium Oxide Sputtering Target
Gadolinium Oxide Rotatable Sputtering Target
Gallium Oxide Sputtering Target
Gallium Oxide Rotatable Sputtering Target
Germanium Dioxide Sputtering Target
Germanium Oxide Sputtering Target
Germanium Oxide Rotatable Sputtering Target
Gold Oxide Sputtering Target
Gold Oxide Rotatable Sputtering Target
GZO Sputtering Target
Hafnium Oxide Sputtering Target
Hafnium Oxide Rotatable Sputtering Target
Holmium Oxide Sputtering Target
Holmium Oxide Rotatable Sputtering Target
IGZO Sputtering Target
Indium Oxide Sputtering Target
Indium Oxide Rotatable Sputtering Target
Indium Moly Oxide Sputtering Target
Indium Tin Oxide (ITO) Sputtering Target
Indium Zinc Oxide Sputtering Target
Iridium Oxide Sputtering Target
Iridium Oxide Rotatable Sputtering Target
Iron Oxide Sputtering Target
Iron Oxide Rotatable Sputtering Target
Lanthanum Oxide Sputtering Target
Lanthanum Oxide Rotatable Sputtering Target
Lanthanum Aluminum Oxide Sputtering Target
Lanthanum Strontium Chromite (LSC) Sputtering Target
Lanthanum Strontium Cobaltite Ferrite (LSCF) Sputtering Target
Lanthanum Strontium Ferrite (LSF) Sputtering Target
Lanthanum Strontium Gallate Magnesite (LSGM) Sputtering Target
Lanthanum Strontium Manganite (LSM) Sputtering Target
Lanthanum Vanadium Oxide Sputtering Target
Lead Oxide Sputtering Target
Lead Oxide Rotatable Sputtering Target
Lithium Cobalt Oxide Sputtering Target
Lithium Oxide Sputtering Target
Lithium Oxide Rotatable Sputtering Target
Lutetium Oxide Sputtering Target
Lutetium Oxide Rotatable Sputtering Target
Magnesium Oxide Sputtering Target
Magnesium Oxide Rotatable Sputtering Target
Magnesium Zinc Oxide Sputtering Target
Manganese Oxide Sputtering Target
Manganese Oxide Rotatable Sputtering Target
Molybdenum Oxide Sputtering Target
Molybdenum Oxide Rotatable Sputtering Target
Molybdenum Trioxide Sputtering Target
Neodymium Oxide Sputtering Target
Neodymium Oxide Rotatable Sputtering Target
Nickel Oxide Sputtering Target
Nickel Oxide Rotatable Sputtering Target
Niobium Oxide Sputtering Target
Niobium Oxide Rotatable Sputtering Target
Niobium Pentoxide Sputtering Target
Osmium Oxide Sputtering Target
Osmium Oxide Rotatable Sputtering Target
Palladium Oxide Sputtering Target
Platinum Oxide Sputtering Target
Platinum Oxide Rotatable Sputtering Target
Praseodymium Barium Copper Oxide Sputtering Target
Praseodymium Oxide Sputtering Target
Praseodymium Oxide Rotatable Sputtering Target
Potassium Oxide Sputtering Target
Quartz (Fused) Sputtering Target
Rhenium Oxide Sputtering Target
Rhenium Oxide Rotatable Sputtering Target
Rhodium Oxide Sputtering Target
Rhodium Oxide Rotatable Sputtering Target
Rubidium Oxide Sputtering Target
Ruthenium Oxide Sputtering Target
Ruthenium Oxide Rotatable Sputtering Target
Samaria-doped Ceria (SDC) Sputtering Target
Samarium Oxide Sputtering Target
Samarium Oxide Rotatable Sputtering Target
Scandium Oxide Sputtering Target
Scandium Oxide Rotatable Sputtering Target
Selenium Oxide Sputtering Target
Selenium Oxide Rotatable Sputtering Target
Silicon Aluminum Oxide Rotatable Sputtering Target
Silicon Monoxide Sputtering Target
Silicon Oxide Sputtering Target
Silicon Oxide Rotatable Sputtering Target
Silver Oxide Sputtering Target
Silver Oxide Rotatable Sputtering Target
Sodium Oxide Sputtering Target
Strontium Oxide Sputtering Target
Strontium Oxide Rotatable Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tellurium Oxide Sputtering Target
Tellurium Oxide Rotatable Sputtering Target
Terbium Oxide Sputtering Target
Terbium Oxide Rotatable Sputtering Target
Thallium Oxide Sputtering Target
Thallium Oxide Rotatable Sputtering Target
Thorium Oxide Sputtering Target
Thorium Oxide Rotatable Sputtering Target
Thulium Oxide Sputtering Target
Thulium Oxide Rotatable Sputtering Target
Tin Oxide Sputtering Target
Tin Oxide Rotatable Sputtering Target
Tin(II) Oxide Sputtering Target
Titanium Dioxide Sputtering Target
Titanium Oxide Sputtering Target
Titanium Oxide Rotatable Sputtering Target
Tungsten Oxide Sputtering Target
Tungsten Oxide Rotatable Sputtering Target
Tungsten Trioxide Sputtering Target
Uranium Oxide Sputtering Target
Vanadium Oxide Sputtering Target
Vanadium Oxide Rotatable Sputtering Target
Vanadium Pentoxide Sputtering Target
Ytterbium Oxide Sputtering Target
Ytterbium Oxide Rotatable Sputtering Target
Yttria-doped Ceria (YDC) Sputtering Target
Yttria-stabilized Zirconia (YSZ) Sputtering Target
Yttrium Aluminum Oxide Sputtering Target
Yttrium Oxide Sputtering Target
Yttrium Oxide Rotatable Sputtering Target
Zinc Oxide Sputtering Target
Zinc Oxide Rotatable Sputtering Target
Zinc Aluminum Oxide Sputtering Target
Zinc Aluminum Oxide Rotatable Sputtering Target
Zinc Gallium Oxide Sputtering Target
Zinc Manganese Oxide Sputtering Target
Zinc Oxide - Phosphorus Oxide Sputtering Target
Zinc Tin Oxide (ZTO) Sputtering Target
Zirconium Oxide Sputtering Target
Zirconium Oxide Rotatable Sputtering Target

COMPOUND SPUTTERING TARGETS

Aluminum Antimonide Sputtering Target
Aluminum Fluoride Sputtering Target
Aluminum Nitride Sputtering Target
Aluminum Phosphide Sputtering Target
Aluminum Selenide Sputtering Target
Aluminum Sulfide Sputtering Target
Aluminum Telluride Sputtering Target
Aluminum Titanate Sputtering Target
Antimony doped Zinc Tin Sputtering Target
Antimony Phosphide Sputtering Target
Antimony Selenide Sputtering Target
Antimony Sulfide Sputtering Target
Antimony Telluride Sputtering Target
Arsenic Phosphide Sputtering Target
Arsenic Selenide Sputtering Target
Arsenic Sulfide Sputtering Target
Arsenic Telluride Sputtering Target
Barium Ferrite Sputtering Target
Barium Fluoride Sputtering Target
Barium Strontium Titanate Sputtering Target
Barium Sulfide Sputtering Target
Barium Titanate Sputtering Target
Barium Cerium Yttrium Zirconate Sputtering Target
Barium Zirconate Sputtering Target
Bismuth Ferrite Garnet Sputtering Target
Bismuth Ferrite Sputtering Target
Bismuth Fluoride Sputtering Target
Bismuth Manganate Sputtering Target
Bismuth Phosphide Sputtering Target
Bismuth Selenide Sputtering Target
Bismuth Sulfide Sputtering Target
Bismuth Telluride Sputtering Target
Bismuth Titanate Sputtering Target
Boron Carbide Sputtering Target
Boron Nitride Sputtering Target
Cadmium Antimonide Sputtering Target
Cadmium Arsenide Sputtering Target
Cadmium Fluoride Sputtering Target
Cadmium Phosphide Sputtering Target
Cadmium Selenide Sputtering Target
Cadmium Sulfide Sputtering Target
Cadmium Telluride Sputtering Target
Cadmium Zinc Sulfide Sputtering Target
Calcium Fluoride Sputtering Target
Calcium Phosphide Sputtering Target
Calcium Selenide Sputtering Target
Calcium Silicate Sputtering Target
Calcium Sulfide Sputtering Target
Calcium Telluride Sputtering Target
Calcium Titanate Sputtering Target
Cerium Boride Sputtering Target
Cerium Fluoride Sputtering Target
Cerium Selenide Sputtering Target
Cerium Telluride Sputtering Target
Cesium Fluoride Sputtering Target
Cesium Phosphide Sputtering Target
Cesium Selenide Sputtering Target
Cesium Telluride Sputtering Target
Chromium Boride Sputtering Target
Chromium Carbide Sputtering Target
Chromium Diboride Sputtering Target
Chromium Disilicide Sputtering Target
Chromium Doped Silicon Monoxide Sputtering Target
Chromium Fluoride Sputtering Target
Chromium Nitride Sputtering Target
Chromium Selenide Sputtering Target
Chromium Silicide Sputtering Target
Chromium Sulfide Sputtering Target
Chromium Telluride Sputtering Target
Cobalt Aluminate Sputtering Target
Cobalt Phosphide Sputtering Target
Cobalt Selenide Sputtering Target
Cobalt Silicide Sputtering Target
Cobalt Telluride Sputtering Target
Copper Fluoride Sputtering Target
Copper Gallium Selenide Sputtering Target
Copper Indium Gallium Selenide (CIGS) Sputtering Target
Copper Indium Gallium Sulfur Selenide (CIGSS) Sputtering Target
Copper Indium Selenide (CIS) Sputtering Target
Copper Selenide Sputtering Target
Copper Sulfide Sputtering Target
Copper Telluride Sputtering Target
Dysprosium Fluoride Sputtering Target
Dysprosium Iron Sputtering Target
Dysprosium Phosphide Sputtering Target
Dysprosium Selenide Sputtering Target
Dysprosium Telluride Sputtering Target
Erbium Fluoride Sputtering Target
Erbium Phosphide Sputtering Target
Erbium Selenide Sputtering Target
Erbium Telluride Sputtering Target
Europium Fluoride Sputtering Target
Europium Phosphide Sputtering Target
Europium Selenide Sputtering Target
Europium Telluride Sputtering Target
Gadolinium Fluoride Sputtering Target
Gadolinium Phosphide Sputtering Targets
Gadolinium Selenide Sputtering Target
Gadolinium Telluride Sputtering Target
Gallium Antimonide Sputtering Target
Gallium Arsenide Sputtering Target
Gallium Fluoride Sputtering Target
Gallium Nitride Sputtering Target
Gallium Phosphide Sputtering Target
Gallium(II) Selenide Sputtering Target
Gallium(III) Selenide Sputtering Target
Gallium(II) Sulfide Sputtering Target
Gallium(III) Sulfide Sputtering Target
Gallium(II) Telluride Sputtering Target
Gallium(III) Telluride Sputtering Target
Germanium Nitride Sputtering Target
Germanium Phosphide Sputtering Target
Germanium Selenide Sputtering Target
Germanium Sulfide Sputtering Target
Germanium Telluride Sputtering Target
GeSbTe Sputtering Target
Gold Antimony Sputtering Target
Gold Phosphide Sputtering Target
Gold Platinum Sputtering Target
Gold Selenide Sputtering Target
Gold Telluride Sputtering Target
Hafnium Boride Sputtering Target
Hafnium Carbide Sputtering Target
Hafnium Fluoride Sputtering Target
Hafnium Nitride Sputtering Target
Hafnium Phosphide Sputtering Target
Hafnium Selenide Sputtering Target
Hafnium Silicide Sputtering Target
Hafnium Telluride Sputtering Target
Holmium Fluoride Sputtering Target
Holmium Phosphide Sputtering Target
Holmium Selenide Sputtering Target
Holmium Telluride Sputtering Target
Indium Antimonide Sputtering Target
Indium Arsenide Sputtering Target
Indium Fluoride Sputtering Target
Indium Phosphide Sputtering Target
Indium Selenide Sputtering Target
Indium(II) Selenide Sputtering Target
Indium Sulfide Sputtering Target
Indium Telluride Sputtering Target
Indium(III) Telluride Sputtering Target
Iridium Selenide Sputtering Target
Iridium Telluride Sputtering Target
Iron Carbide Sputtering Target
Iron Fluoride Sputtering Target
Iron Phosphide Sputtering Target
Iron Selenide Sputtering Target
Iron Telluride Sputtering Target
Lanthanum Boride Sputtering Target
Lanthanum Fluoride Sputtering Target
Lanthanum Manganate Sputtering Target
Lanthanum Phosphide Sputtering Target
Lanthanum Selenide Sputtering Target
Lanthanum Telluride Sputtering Target
Lead Antimonide Sputtering Target
Lead Phosphide Sputtering Target
Lead Selenide Sputtering Target
Lead Sulfide Sputtering Target
Lead Telluride Sputtering Target
Lead Zirconate Titanate (PZT) Sputtering Target
Lithium Phosphate Sputtering Target
Lithium Carbonate Sputtering Target
Lithium Niobate Sputtering Target
Lithium Phosphide Sputtering Target
Lithium Selenide Sputtering Target
Lithium Tantalate Sputtering Target
Lithium Telluride Sputtering Target
Lutetium Fluoride Sputtering Target
Lutetium Phosphide Sputtering Target
Lutetium Selenide Sputtering Target
Lutetium Telluride Sputtering Target
Magnesium Fluoride Sputtering Target
Magnesium Phosphide Sputtering Target
Magnesium Selenide Sputtering Target
Magnesium Telluride Sputtering Target
Manganese Phosphide Sputtering Target
Manganese Selenide Sputtering Target
Manganese Telluride Sputtering Target
Molybdenum Carbide Sputtering Targets
Molybdenum Disilicide Sputtering Target
Molybdenum Disulfide Sputtering Target
Molybdenum Phosphide Sputtering Target
Molybdenum Selenide Sputtering Target
Molybdenum Telluride Sputtering Target
Neodymium Fluoride Sputtering Target
Neodymium Phosphide Sputtering Target
Neodymium Selenide Sputtering Target
Neodymium Telluride Sputtering Target
Nickel Nitride Sputtering Target
Nickel Phosphide Sputtering Target
Nickel Selenide Sputtering Target
Nickel Silicide Sputtering Target
Nickel Telluride Sputtering Target
Niobium Carbide Sputtering Target
Niobium Nitride Sputtering Target
Niobium Phosphide Sputtering Target
Niobium Selenide Sputtering Target
Niobium Stannide Sputtering Target
Niobium Telluride Sputtering Target
Osmium Phosphide Sputtering Target
Osmium Selenide Sputtering Target
Osmium Telluride Sputtering Target
Palladium Phosphide Sputtering Target
Palladium Selenide Sputtering Target
Palladium Telluride Sputtering Target
Platinum Phosphide Sputtering Target
Platinum Selenide Sputtering Target
Platinum Telluride Sputtering Target
Praseodymium Calcium Manganate Sputtering Target
Praseodymium Cerium Manganate Sputtering Target
Praseodymium Fluoride Sputtering Target
Praseodymium Phosphide Sputtering Target
Praseodymium Selenide Sputtering Target
Praseodymium Telluride Sputtering Target
Rhenium Phosphide Sputtering Target
Rhenium Selenide Sputtering Target
Rhenium Telluride Sputtering Target
Rhodium Phosphide Sputtering Target
Rhodium Selenide Sputtering Targets
Rhodium Telluride Sputtering Target
Ruthenium Phosphide Sputtering Target
Ruthenium Selenide Sputtering Target
Ruthenium Telluride Sputtering Target
Samarium Fluoride Sputtering Target
Samarium Phosphide Sputtering Target
Samarium Selenide Sputtering Targets
Samarium Telluride Sputtering Target
Scandium Fluoride Sputtering Target
Scandium Phosphide Sputtering Target
Scandium Selenide Sputtering Target
Scandium Telluride Sputtering Target
Selenium Phosphide Sputtering Target
Selenium Telluride Sputtering Target
Silicon Telluride Sputtering Target
Silicon Arsenide Sputtering Target
Silicon Carbide Sputtering Target
Silicon Nitride Sputtering Target
Silicon Phosphide Sputtering Target
Silicon Selenide Sputtering Target
Silver Fluoride Sputtering Target
Silver Phosphide Sputtering Target
Silver Selenide Sputtering Target
Silver Sulfide Sputtering Target
Silver Telluride Sputtering Target
Strontium Fluoride Sputtering Target
Strontium Phosphide Sputtering Target
Strontium Ruthenate Sputtering Target
Strontium Selenide Sputtering Target
Strontium Telluride Sputtering Target
Strontium Titanate Sputtering Target
Tantalum Carbide Sputtering Target
Tantalum Nitride Sputtering Target
Tantalum Phosphide Sputtering Target
Tantalum Selenide Sputtering Target
Tantalum Silicide Sputtering Target
Tantalum Telluride Sputtering Target
Terbium Fluoride Sputtering Target
Terbium Phosphide Sputtering Target
Terbium Selenide Sputtering Targets
Terbium Telluride Sputtering Target
Thallium Phosphide Sputtering Target
Thallium Selenide Sputtering Target
Thallium Telluride Sputtering Target
Thorium Phosphide Sputtering Target
Thorium Selenide Sputtering Target
Thorium Telluride Sputtering Target
Thulium Fluoride Sputtering Target
Thulium Phosphide Sputtering Target
Thulium Selenide Sputtering Target
Thulium Telluride Sputtering Target
Tin Arsenide Sputtering Target
Tin Phosphide Sputtering Target
Tin Selenide Sputtering Target
Tin Sulfide Sputtering Target
Tin Telluride Sputtering Target
Titanium Boride Sputtering Targets
Titanium Carbide Sputtering Target
Titanium Nitride Sputtering Targets
Titanium Phosphide Sputtering Target
Titanium Selenide Sputtering Target
Titanium Silicide Sputtering Target
Titanium Telluride Sputtering Target
Tungsten Boride Sputtering Target (WB)
Tungsten Boride Sputtering Target (W2B)
Tungsten Carbide Sputtering Target
Tungsten Carbide/Cobalt Sputtering Target
Tungsten Disilicide Sputtering Target
Tungsten Disulfide Sputtering Target
Tungsten Phosphide Sputtering Target
Tungsten Selenide Sputtering Target
Tungsten Telluride Sputtering Target
Vanadium Carbide Sputtering Targets
Vanadium Nitride Sputtering Target
Vanadium Phosphide Sputtering Target
Vanadium Selenide Sputtering Target
Vanadium Telluride Sputtering Target
Ytterbium Fluoride Sputtering Target
Ytterbium Phosphide Sputtering Target
Ytterbium Selenide Sputtering Target
Ytterbium Telluride Sputtering Target
Yttrium Barium Cuprate Sputtering Target
Yttrium Fluoride Sputtering Target
Yttrium Phosphide Sputtering Target
Yttrium Selenide Sputtering Target
Yttrium Telluride Sputtering Target
Zinc Antimonide Sputtering Target
Zinc Arsenide Sputtering Target
Zinc Fluoride Sputtering Target
Zinc Phosphide Sputtering Target
Zinc Selenide Sputtering Target
Zinc Sulfide Sputtering Target
Zinc Telluride Sputtering Target
Zirconium Boride Sputtering Target
Zirconium Nitride Sputtering Target
Zirconium Phosphide Sputtering Target
Zirconium Selenide Sputtering Target
Zirconium Telluride Sputtering Target

ALLOY SPUTTERING TARGETS

Aluminum Boron Sputtering Target
Aluminum Chromium Sputtering Target
Aluminum Cobalt Sputtering Target
Aluminum Copper Magnesium Chromium Zinc Sputtering Target
Aluminum Copper Manganese Magnesium Sputtering Target
Aluminum Copper Manganese Sputtering Target
Aluminum Copper Molybdenum Sputtering Target
Aluminum Copper Silicon Sputtering Target
Aluminum Copper Sputtering Target
Aluminum Copper Tungsten Sputtering Target
Aluminum Dysprosium Sputtering Target
Aluminum Erbium Sputtering Target
Aluminum Gadolinium Sputtering Target
Aluminum Magnesium Copper Nickel Sputtering Target
Aluminum Magnesium Copper Sputtering Target
Aluminum Magnesium Silicon Sputtering Target
Aluminum Magnesium Sputtering Target
Aluminum Manganese Chromium Sputtering Target
Aluminum Manganese Sputtering Target
Aluminum Molybdenum Sputtering Target
Aluminum Neodymium Sputtering Target
Aluminum Niobium Tantalum Sputtering Target
Aluminum Samarium Sputtering Target
Aluminum Scandium Sputtering Target
Aluminum Silicon Copper Sputtering Target
Aluminum Silicon Copper Magnesium Chromium Sputtering Target
Aluminum Silicon Copper Manganese Magnesium Sputtering Target
Aluminum Silicon Sputtering Target
Aluminum Silver Sputtering Target
Aluminum Tantalum Sputtering Target
Aluminum Vanadium Sputtering Target
Aluminum Ytterbium Sputtering Target
Aluminum Yttrium Sputtering Target
Cadmium Tin Sputtering Target
Cerium Copper Sputtering Target
Cerium Gadolinium Sputtering Target
Cerium Samarium Sputtering Target
Cerium Silver Sputtering Target
Cerium Titanium Sputtering Target
Chromium Aluminum Sputtering Target
Chromium Boron Sputtering Target
Chromium Cobalt Iron Sputtering Target
Chromium Copper Sputtering Target
Chromium Manganese Sputtering Target
Chromium Molybdenum Tantalum Sputtering Target
Chromium Nickel Sputtering Target
Chromium Silicon Sputtering Target
Chromium Vanadium Sputtering Target
Cobalt Aluminum Sputtering Target
Cobalt Boron Sputtering Target
Cobalt Chromium Aluminum Sputtering Target
Cobalt Chromium Iron Sputtering Target
Cobalt Chromium Sputtering Target
Cobalt Chromium Tantalum Boron Sputtering Target
Cobalt Gadolinium Sputtering Target
Cobalt Iron Boron Sputtering Target
Cobalt Iron Gadolinium Sputtering Target
Cobalt Iron Sputtering Target
Cobalt Nickel Chromium Sputtering Target
Cobalt Nickel Sputtering Target
Cobalt Tungsten Sputtering Target
Cobalt Terbium Sputtering Target
Cobalt Vanadium Sputtering Target
Cobalt Zirconium Sputtering Target
Copper Aluminum Sputtering Target
Copper Chrome Sputtering Target
Copper Cobalt Sputtering Target
Copper Gallium Sputtering Target
Copper Germanium Sputtering Target
Copper Indium Sputtering Target
Copper-Indium-Gallium Sputtering Target
Copper Nickel Sputtering Target
Copper Zinc Sputtering Target
Dysprosium Cobalt Sputtering Target
Dysprosium Iron Cobalt Sputtering Target
Gadolinium Cerium Sputtering Target
Gadolinium Erbium Silicon Sputtering Target
Gadolinium Iron Cobalt Sputtering Target
Gadolinium Iron Sputtering Target
Gadolinium Terbium Sputtering Target
Gadolinium Titanium Sputtering Target
Germanium Antimony Sputtering Target
Gold Arsenic Sputtering Target
Gold Copper Sputtering Target
Gold Germanium Sputtering Target
Gold Palladium Sputtering Target
Gold Silicon Sputtering Target
Gold Tin Sputtering Target
Gold Zinc Sputtering Target
Hafnium Iron Sputtering Target
Hafnium Yttrium Sputtering Target
Holmium Copper Sputtering Target
Indium Tin Sputtering Target
Indium Zinc Sputtering Target
Iron Aluminum Sputtering Target
Iron Boron Sputtering Target
Iron Chromium Sputtering Target
Iron Cobalt Sputtering Target
Iron Gadolinium Sputtering Target
Iron Hafnium Sputtering Target
Iron Manganese Sputtering Target
Iron Nickel Sputtering Target
Iron Silicon Sputtering Target
Lanthanated Molybdenum Sputtering Target
Lanthanum Aluminum Sputtering Target
Lanthanum Nickel Sputtering Target
Magnesium Aluminum Sputtering Target
Magnesium Calcium Sputtering Target
Manganese Copper Sputtering Target
Magnesium Dysprosium Sputtering Target
Magnesium Gadolinium Sputtering Target
Magnesium Indium Sputtering Target
Magnesium Neodymium Sputtering Target
Magnesium Neodymium Zirconium Yttrium Sputtering Target
Magnesium Samarium Sputtering Target
Magnesium Yttrium Sputtering Target
Magnesium Zirconium Sputtering Target
Manganese Iron Sputtering Target
Manganese Nickel Sputtering Target
Molybdenum Chromium Sputtering Target
Molybdenum Silicon Sputtering Target
Molybdenum Titanium Sputtering Target
Molybdenum Tungsten Sputtering Target
Neodymium Iron Boron Sputtering Target
Neodymium Silver Sputtering Target
Nickel Aluminum Sputtering Target
Nickel Chrome Sputtering Target
Nickel Chromium Aluminum Sputtering Target
Nickel Chromium Silicon Sputtering Target
Nickel Chromium Sputtering Target
Nickel Cobalt Sputtering Target
Nickel Copper Sputtering Target
Nickel Iron Sputtering Target
Nickel Manganese Sputtering Target
Nickel Platinum Sputtering Target
Nickel Titanium Sputtering Target
Nickel Tungsten Sputtering Target
Nickel Vanadium Sputtering Target
Nickel Vanadium Zirconium Sputtering Target
Nickel Ytterbium Sputtering Target
Nickel Zirconium Sputtering Target
Niobium Titanium Sputtering Target
Platinum Palladium Sputtering Target
Samarium Cobalt Sputtering Target
Samarium Iron Sputtering Target
Samarium Zirconium Sputtering Target
Scandium Nickel Sputtering Target
Scandium Zirconium Sputtering Target
Silicon Aluminum Rotatable Sputtering Target
Silver Aluminum Sputtering Target
Silver Copper Sputtering Target
Silver Lanthanum Sputtering Target
Silver Lutetium Sputtering Target
Silver Magnesium Sputtering Target
Silver Tin Sputtering Target
Tantalum Aluminum Sputtering Target
Tantalum Molybdenum Sputtering Target
Terbium Dysprosium Iron Sputtering Target
Terbium Dysprosium Sputtering Target
Terbium Gadolinium Iron Cobalt Sputtering Target
Terbium Iron Cobalt Sputtering Target
Terbium Iron Sputtering Target
Titanium Aluminum Chromium Sputtering Target
Titanium Aluminum Sputtering Target
Titanium Aluminum Vanadium Sputtering Target
Titanium Aluminum Yttrium Sputtering Target
Titanium Chromium Sputtering Target
Titanium Cobalt Sputtering Target
Titanium Nickel Sputtering Target
Titanium Silicon Sputtering Target
Titanium Tungsten Sputtering Target
Titanium Zirconium Sputtering Target
Tungsten Silicon Sputtering Target
Tungsten Titanium Sputtering Target
TZM Molybdenum Alloy Sputtering Target
Vanadium Aluminum Sputtering Target
Vanadium Chromium Sputtering Target
Vanadium Cobalt Sputtering Target
Vanadium Copper Sputtering Target
Vanadium Iron Sputtering Target
Vanadium Molybdenum Sputtering Target
Vanadium Nickel Sputtering Target
Vanadium Titanium Aluminum Sputtering Target
Vanadium Titanium Sputtering Target
Vanadium Tungsten Sputtering Target
Yttrium Titanium Sputtering Target
Yttrium Zirconium Magnesium Sputtering Target
Yttrium Zirconium Sputtering Target
Zinc Aluminium Rotatable Sputtering Target
Zinc Aluminum Sputtering Target
Zirconium Aluminum Sputtering Target
Zirconium Cerium Sputtering Target
Zirconium Copper Sputtering Target
Zirconium Gadolinium Sputtering Target
Zirconium Silicon Sputtering Target
Zirconium Titanium Sputtering Target
Zirconium Tungsten Sputtering Target
Zirconium Yttrium Sputtering Target



DEPOSITION METHODS THAT DO NOT REQUIRE SPUTTERING TARGETS

Pulsed laser deposition (PLD) uses pulses of a high-power laser beam to ablate the target material. The material on the target surface is instantly evaporated and turned into plasma, and it returns back to vapor phase. Finally, the ablated material then collects and deposits on top of a correctly placed substrate. This technique has the advatages over the others in that it preserves the stoichiometry of the target on the film formed and the rate of deposition is higher than the others. Ultra High Purity Cadmium Telluride Boule

Physical vapor deposition (PVD). PVD refers to the purely physical formation of the thin film on top of the substrate, there should be no chemical reaction involved in the formation of the thin film. Typically PVD is done in a low-pressure environment, though there are a number of PVD techniques. Evaporation deposition raises the temperature of material of thin film so its vapor pressure reaches a useful range. The vapor then moves and deposits on top of the substrate of interest.Electron Beam Evaporation a form of PVD in which the target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electrion beam causes atoms from the target material to transform into a gaseous phase, these atoms then return to solid form coating everything in the vacuum chamber with a thin film. It can also be used in conjuction with molecular beam epitaxy (MBE).

Electron beam evaporation research applications include medical, metallurgical, telecommunication, microelectronics, optical coating, nanotechnology and semiconductor industries. Typical source materials include titanium, platinum, aluminum, aluminum oxide, antimony, barium, bismuth, boron, boron carbide, calcium, cerium, chromium, chromium oxide, cobalt, dysprosium, erbium, gadolinium, hafnium, hafnium oxide, indium, indium tin oxide, iridium, iron, lead, lithium, lithium fluoride, magnesium, magnesium fluroide, magnesium oxide, manganese, molybdenum, neodymium, nickel, nickel-chromium, nickel iron, niobium, palladium, permalloy hymu 80 (Fe-Mn-Mo-Ni), rhenium, rhodium, ruthenium, samarium, scandium, selenium, silicon, silicon dioxide, silicon monoxide, strontium, tantalum, tantalum oxide, tin, tin oxide, titanium, titanium dioxide, titanium monoxide, tungsten, tungsten oxide, vanadium, ytterbium, yttrium, yttrium fluoride, zinc, zinc oxide, zinc sulfide, zirconium, zirconium oxide, copper, silver, gold, gold-tin, gold-germanium, and other metals and alloys.

Chemical vapor deposition(CVD) refers to the formation of the thin film on the substrate involves chemical reaction. Typically, a fluid precursor moves onto the substrate and one or more chemical reactions take place, which forms a layer of the thin film.Chemical Vapor Deposition generally uses a gas-phase precursor, often a halide or hydride of the element to be deposited. In the case of metal-organic chemical vapor depsoisition(MOCVD), an organometallic gas is used. Commercial techniques often use very low pressures of precursor gas. In the case of plasma-enhanced chemical vapor deposition (PECVD), which is a special case of MOCVD, an ionized vapor, or plasma, is used as a precursor. Commercial PECVD relies on electromagnetic means (electric current or microwave excitation), rather than a chemical reaction, to produce a plasma. MOCVD is currently being used in the manufacturing of graphene, carbon nanotubes, LED, laser-emitting diodes, multijunction solar cell, optoelectronics, microelectronics, semiconductor, phase-change memory, photodectors, and mirco-electro-mechanical systems (MEMS). Chemical depositon is typically much less directional, or sensitive to geometry, than physical deposition.

 

99.999% Copper Foil 99.999% Dysprosium Foil 99.999% Gold Foil


Rods and Plates. American Elements casts any of the rare earth metals and most other advanced material into rod, bar or plate form, as well as other machined shapes. All as-cast rods, bars and plates are produced from either the pure metal Ingots or sublimed metals. We have a variety of standard sized rod molds, from a minimum of 1/4" diameter up to 3" diameter for most rod needs. Plates are also offered in standard thicknesses, from 1/4" thick to 1" thick. Maximum rod lengths and maximum plate sizes are dependent on melt capacity and furnace room. Small diameter rods may have only a 4"-6" maximum cast length, whereas larger diameter rods may be cast up to about 16" long. Plate sizes can be cast up to a size of 24" x 16". As-cast rods or plates are saw-cut to length or final dimensions, and the metal surface may have visible flow marks.

Round Metallic Tubes--Selected DimensionsTubing. AE produces a complete line of fully characterized round, oval, rectangular and square seamless tubing in diameters from 0.2 to 6.0 inches and wall thicknesses from 0.003 to 0.500 inches produced from advanced and high purity metals for use in industrial and research applications in the fields of electronics, energy, medical devices and aerospace among many others. Tubing can be further processed at the customer's request to rings, washers, sleeves and sheaths. Tubing is produced from most metals including: Aluminum, Bismuth, Carbon, Cerium (as well as most other rare earths), Chromium, Cobalt, Copper, Erbium, Germanium, Gold, Indium, Iron, Magnesium, Manganese, Molybdenum, Neodymium, Nickel, Niobium, Ruthenium, Silicon, Silver, Tin, Titanium, Tungsten, Vanadium, Yttrium, Zinc, and Zirconium.



 
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Production Catalog Available in 36 Countries and Languages

Recent Research & Development for Sputtering Targets

  • Liangqi Ouyang, Ming Zhao, Daming Zhuang, Junfeng Han, Li Guo, Xiaolong Li, Mingjie Cao, The relationships between electronic properties and microstructure of Cu(In,Ga)Se2 films prepared by sputtering from a quaternary target, Materials Letters, Volume 137, 15 December 2014
  • Gui-Gen Wang, Jie Zeng, Jie-Cai Han, Li-Yi Wang, Highly transparent and conductive Ga-doped ZnO films with good thermal stability prepared by dual-target reactive sputtering, Materials Letters, Volume 137, 15 December 2014
  • Gui-Gen Wang, Jie Zeng, Jie-Cai Han, Li-Yi Wang, Highly transparent and conductive Ga-doped ZnO films with good thermal stability prepared by dual-target reactive sputtering, Materials Letters, Volume 137, 15 December 2014
  • Huilong Hou, Reginald F. Hamilton, Mark W. Horn, Yao Jin, NiTi thin films prepared by biased target ion beam deposition co-sputtering from elemental Ni and Ti targets, Thin Solid Films, Volume 570, Part A, 3 November 2014
  • Tobias Schmitz, Franziska Warmuth, Ewald Werner, Cornelia Hertl, Jürgen Groll, Uwe Gbureck, Claus Moseke, Physical and chemical characterization of Ag-doped Ti coatings produced by magnetron sputtering of modular targets, Materials Science and Engineering: C, Volume 44, 1 November 2014
  • Ph.V. Kiryukhantsev-Korneev, J.F. Pierson, K.A. Kuptsov, D.V. Shtansky, Hard Cr–Al–Si–B–(N) coatings deposited by reactive and non-reactive magnetron sputtering of CrAlSiB target, Applied Surface Science, Volume 314, 30 September 2014
  • F. Ferreira, R. Serra, J.C. Oliveira, A. Cavaleiro, Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode, Surface and Coatings Technology, Available online 18 September 2014
  • M.J. Pinzón, J.E. Alfonso, J.J. Olaya, G.I. Cubillos, E. Romero, Influence of the electrical power applied to the target on the optical and structural properties of ZrON films produced via RF magnetron sputtering in a reactive atmosphere, Thin Solid Films, Available online 16 September 2014
  • I. Miccoli, R. Spampinato, F. Marzo, P. Prete, N. Lovergine, DC-magnetron sputtering of ZnO:Al films on (00.1)Al2O3 substrates from slip-casting sintered ceramic targets, Applied Surface Science, Volume 313, 15 September 2014
  • Yoon S. Choi, Jay B. Kim, Jeon G. Han, Optical absorption spectroscopy of facing targets and conventional magnetron sputtering during process of Al-doped ZnO films, Surface and Coatings Technology, Volume 254, 15 September 2014